公开(公告)号：EP4165472A1

公开(公告)日：2023-04-19

申请号：EP21731762.7

申请日：2021-06-09

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  VAN BERKEL, Koos ,  VAN DE KERKHOF, Marcus, Adrianus ,  HAMELINCK, Roger, Franciscus, Mattheus, Maria ,  SHERVIN, Shahab ,  VERSCHUREN, Marinus, Augustinus, Christiaan ,  ENGELEN, Johannes, Bernardus, Charles ,  KRUIZINGA, Matthias ,  UITTERDIJK, Tammo ,  GALAKTIONOV, Oleksiy, Sergiyovich ,  JANSSEN, Kjeld, Gertrudus, Hendrikus ,  PIJNENBURG, Johannes, Adrianus, Cornelis, Maria ,  VAN DELFT, Peter

IPC分类号： G03F7/20

公开(公告)号：EP4134748A1

公开(公告)日：2023-02-15

申请号：EP21191135.9

申请日：2021-08-12

申请人： ASML Netherlands B.V.

发明人： HUANG, Zhuangxiong ,  GUAN, Tiannan ,  ENGELEN, Johannes, Bernardus, Charles ,  NAKIBOGLU, Günes ,  KRUIZINGA, Matthias ,  VAN GILS, Petrus, Jacobus, Maria ,  TRALLI, Aldo ,  DE VRIES, Sjoerd, Frans ,  TEUNISSEN, Marcel, Maria, Cornelius, Franciscus ,  BRULS, Richard, Joseph ,  VAN DER MEULEN, Frits

IPC分类号： G03F7/20 ,  H01L21/683

摘要： The invention relates to an electrostatic holder comprising:
- a body, and
- a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object,
wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：EP4121819A1

公开(公告)日：2023-01-25

申请号：EP21706970.7

申请日：2021-02-25

申请人： ASML Netherlands B.V.

发明人： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  ENGELEN, Johannes, Bernardus, Charles ,  NOTENBOOM, Arnoud, Willem ,  OVERKAMP, Jim, Vincent ,  JANSSEN, Kjeld, Gertrudus, Hendrikus ,  PIJNENBURG, Johannes, Adrianus, Cornelis, Maria ,  VAN DUIVENBODE, Jeroen ,  NIEUWENHUIS, Erik, Johannes ,  VAN BERKEL, Koos

IPC分类号： G03F7/20 ,  H01L21/683 ,  H01L21/687

公开(公告)号：EP4390542A1

公开(公告)日：2024-06-26

申请号：EP22216468.3

申请日：2022-12-23

申请人： ASML Netherlands B.V.

发明人： ZHU, Jianqiang ,  ENGELEN, Johannes, Bernardus, Charles ,  KRUIZINGA, Matthias ,  ALLSOP, Nicholas Alan ,  KOEVOETS, Adrianus, Hendrik ,  GALAKTIONOV, Oleksiy, Sergiyovich ,  VAN DER WEKKEN, Michael, Christiaan ,  WARMING, Till

IPC分类号： G03F7/00 ,  H01L21/687

CPC分类号： G03F7/707 ,  H01L21/6875 ,  G03F7/7095 ,  H01L21/68757

摘要： An object table comprising a base having a planar surface, a substrate support or patterning device support comprising a clamp and a set of burls, the burls extending from the clamp and having distal ends adjacent to the planar surface of the base, wherein, the object table further comprises a compliant layer disposed between the burl distal ends and the planar surface of the base and a frictional layer which is in contact with the compliant layer.