OPTOCHEMICAL SENSOR AND METHOD OF MAKING THE SAME
    3.
    发明公开
    OPTOCHEMICAL SENSOR AND METHOD OF MAKING THE SAME 有权
    OPTOCHEMISCHE SENSOREN UND VERFAHREN ZU IHRER HERSTELLUNG

    公开(公告)号:EP1963852A4

    公开(公告)日:2017-09-06

    申请号:EP06838998

    申请日:2006-12-05

    CPC classification number: G01N21/783 G01N2021/7779

    Abstract: A method of making an optochemical sensor, the method comprising: providing a reflective substrate having a major surface; affixing a detection layer comprising at least one intrinsically microporous polymer to at least a portion of the major surface; depositing a substantially continuous semi-reflective metallic layer on at least a portion of the detection layer, the semi-reflective metallic layer comprising palladium and having a network of fine irregular cracks therein; and heating the detection layer and semi-reflective metallic layer in the presence of molecular oxygen at a temperature sufficient to cause the cracks to widen. Sensors prepared according to method are also disclosed.

    Abstract translation: 一种制造光化学传感器的方法,该方法包括:提供具有主表面的反射基底; 将包含至少一种固有微孔聚合物的检测层附着到主表面的至少一部分上; 在所述检测层的至少一部分上沉积基本上连续的半反射金属层,所述半反射金属层包含钯并且其中具有精细不规则裂纹网络; 和在分子氧存在下,在足以引起裂纹扩大的温度下加热检测层和半反射金属层。 还公开了根据方法制备的传感器。

    PLASMA TREATED ABRASIVE ARTICLE AND METHOD OF MAKING SAME
    4.
    发明公开
    PLASMA TREATED ABRASIVE ARTICLE AND METHOD OF MAKING SAME 审中-公开
    等离子体处理SSCHLEIFARTIKEL及其制备方法

    公开(公告)号:EP2240298A4

    公开(公告)日:2014-04-30

    申请号:EP08870190

    申请日:2008-12-08

    CPC classification number: B24D11/00 Y10T428/24372

    Abstract: An abrasive article, such as a structured abrasive article, can be treated by subjecting it to plasma whereby the outer surface can be eroded exposing at least a portion of the abrasive particles dispersed within a cross-linked binder forming the abrasive composites. Depending on the process conditions for the plasma treatment, it is possible to erode only a small portion or substantially all of the cross-linked binder from the outer surface. Thus, the initial cut-rate of the abrasive article can be controlled since it is possible to precisely control the degree, height, or area of the exposed abrasive particles.

    ORGANIC CHEMICAL SENSOR COMPRISING PLASMA-DEPOSITED MICROPOROUS LAYER, AND METHOD OF MAKING AND USING
    9.
    发明公开
    ORGANIC CHEMICAL SENSOR COMPRISING PLASMA-DEPOSITED MICROPOROUS LAYER, AND METHOD OF MAKING AND USING 有权
    有机化学传感器与血浆隐蔽微孔层和方法的生产和使用

    公开(公告)号:EP2208058A4

    公开(公告)日:2017-05-24

    申请号:EP08836726

    申请日:2008-09-30

    CPC classification number: G01N27/125 Y10T442/624

    Abstract: Applicant discloses a sensing element for sensing an organic chemical analyte, comprising a first electrode and a second electrode, and a microporous, hydrophobic, analyte-responsive dielectric material disposed at least in proximity to the first and second electrodes. The analyte-responsive dielectric material may be an amorphous random covalent network comprising a mean pore size of less than about 10 nm and a porosity of at least about 20%. An electrical property of the sensing element, such as capacitance, can be monitored in order to sense an organic chemical analyte.

    Abstract translation: 申请人盘松动用于有机化学被分析物,其包括第一电极和第二电极,和微孔的,疏水的,分析物响应电介质接近至少设置在第一电极和第二电极材料的感测的感测元件。 分析物响应性介电材料可以是无定形的无规共价网络,包括小于约10纳米的平均孔尺寸和至少约20%的孔隙率。 感测元件,颜色的电特性:如电容,可以以感测的有机化学被分析物进行监测。

    METHOD OF MAKING A NANOSTRUCTURE AND NANOSTRUCTURED ARTICLES
    10.
    发明公开
    METHOD OF MAKING A NANOSTRUCTURE AND NANOSTRUCTURED ARTICLES 审中-公开
    一种用于生产纳米结构与纳米结构产品

    公开(公告)号:EP3024777A4

    公开(公告)日:2017-01-11

    申请号:EP14829850

    申请日:2014-07-23

    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof. The deposited layer can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyl compounds, metal isopropoxide compounds, metal acetylacetonate compounds, metal halide compounds, and combinations thereof. Nanostructures of high aspect ratio and optionally with random dimensions in at least one dimension and preferably in three orthogonal dimensions can be prepared.

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