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    APPARATUS INCLUDING HEATING SOURCE REFLECTIVE FILTER FOR PYROMETRY
    3.
    发明公开
    APPARATUS INCLUDING HEATING SOURCE REFLECTIVE FILTER FOR PYROMETRY 有权
    装置和方法与HEIZQUELLENREFLEKTIONSFILTER测温

    公开(公告)号：EP2279519A2

    公开(公告)日：2011-02-02

    申请号：EP09730361.4

    申请日：2009-04-03

    申请人： Applied Materials, Inc.

    发明人： RANISH, Joseph, M. ,  HUNTER, Aaron, M. ,  KOELMEL, Blake, R.

    IPC分类号： H01L21/324

    CPC分类号： H01L21/67115 ,  H01L21/67248

    摘要： Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.

    ROTATING SUBSTRATE LASER ANNEAL
    5.
    发明公开
    ROTATING SUBSTRATE LASER ANNEAL 审中-公开

    公开(公告)号：EP3329510A1

    公开(公告)日：2018-06-06

    申请号：EP16831063.9

    申请日：2016-07-19

    申请人： Applied Materials, Inc.

    发明人： RANISH, Joseph, M. ,  SHARMA, Shashank ,  KEDLAYA, Diwakar, N. ,  HUNTER, Aaron, Muir

    IPC分类号： H01L21/324 ,  H01L21/67 ,  H01L21/268

    CPC分类号： G21K5/10 ,  H01L21/67115

    摘要： Embodiments of the present disclosure relate to thermal processing of substrates. More specifically, embodiments described herein relate to flash on spike annealing processes and apparatus suitable for performing such processes. In one embodiment, a thermal processing apparatus may include a lamp radiation source, a laser source, and a reflector plate disposed between the lamp radiation source and the laser source. One or more apertures may be formed in the reflector plate and the laser source may be positioned adjacent to the reflector plate such that a laser beam emitted from the laser source propagates through the one or more apertures. In one embodiment, the reflector plate may be substantially circular and the one or more apertures may approximate a sector of the reflector plate.

    SINGLE AXIS LIGHT PIPE FOR HOMOGENIZING ONE AXIS OF ILLUMINATION SYSTEMS BASED ON LASER DIODES
    7.
    发明公开
    SINGLE AXIS LIGHT PIPE FOR HOMOGENIZING ONE AXIS OF ILLUMINATION SYSTEMS BASED ON LASER DIODES 审中-公开
    基于激光二极管的单轴光线均质化的轴照明系统

    公开(公告)号：EP1828820A1

    公开(公告)日：2007-09-05

    申请号：EP05804317.5

    申请日：2005-10-12

    申请人： APPLIED MATERIALS, INC.

    发明人： ADAMS, Bruce, E. ,  JENNINGS, Dean ,  MAYUR, Abhilash ,  PARIHAR, Vijay ,  RANISH, Joseph, M.

    IPC分类号： G02B6/00 ,  H01L21/324 ,  H01L21/268

    CPC分类号： G02B6/003 ,  G02B6/0046 ,  G02B6/0056 ,  G02B6/0068

    摘要： Apparatus for thermally processing a semiconductor wafer includes an array of semiconductor laser emitters arranged in plural parallel rows extending along a slow axis, plural respective cylindrical lenses overlying respective ones of the rows of laser emitters for collimating light from the respective rows along a fast axis generally perpendicular to the slow axis, a homogenizing light pipe having an input face at a first end for receiving light from the plural cylindrical lenses and an output face at an opposite end, the light pipe comprising a. pair of reflective walls extending between the input and output faces and separated from one another along the direction of the slow axis, and scanning apparatus for scanning light emitted from the homogenizing light pipe across the wafer in a scanning direction parallel to the fast axis.