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    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    2.
    发明公开
    OPTICAL SYSTEM OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
    的微光刻曝光系统光学系统

    公开(公告)号：EP1924890A1

    公开(公告)日：2008-05-28

    申请号：EP06793489.3

    申请日：2006-09-13

    申请人： Carl Zeiss SMT AG

    发明人： TOTZECK, Michael ,  BEDER, Susanne ,  CLAUSS, Wilfried ,  FELDMANN, Heiko ,  KRÄHMER, Daniel ,  DODOC, Aurelian

    IPC分类号： G03F7/20

    CPC分类号： G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

    摘要： An optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, according to one aspect of the present invention has an optical system axis (OA) and at least one element group (200) consisting of three birefringent elements (211 ,212,213) each of which being made of optically uniaxial material and having an aspheric surface, wherein a first birefringent element (211 ) of said group has a first orientation of its optical crystal axis, a second birefringent element (212) of said group has a second orientation of its optical crystal axis, wherein said second orientation can be described as emerging from a rotation of said first orientation, said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element (213) of said group has a third orientation of its optical crystal axis, wherein said third orientation can be described as emerging from a rotation of said second orientation said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    OBJECTIVE WITH BIREFRINGENT LENSES
    7.
    发明公开
    OBJECTIVE WITH BIREFRINGENT LENSES 审中-公开
    带双断路镜头镜头

    公开(公告)号：EP1535100A1

    公开(公告)日：2005-06-01

    申请号：EP02807753.5

    申请日：2002-12-20

    申请人： Carl Zeiss SMT AG

    发明人： TOTZECK, Michael ,  KAMENOV, Vladimir ,  KRÄHMER, Daniel ,  ULRICH, Wilhelm

    IPC分类号： G02B13/14 ,  G02B5/30 ,  G03F7/20

    CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966

    摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101-L107, L110-L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101-L107, L110-L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101-L107, L110-L128), outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101-L107, L110-L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101-L07, L110-L128).

    KOMPENSATION DER DOPPELBRECHUNG IN EINEM OBJEKTIV MIT KRISTALL-LINSEN
    8.
    发明公开
    KOMPENSATION DER DOPPELBRECHUNG IN EINEM OBJEKTIV MIT KRISTALL-LINSEN 审中-公开
    双断作者用水晶镜片镜片补偿

    公开(公告)号：EP1407325A1

    公开(公告)日：2004-04-14

    申请号：EP02762307.3

    申请日：2002-06-27

    申请人： Carl Zeiss SMT AG

    发明人： GERHARD, Michael ,  KRÄHMER, Daniel

    IPC分类号： G03F7/20 ,  G02B1/02 ,  G02B1/08 ,  G02B27/00

    CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70966

    摘要： The invention relates to a lens (1), in particular a projection lens for a micro-lithography projection exposure system, composed of at least one first group (3) of lenses (7) or lens sections consisting of a first crystal material and of at least one second group (5) of lenses (11) or lens sections consisting of a second crystal material. An outer aperture beam (15) is subjected to a first optical path difference for two mutually perpendicular linear polarisation states in the first group (3) and a second optical path difference in the second group (5). The two optical path differences approximately compensate one another, as a result of the different crystal materials. This can be achieved in particular with calcium fluoride as the first crystal material and barium fluoride as the second crystal material.