公开(公告)号：EP1390783A2

公开(公告)日：2004-02-25

申请号：EP02738037.7

申请日：2002-05-08

申请人： Carl Zeiss ,  Carl Zeiss SMT AG

发明人： KRÄHMER, Daniel ,  GRUNER, Toralf ,  ULRICH, Wilhelm ,  ENKISCH, Birgit ,  GERHARD, Michael ,  BRUNOTTE, Martin ,  WAGNER, Christian ,  KAISER, Winfried ,  MAUL, Manfred ,  ZACZEK, Christoph

IPC分类号： G02B3/00

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： A lens system, especially a projection lens system for a microlithographic projection illumination system, comprising at least one fluoride crystal lens. The disruptive influence of birefringence is reduced by using a lens which is a lens (100) with a lens axis which is approximately perpendicular in relation to the crystal planes {100} or the equivalent crystal planes of the fluoride crystal. In lens systems consisting of at least two fluoride crystal lenses, it is useful to arrange the fluoride crystal lenses in such a way that they are twisted in relation to each other. The lens axes of the fluoride crystal lenses can thus point in crystal direction (111) or (110), in addition to direction (100). It is also possible to reduce the disruptive influence of birefringence by using groups with twisted (100) lenses and groups with other twisted lenses (111) or other twisted (110) lenses. The disruptive influence of birefringence can be reduced further by providing the optical element with a compensating coating.

公开(公告)号：EP1984788A1

公开(公告)日：2008-10-29

申请号：EP07703501.2

申请日：2007-02-16

申请人： Carl Zeiss SMT AG

发明人： WOLF, Oliver ,  SIEKMANN, Heiko ,  KALCHBRENNER, Eva ,  RENNON, Siegfried ,  WANGLER, Johannes ,  BRESAN, Andre ,  GERHARD, Michael ,  HAVERKAMP, Nils ,  SCHOLZ, Axel ,  SCHARNWEBER, Ralf ,  LAYH, Michael ,  BURKART, Stefan

IPC分类号： G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70075 ,  Y10T83/0304 ,  Y10T83/04

摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V1 to V4). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.

公开(公告)号：EP1015931B1

公开(公告)日：2006-03-29

申请号：EP99929277.4

申请日：1999-06-18

申请人： Carl Zeiss SMT AG

发明人： GABER, Erwin ,  WAGNER, Christian ,  HOLDERER, Hubert ,  GERHARD, Michael ,  MERZ, Erich ,  BECKER, Jochen ,  SCHEIBERLICH, Arie, Cormelis

IPC分类号： G02B7/02 ,  G02B26/06 ,  G03F7/20

CPC分类号： G03F7/70825 ,  G02B7/023 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70783

摘要： The invention relates to an optical system, especially a projection light facility for microlithography, especially with an image field shaped as a slit or with non rotational symmetry illumination, comprising an optical element (1), especially a lens or a mirror, which is arranged in a mount (2) and actuators (3) which engage with the optical element (1) at least nearly perpendicular to the optical axis. The actuators (3) effect non rotational symmetric forces and/or moments deviating from the radial lines in the optical element (1) to generate deformations with substantially no changes in thickness. Image errors arising as a result of asymmetric heating of the optical system are compensated for by deformation of the optical element.

公开(公告)号：EP2100191A1

公开(公告)日：2009-09-16

申请号：EP07856950.6

申请日：2007-12-20

申请人： Carl Zeiss SMT AG

发明人： GERHARD, Michael

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70075 ,  G03F7/70083

摘要： An optical element serves to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam (26) hitting the optical element. The optical element has a spatial optical structure (16) which generates a first part of the influence exerted on the nominal beam angle when exposed to the radiation beam (26). An optical coating (24) applied on the spatial optical structure or on a carrier layer carrying the spatial optical structure (16) causes a defined attenuation of parts of the radiation beam (26) when exposed to the latter, thus resulting in a second part of the influence exerted on the nominal beam angle. The optical effects of the structure (16) and the coating (24) are such that they complement each other in influencing the nominal beam angle. The manufacturing effort required to obtain this effect is quite low. Moreover, this leads to new possibilities in terms of influencing the nominal beam angle.

