Method of forming solder bumps on an integrated circuit flip chip
    3.
    发明公开
    Method of forming solder bumps on an integrated circuit flip chip 失效
    HerstellungsverfahrenfürLöthöcker一个倒装芯片整合的Schaltungen。

    公开(公告)号:EP0655779A1

    公开(公告)日:1995-05-31

    申请号:EP94203167.5

    申请日:1994-10-31

    Abstract: A method of forming solder bumps (56) for use as terminals of an integrated circuit flip chip encompasses the use of a photoresist (52) which can be selectively patterned (54) with known photoengraving techniques, through which a preformulated solder composition can be accurately and selectively deposited on the surface (50) of the flip chip. A dry film photoresist (52) is used as a mask to apply a solder paste (56), such that precise registration, fine pitch bump arrays, and precise bump size control are possible. Precise control of the composition of the solder bumps (58) is also enabled, which relies on processing techniques which minimise processing costs. The process does not generate chlorofluorocarbons.

    Abstract translation: 形成用作集成电路倒装芯片的端子的焊料凸块(56)的方法包括使用可以用已知的光刻技术选择性地图案化(54)的光致抗蚀剂(52),通过该技术可以预先制备出的焊料组合物 并且选择性地沉积在倒装芯片的表面(50)上。 使用干膜光致抗蚀剂(52)作为掩模来施加焊膏(56),使得精确配准,细间距凸块阵列和精确的凸块尺寸控制是可能的。 也可以精确控制焊料凸块(58)的组成,这依赖于最小化加工成本的加工技术。 该方法不产生氯氟烃。

Patent Agency Ranking