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公开(公告)号：EP1783554A4
公开(公告)日：2009-03-11
申请号：EP05751379
申请日：2005-06-16
发明人： OHMI TADAHIRO , TAKEHISA KIWAMU , MORIYAMA S , SASAKI S , HIROSE M , ISHII M , SUGAYA T , KATAOKA M , UMEZU MOTOHIRO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/7095 , G03F7/70716 , G03F7/70825
摘要： A stage member having a high resistance and resonance frequency against torsional oscillation is provided. The stage member has a honeycomb structure wherein a square pole shaped space part is provided and a wall constituting the space part is arranged vertical to a torsional deformation direction. Exposure equipment including such stage member is also provided. The honeycomb structure of the stage member is desirably constituted of ceramics.
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3.发明公开EXPOSURE APPARATUS FOR LIQUID CRYSTAL PANEL AND EXPOSURE APPARATUS 审中-公开暴风雨VÜSSIGKRISTALLPANEELUND EXPOSITIONSVORRICHTUNG
公开(公告)号：EP1602978A1
公开(公告)日：2005-12-07
申请号：EP04710494.8
申请日：2004-02-12
发明人： TAKEHISA, Kiwamu , MORIYAMA, Shirou, Nihon Ceratec Co, Ltd , SAKAMAKI, Makoto, Nihon Ceratec Co, Ltd , OHMI, Tadahiro
IPC分类号： G03F7/20 , H01L21/027 , G02F1/13 , C04B35/565 , C04B35/584
CPC分类号： G03F7/70716 , C04B35/565 , C04B35/584 , C04B2235/36 , C04B2235/77 , C04B2235/80 , C04B2235/9607 , G03F7/7095
摘要： A composite ceramic material with a honeycomb structure which is composed by adding glass into silicon carbide is used for a mask stage (2) and a substrate stage (12) in an exposure apparatus (100) for liquid crystal panels.
摘要翻译： 用于液晶面板的曝光装置（100）中的掩模台（2）和基板台（12）使用具有蜂窝结构的复合陶瓷材料，该陶瓷材料通过将玻璃加入到碳化硅中而构成。
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公开(公告)号：EP1602978A4
公开(公告)日：2009-08-19
申请号：EP04710494
申请日：2004-02-12
IPC分类号： G02F1/13 , C04B35/565 , C04B35/584 , C04B38/00 , G02F1/1343 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70716 , C04B35/565 , C04B35/584 , C04B2235/36 , C04B2235/77 , C04B2235/80 , C04B2235/9607 , G03F7/7095
摘要： A composite ceramic material with a honeycomb structure which is composed by adding glass into silicon carbide is used for a mask stage (2) and a substrate stage (12) in a exposure apparatus (100) for liquid crystal panels.
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5.发明公开
公开(公告)号：EP1914330A4
公开(公告)日：2010-03-03
申请号：EP06766798
申请日：2006-06-16
发明人： OHMI TADAHIRO , SHIRAI YASUYUKI , MORINAGA HITOSHI , KAWASE YASUHIRO , KITANO MASAFUMI , MIZUTANI FUMIKAZU , ISHIKAWA MAKOTO , KISHI YUKIO
IPC分类号： C23C28/00 , C23C8/10 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , H01L21/205 , H01L21/3065
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
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6.发明公开
公开(公告)号：EP1914330A1
公开(公告)日：2008-04-23
申请号：EP06766798.0
申请日：2006-06-16
发明人： OHMI, Tadahiro, c/o Tohoku University , SHIRAI, Yasuyuki, c/o Tohoku University , MORINAGA, Hitoshi, c/o Tohoku University , KAWASE, Yasuhiro, c/o Tohoku University , KITANO, Masafumi, c/o Tohoku University , MIZUTANI, Fumikazu, MITSUBISHI CHEMICAL CO. , ISHIKAWA, Makoto, MITSUBISHI CHEMICAL CO. , KISHI, Yukio, c/o NIHON CERATEC CO., LTD.
IPC分类号： C23C28/00 , C23C8/10 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , H01L21/205 , H01L21/3065
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1 µ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200µm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译： 多功能生产设备使得能够在设备上的处理室的内壁的反应产物的哪沉积处理多个用于制造半导体或平板显示器，金属污染由于内壁或类似物的腐蚀，并 由于排出气体的过程中波动被抑制，以及使用的保护膜的结构在其中。 在金属材料的表面，具有在1μ厚或由母材的直接氧化，并为约200微米厚的第二涂层少形成为底层氧化物涂层的第一涂层上形成。 与搜索装置，针对与离子或自由基可赋予第二层保护膜照射的耐腐蚀性，和保护层的用于防止通过扩散的分子或离子注入到第二层保护引起母金属的表面的腐蚀的效果 电影可以被赋予第一层氧化物成膜。 因此，从每个金属部件与处理腔室的内表面生成的金属基片的污染被减少，且第二层保护膜的剥离，由于在第二层保护膜的密合性因之间的界面的腐蚀降低 母体材料和第二层保护膜，可以抑制。
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公开(公告)号：EP1783554A1
公开(公告)日：2007-05-09
申请号：EP05751379.8
申请日：2005-06-16
发明人： OHMI, Tadahiro; , TAKEHISA, Kiwamu; , MORIYAMA, S., NIHON CERATEC CO., LTD. , SASAKI, S., NIHON CERATEC CO., LTD. , HIROSE, M., NIHON CERATEC CO., LTD. , ISHII, M., TAIHEIYO CEMENT CORPORATION , SUGAYA, T., TAIHEIYO CEMENT CORPORATION , KATAOKA, M., TAIHEIYO CEMENT CORPORATION , UMEZU, Motohiro c/o TAIHEIYO CEMENT CORPORATION
IPC分类号： G03F7/20 , H01L21/027 , H01L21/68
CPC分类号： G03F7/7095 , G03F7/70716 , G03F7/70825
摘要： In a stage member for use in an exposure apparatus, a honeycomb structural body has walls that are extended in a direction perpendicular to a longitudinal direction of the stage member and that surround square shaped prismatic spaces, so as to accomplish a high resistance and a high resonant frequency with respect to torsional vibration. The honeycomb structural body of the stage member is preferably made of a ceramic material.
摘要翻译： 在曝光装置中使用的舞台构件中，蜂窝结构体具有沿与舞台构件的长度方向垂直的方向延伸并且围绕方形棱柱形空间延伸的壁，以实现高电阻和高 谐振频率相对于扭转振动。 台架构件的蜂窝结构体优选由陶瓷材料制成。
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