公开(公告)号：EP2039801A4

公开(公告)日：2011-07-06

申请号：EP07745295

申请日：2007-06-14

申请人： ASAHI GLASS CO LTD

发明人： AOMINE NOBUTAKA ,  AOSHIMA YUKI ,  HAYASHI KAZUSHI ,  KUGIMIYA TOSHIHIRO ,  KOBORI TAKASHI

IPC分类号： C23C16/505 ,  H01L21/31

CPC分类号： C23C16/505 ,  C23C16/40 ,  C23C16/54 ,  H01J37/32 ,  H01J37/32091 ,  H01J37/32568 ,  H01J37/32761

公开(公告)号：EP3135645A4

公开(公告)日：2018-01-10

申请号：EP15783380

申请日：2015-04-21

申请人： ASAHI GLASS CO LTD

发明人： HANEKAWA HIROSHI ,  AOMINE NOBUTAKA ,  KAWAHARA HIROTOMO ,  AOSHIMA YUKI ,  MAESHIGE KAZUNOBU

IPC分类号： C03C17/245 ,  B32B9/00 ,  B32B9/04 ,  B32B17/06 ,  C03C17/00 ,  C03C17/34 ,  C23C16/40 ,  C23C16/50 ,  C23C16/56 ,  G02B1/11

CPC分类号： C03C17/2456 ,  B32B9/00 ,  B32B9/04 ,  B32B17/06 ,  C03C17/001 ,  C03C17/245 ,  C03C17/34 ,  C03C2217/212 ,  C03C2217/73 ,  C03C2218/153 ,  C23C16/40 ,  C23C16/405 ,  C23C16/50 ,  C23C16/56 ,  G02B1/11

摘要： To provide a glass substrate provided with a coating film having a high refractive index titania layer which is excellent in the heat resistance with cracking or the like by heat treatment suppressed, and a method for producing such a glass substrate provided with a coating film. A glass substrate provide with a coating film, comprising a glass substrate and a coating film containing at least one TiO 2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which comprises a step of forming a TiO 2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.

公开(公告)号：EP2998112A4

公开(公告)日：2017-01-04

申请号：EP14797913

申请日：2014-05-13

申请人： ASAHI GLASS CO LTD

发明人： OKADA NAOKO ,  AOMINE NOBUTAKA ,  HANEKAWA HIROSHI ,  KAWAHARA HIROTOMO

IPC分类号： B32B9/00 ,  C03C17/09 ,  C03C17/36 ,  C23C14/06 ,  C23C14/10 ,  C23C14/16 ,  C23C14/18 ,  C23C14/34 ,  C23C16/40 ,  C23C16/42 ,  C23C16/50 ,  G02B1/10 ,  G02B1/14 ,  G02B5/08 ,  G02B19/00

CPC分类号： G02B19/0042 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3647 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3663 ,  C03C2218/153 ,  C23C14/0641 ,  C23C14/10 ,  C23C14/165 ,  C23C14/18 ,  C23C14/34 ,  C23C16/402 ,  C23C16/50 ,  G02B1/105 ,  G02B1/14 ,  G02B5/0808

摘要： A protective film placed on an upper part of a metal film for protecting the metal film placed on a glass substrate. The protective film includes a silica film. The silica film has an extinction coefficient "k" less than or equal to 1 X 10 -4 , a refractive index "n" greater than or equal to 1.466 at a wavelength of 632 nm, and a carbon content less than or equal to 3 atomic %.

公开(公告)号：EP1443527A4

公开(公告)日：2007-09-12

申请号：EP02775364

申请日：2002-10-17

申请人： ASAHI GLASS CO LTD

发明人： SATO KAZUO ,  TANEDA NAOKI ,  FUKAWA MAKOTO ,  AOMINE NOBUTAKA ,  KAMBE MIKA

IPC分类号： H01B5/14 ,  B32B9/00 ,  C23C16/40 ,  H01B13/00 ,  H01L31/0224 ,  H01L31/0236 ,  H01L31/04 ,  H01L31/18 ,  H01M14/00

CPC分类号： H01L31/1884 ,  C23C16/0272 ,  C23C16/04 ,  C23C16/407 ,  H01L31/022466 ,  H01L31/022483 ,  H01L31/02363 ,  H01L31/02366 ,  Y02E10/50 ,  Y10T428/24364 ,  Y10T428/261 ,  Y10T428/263 ,  Y10T428/265

摘要： A substrate with a transparent conductive oxide film (especially, a substrate with a transparent conductive oxide film useful as a thin-film silicon-based solar cell-use substrate) being excellent in mass-production efficiency, and being characterized by having a low resistance and a high transparency and having a good light scattering performance in a full wavelength region (300 nm-3μm) of solar ray, and a production method therefor; and a photoelectric conversion element (especially, solar cell) using the substrate. A substrate with a transparent conductive oxide film, comprising a transparent conductive oxide film provided on the substrate and constituted of a plurality of ridges and a plurality of float portions, the surfaces of the ridges and the flat portions having many continuous, micron-size protrusions.

