公开(公告)号：EP2024733A4

公开(公告)日：2011-04-06

申请号：EP07798253

申请日：2007-06-07

申请人： FEI CO

发明人： BIERHOFF MART PETRUS MARIA ,  BUIJSSE BART ,  KOOIJMAN CORNELIS SANDER ,  VAN LEEUWEN HUGO ,  TAPPEL HENDRIK GEZINUS ,  SANFORD COLIN AUGUST ,  STOKS SANDER RICHARD MARIE ,  BERGER STEVEN ,  BORMANS BEN JACOBUS MARIE ,  DRIESSEN KOEN ARNOLDUS WILHELMUS ,  PERSOON JOHANNES ANTONIUS HENDRICUS W G

IPC分类号： H01J37/28 ,  F16J15/50

CPC分类号： H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP2024732A4

公开(公告)日：2011-03-30

申请号：EP07798251

申请日：2007-06-07

申请人： FEI CO

发明人： BIERHOFF MART PETRUS MARIA ,  BUIJSSE BART ,  KOOIJMAN CORNELIS SANDER ,  VAN LEEUWEN HUGO ,  TAPPEL HENDRIK GEZINUS ,  SANFORD COLIN AUGUST ,  STOKS SANDER RICHARD MARIE ,  BERGER STEVEN ,  BORMANS BEN JACOBUS MARIE ,  DRIESSEN KOEN ARNOLDUS WILHELMUS ,  PERSOON JOHANNES ANTONIUS HENDRICUS WILHELMUS G

IPC分类号： H01J37/28 ,  F16J15/50

CPC分类号： H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP1586007A4

公开(公告)日：2009-06-10

申请号：EP04702994

申请日：2004-01-16

申请人： FEI CO

发明人： STEWART DIANE K ,  CASEY J DAVID JR ,  BEATY JOHN ,  MUSIL CHRISTIAN R ,  BERGER STEVEN ,  SIJBRANDIJ SYBREN J

IPC分类号： B01J19/08 ,  C03C15/00 ,  C23F1/00 ,  C23F1/02 ,  C23F3/00 ,  G03F20060101 ,  G03F1/00 ,  G03F9/00 ,  G21K5/10 ,  H01L21/027

CPC分类号： G03F1/74 ,  H01J2237/31744

摘要： Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentration of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100% although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolitography masks.

公开(公告)号：EP2024750A4

公开(公告)日：2011-04-06

申请号：EP07798254

申请日：2007-06-07

申请人： FEI CO

发明人： BIERHOFF MART PETRUS MARIA ,  BUIJSSE BART ,  KOOIJMAN CORNELIS SANDER ,  VAN LEEUWEN HUGO ,  TAPPEL HENDRIK GEZINUS ,  SANFORD COLIN AUGUST ,  STOKS SANDER RICHARD MARIE ,  BERGER STEVEN ,  BORMANS BEN JACOBUS MARIE ,  DRIESSEN KOEN ARNOLDUS WILHELMUS ,  PERSOON JOHANNES A H W G

IPC分类号： H01J37/28 ,  F16J15/50

CPC分类号： H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

摘要： A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP1540665A4

公开(公告)日：2008-02-13

申请号：EP03756838

申请日：2003-09-18

申请人： FEI CO

发明人： STEWART DIANE K ,  CASEY JR J DAVID ,  BEATY JOHN ,  MUSIL CHRISTIAN R ,  BERGER STEVEN

IPC分类号： G21G5/00 ,  A61N5/00 ,  C23C14/00 ,  G03F1/00 ,  G03F9/00 ,  G06K20060101 ,  G06K9/00 ,  H01J37/00 ,  H01L21/027

CPC分类号： G03F1/74 ,  G03F1/72

摘要： Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle.