SUBSTRATE PROCESSING APPARATUS AND METHOD
    10.
    发明公开
    SUBSTRATE PROCESSING APPARATUS AND METHOD 审中-公开
    基板处理装置和方法

    公开(公告)号:EP2473351A1

    公开(公告)日:2012-07-11

    申请号:EP10747868.7

    申请日:2010-09-02

    Abstract: Apparatus for processing a substrate (150) comprising: - support means (131) to support the substrate (150); - input means (111) able to position the support means (131) in a first position; - inspection means (200) able to detect location and orientation data of the substrate (150) disposed on the support means (131) in the first position ("1", "3"); - at least a first processing head (102) able to perform, in a second position ("2", "4"), a first process; - at least a second processing head (202) able to perform, in a third position ("5"), a second process, different from the first process; - movement means (140) able to move the support means (131) at least from the first position ("1", '3") to the second position ("2", "4") and between the second position ("2' "4") and third position ("5"); the support means (131) and the at least one second processing head (202) are reciprocally configured so as to keep the substrate (150) on the same support means (131) during the second process also.

    Abstract translation: 用于处理衬底(150)的设备,包括: - 支撑装置(131),用于支撑衬底(150); - 输入装置(111),其能够将所述支撑装置(131)定位在第一位置; - 能够检测在第一位置(“1”,“3”)中设置在支撑装置(131)上的衬底(150)的位置和取向数据的检测装置(200) - 至少第一处理头(102),其能够在第二位置(“2”,“4”)中执行第一处理; - 至少第二处理头(202),其能够在第三位置(“5”)中执行与第一处理不同的第二处理; - 能够将支撑装置(131)至少从第一位置(“1”,“3”)移动到第二位置(“2”,“4”)并且在第二位置(“ 2'“4”)和第三位置(“5”); 支撑装置(131)和至少一个第二处理头(202)被相互配置以便在第二处理期间也将衬底(150)保持在相同的支撑装置(131)上。

Patent Agency Ranking