公开(公告)号：EP2915902A4

公开(公告)日：2016-08-03

申请号：EP13850259

申请日：2013-10-23

申请人： ASAHI GLASS CO LTD

发明人： KAWAHARA HIROTOMO ,  AOMINE NOBUTAKA ,  MAESHIGE KAZUNOBU ,  AOSHIMA YUKI ,  HANEKAWA HIROSHI

IPC分类号： C23C16/503 ,  H01J37/32 ,  H01L21/31 ,  H05H1/24

CPC分类号： C23C16/402 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/32568 ,  H01J37/32577 ,  H05H1/46 ,  H05H2001/4675 ,  H05H2001/4682

摘要： A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row in that order, characterized in that said electrode group is connected to at least one AC power supply, a voltage supplied to two of said four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes, a space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

公开(公告)号：EP2857370A4

公开(公告)日：2015-12-02

申请号：EP13793436

申请日：2013-05-21

申请人： ASAHI GLASS CO LTD

发明人： HANEKAWA HIROSHI ,  AOMINE NOBUTAKA ,  AOSHIMA YUKI ,  KAWAHARA HIROTOMO ,  MAESHIGE KAZUNOBU

IPC分类号： C03C17/245 ,  B32B9/00 ,  B32B17/06 ,  C03C17/34 ,  C23C16/30 ,  C23C16/40

CPC分类号： C03C17/245 ,  C03C17/3411 ,  C03C17/36 ,  C03C17/366 ,  C03C2217/73 ,  C03C2218/152 ,  C03C2218/153 ,  C23C16/40 ,  G02B1/11 ,  G02B5/08 ,  G02B5/208

摘要： A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes (1) a step of preparing the glass substrate and (2) a step of forming the first layer on the glass substrate by the low-temperature CVD, wherein, in the glass substrate after the step (2), an integrated value after a baseline correction in a wavenumber range of 2600 cm -1 to 3800 cm -1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at% or less.

公开(公告)号：EP3239351A4

公开(公告)日：2018-05-30

申请号：EP15872645

申请日：2015-12-01

申请人： ASAHI GLASS CO LTD

发明人： KAWAHARA HIROTOMO ,  MAESHIGE KAZUNOBU ,  AOMINE NOBUTAKA ,  HANEKAWA HIROSHI

IPC分类号： C23C16/503 ,  C23C16/44 ,  C23C16/458 ,  C23C16/50 ,  H01J37/32 ,  H01L21/02 ,  H01L21/31 ,  H01L21/365 ,  H05H1/46

CPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/458 ,  C23C16/503 ,  H01J37/32532 ,  H01J37/32568 ,  H01J37/32669 ,  H01J37/32733 ,  H01J2237/3321 ,  H01L21/02164 ,  H01L21/02186 ,  H01L21/02274 ,  H01L21/31 ,  H05H1/46

摘要： A plasma CVD apparatus includes a plasma source connected to an alternating current power supply or two or more alternating current power supplies, configured to generate plasma; and a magnet array configured by a plurality of magnets. The plasma source has an electrode group, which is configured by arranging n electrodes (n being a positive even integer), in an order of electrode numbers. Each of the electrodes of the electrode group is connected to the alternating current power supply. An exit of a flow channel for a precursor gas is formed between adjacent electrodes of the electrode group. The magnet array is arranged so that a north pole or a south pole of each of the magnets is facing the plasma source. In the magnet array, for at least one pair of adjacent two magnets, poles facing the plasma source are arranged to be the same.

公开(公告)号：EP3085673A4

公开(公告)日：2017-06-21

申请号：EP14871878

申请日：2014-12-05

申请人： ASAHI GLASS CO LTD

发明人： YAMADA TOMOHIRO ,  ODAKA HIDEFUMI ,  AOMINE NOBUTAKA ,  MIYAGI TAKAHIRA ,  SUZUKI KENICHI

IPC分类号： C03C17/34 ,  B32B9/00 ,  G02B1/11

CPC分类号： C03C17/3417 ,  C03C2217/734 ,  G02B1/11

摘要： A glass with an antireflection film, wherein the glass with the antireflection film includes a glass substrate having a first surface and a second surface, and a first laminated film located on the first surface of the glass substrate, wherein the first laminated film includes, from a side close to the first surface of the glass substrate, a first layer, a second layer, and an outermost layer, wherein the second layer is located adjacent to the first layer, wherein the outermost layer is formed of zirconia-doped silica, and wherein a layer that does not include silica is located immediately below the outermost layer.

摘要翻译： 1。一种带有防反射膜的玻璃，其中，所述带有防反射膜的玻璃包括具有第一表面和第二表面的玻璃基板以及位于所述玻璃基板的第一表面上的第一层压膜，其中所述第一层压膜包括 靠近玻璃基板的第一表面的一侧，第一层，第二层和最外层，其中第二层位于第一层附近，其中最外层由氧化锆掺杂的二氧化硅形成，以及 其中不包括二氧化硅的层位于最外层的正下方。