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1.SELECTIVE IMPLEMENTATION OF BARRIER LAYERS TO ACHIEVE THRESHOLD VOLTAGE CONTROL IN CMOS DEVICE FABRICATION WITH HIGH K DIELECTRICS 有权
Title translation: 层层壁垒的选择性实施旨在实现阈值电压控制在CMOS元件具有高K电介质的生产公开(公告)号:EP1766691A4
公开(公告)日:2011-06-29
申请号:EP05732384
申请日:2005-03-30
Applicant: IBM
Inventor: BOJARCZUK NESTOR A JR , CABRAL CYRIL JR , CARTIER EDUARD A , COPEL MATTHEW W , FRANK MARTIN M , GOUSEV EVGENI P , GUHA SUPRATIK , JAMMY RAJARAO , NARAYANAN VIJAY , PARUCHURI VAMSI K
IPC: H01L31/113 , H01L21/28 , H01L21/8238 , H01L29/49 , H01L29/51 , H01L31/119
CPC classification number: H01L29/513 , H01L21/28079 , H01L21/28088 , H01L21/823857 , H01L29/495 , H01L29/4966 , H01L29/517
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2.LOW THRESHOLD VOLTAGE SEMICONDUCTOR DEVICE WITH DUAL THRESHOLD VOLTAGE CONTROL MEANS 审中-公开
Title translation: 用双阈值电压控制装置低阈值电压半导体部件公开(公告)号:EP1949447A4
公开(公告)日:2009-11-11
申请号:EP06825854
申请日:2006-10-12
Applicant: IBM
Inventor: CARTER EDUARD A , COPEL MATTHEW W , FRANK MARTIN M , GOUSEV EVGENI P , JAMISON PAUL C , JAMMY RAJARAO , LINDER BARRY P , NARAYANAN VIJAY
CPC classification number: H01L29/513 , H01L21/28194 , H01L21/28238 , H01L21/823807 , H01L29/105 , H01L29/1083 , H01L29/517 , H01L29/518 , H01L29/6659 , H01L29/7833
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3.USING METAL/METAL NITRIDE BILAYERS AS GATE ELECTRODES IN SELF-ALIGNED AGGRESSIVELY SCALED CMOS DEVICES 有权
Title translation: 金属/金属氮化物双层AS栅极电极的自对准AGGRESSIVE缩放CMOS组件使用公开(公告)号:EP1872407A4
公开(公告)日:2011-09-14
申请号:EP06750529
申请日:2006-04-18
Applicant: IBM
Inventor: CARTIER EDUARD A , COPEL MATTHEW W , DORIS BRUCE B , JAMMY RAJARAO , KIM YOUNG-HEE , LINDER BARRY P , NARAYANAN VIJAY , PARUCHURI VAMSI K , WONG KEITH KWONG HON
IPC: H01L21/84 , H01L21/8238 , H01L27/092
CPC classification number: H01L21/823842
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