公开(公告)号：EP1984789A1

公开(公告)日：2008-10-29

申请号：EP07722838.5

申请日：2007-02-16

申请人： Carl Zeiss SMT AG

发明人： DEGÜNTHER, Markus ,  LAYH, Michael ,  GERHARD, Michael ,  THOME, Bruno ,  SINGER, Wolfgang

IPC分类号： G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70191

摘要： An illumination system (5) for microlithography serves for the illumination of an illumination field (3). A light distribution device (9, 10) that is preferably used generates a two-dimensional intensity distribution in a first illumination plane (11). A first raster arrangement (12) composed of optical raster elements generates a raster arrangement of secondary light sources. A device having an additional optical action is assigned to the two raster arrangement (12; 16) in a spatially adjacent manner, which device may be formed as an illumination angle variation device (14). The device (14) having an additional optical action influences the intensity and/or the phase and/or the beam direction of the illumination light (8). This influencing is such that an intensity contribution of raster elements (23, 28) to the total illumination intensity varies over the illumination field (3). This can influence the illumination intensity over the illumination field in a targeted manner with regard to the total illumination intensity and/or with regard to the intensity contributions from different illumination directions.

公开(公告)号：EP1407325A1

公开(公告)日：2004-04-14

申请号：EP02762307.3

申请日：2002-06-27

申请人： Carl Zeiss SMT AG

发明人： GERHARD, Michael ,  KRÄHMER, Daniel

IPC分类号： G03F7/20 ,  G02B1/02 ,  G02B1/08 ,  G02B27/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70966

摘要： The invention relates to a lens (1), in particular a projection lens for a micro-lithography projection exposure system, composed of at least one first group (3) of lenses (7) or lens sections consisting of a first crystal material and of at least one second group (5) of lenses (11) or lens sections consisting of a second crystal material. An outer aperture beam (15) is subjected to a first optical path difference for two mutually perpendicular linear polarisation states in the first group (3) and a second optical path difference in the second group (5). The two optical path differences approximately compensate one another, as a result of the different crystal materials. This can be achieved in particular with calcium fluoride as the first crystal material and barium fluoride as the second crystal material.

公开(公告)号：EP1095315A1

公开(公告)日：2001-05-02

申请号：EP99929261.8

申请日：1999-06-17

申请人： Carl Zeiss ,  CARL ZEISS-STIFTUNG HANDELND ALS CARL ZEISS

发明人： GERHARD, Michael ,  ZEHETBAUER, Marcus ,  DIECKMANN, Nils ,  SCHRIEVER, Martin ,  SIELER, Christine ,  REISINGER, Gerd

IPC分类号： G03F7/20 ,  B08B7/00

CPC分类号： G03F7/70883 ,  B08B7/0057 ,  G03F7/7005 ,  G03F7/70925

摘要： The invention relates to a method for decontaminating microlithography projection lighting devices with optical elements (2) or parts thereof, especially the surfaces of optical elements, wherein a UV-light and a fluid are used. A second UV-light source (5) is directed towards at least one part of the optical element (2) during exposure pauses for decontamination.

公开(公告)号：EP1015931A2

公开(公告)日：2000-07-05

申请号：EP99929277.4

申请日：1999-06-18

申请人： Carl Zeiss ,  Carl Zeiss Stiftung Trading as Carl Zeiss

发明人： GABER, Erwin ,  WAGNER, Christian ,  HOLDERER, Hubert ,  GERHARD, Michael ,  MERZ, Erich ,  BECKER, Jochen ,  SCHEIBERLICH, Arie, Cormelis

IPC分类号： G02B7/02 ,  G02B26/06 ,  G03F7/20

CPC分类号： G03F7/70825 ,  G02B7/023 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70783

摘要： The invention relates to an optical system, especially a projection light facility for microlithography, especially with an image field shaped as a slit or with non rotational symmetry illumination, comprising an optical element (1), especially a lens or a mirror, which is arranged in a mount (2) and actuators (3) which engage with the optical element (1) at least nearly perpendicular to the optical axis. The actuators (3) effect non rotational symmetric forces and/or moments deviating from the radial lines in the optical element (1) to generate deformations with substantially no changes in thickness. Image errors arising as a result of asymmetric heating of the optical system are compensated for by deformation of the optical element.

公开(公告)号：EP2382510B1

公开(公告)日：2017-03-15

申请号：EP10701208.0

申请日：2010-01-25

申请人： Carl Zeiss SMT GmbH

发明人： SCHOLZ, Axel ,  SCHLESENER, Frank ,  HAVERKAMP, Nils ,  DAVYDENKO, Vladimir ,  GERHARD, Michael ,  ZIEGLER, Gerhard-Wilhelm ,  KERN, Mirco ,  BISCHOFF, Thomas ,  STAMMLER, Thomas ,  KELLNER, Stephan ,  MAUL, Manfred ,  WALLDORF, Daniel ,  HUREVICH, Igor ,  DEGÜNTHER, Markus

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

公开(公告)号：EP2100191B1

公开(公告)日：2015-11-11

申请号：EP07856950.6

申请日：2007-12-20

申请人： Carl Zeiss SMT GmbH

发明人： GERHARD, Michael

IPC分类号： G02B5/18

CPC分类号： G03F7/70191 ,  G03F7/70075 ,  G03F7/70083