公开(公告)号：EP2767562A1

公开(公告)日：2014-08-20

申请号：EP12840738.4

申请日：2012-10-09

申请人： Nissan Chemical Industries, Ltd.

发明人： HATANAKA, Tadashi ,  ISHIDA, Tomohisa ,  YUKAWA, Shojiro

IPC分类号： C08L101/02 ,  C08K5/23 ,  G02B5/30

CPC分类号： G02B5/3083 ,  C08F120/04 ,  C08F120/28 ,  C08J7/047 ,  C08J2301/12 ,  C08J2400/105 ,  C08J2400/106 ,  C08K5/05 ,  C08K5/23 ,  C08L101/02 ,  C09D7/65 ,  C09D201/025 ,  C09D201/08 ,  G02B1/08 ,  G02B5/3016 ,  G02F1/133528

摘要： There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material. The cured-film formation composition comprises a component (A) that is a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; a component (B) that is a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and a component (C) that is a cross-linking agent that reacts with the component (A) and the component (B) and reacts at a temperature lower than a sublimation temperature of the component (A), wherein when the component (B) is an acrylic polymer, the cured-film formation composition further comprises a component (E) that is an adhesion enhancing component. The cross-linking agent of the component (C) may be more hydrophilic than the component (A). The orientation material is formed by forming a cured film with the cured-film formation composition and utilizing photo-alignment technique. The retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.

摘要翻译： 提供形成具有优异的光反应效率和耐溶剂性，高粘合性的固化膜，用于光取向的取向材料和由取向材料形成的延迟材料的固化膜形成用组合物。 固化膜形成用组合物含有作为具有光取向性基团和1个从羟基，羧基和氨基中选择的取代基的化合物的成分（A） 作为具有选自羟基，羧基和氨基中的1个以上取代基的亲水性高分子的成分（B） （A）和成分（B）反应并在低于成分（A）的升华温度的温度下反应的成分（C），其中当成分（B） ）为丙烯酸类聚合物时，固化膜形成用组合物进一步含有作为密合性提高成分的成分（E）。 组分（C）的交联剂可以比组分（A）更具亲水性。 取向材料通过用固化膜形成组合物形成固化膜并利用光取向技术来形成。 相位差材料是通过在取向材料上涂布聚合性液晶并使其固化而得到的。

公开(公告)号：EP2711774B1

公开(公告)日：2017-03-29

申请号：EP12789179.4

申请日：2012-05-09

申请人： Nissan Chemical Industries, Ltd.

发明人： YUKAWA, Shojiro

IPC分类号： G03F7/023 ,  C08F12/22 ,  G03F7/004

CPC分类号： C08F26/06 ,  C08F12/08 ,  C08F12/22 ,  C08F212/14 ,  G03F7/0005 ,  G03F7/0233 ,  C08F222/40 ,  C08F212/08

摘要： There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition comprising: a polymer (A) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol% to 100 mol% of a total molar number of unit structures constituting the polymer; and a photosensitizer (B). The polymer (A) preferably has a weight average molecular weight of 1,000 to 50,000. A cured film obtained from the photosensitive resin composition. A microlens prepared from the photosensitive resin composition.

公开(公告)号：EP2302456B1

公开(公告)日：2015-09-02

申请号：EP09797841.5

申请日：2009-07-07

申请人： Nissan Chemical Industries, Ltd.

发明人： YUKAWA, Shojiro ,  KISHIOKA, Takahiro ,  SAKAGUCHI, Takahiro ,  SODA, Hiroyuki

IPC分类号： G03F7/023 ,  G02B3/00 ,  G03F7/09 ,  G03F7/40

CPC分类号： G03F7/0233 ,  C08F2/48 ,  C08F212/32 ,  C09D125/08 ,  G02B3/0012 ,  G03F7/094 ,  G03F7/40 ,  C08F220/06 ,  C08F212/08 ,  C08F212/14

公开(公告)号：EP2767562A9

公开(公告)日：2014-11-12

申请号：EP12840738.4

申请日：2012-10-09

申请人： Nissan Chemical Industries, Ltd.

发明人： HATANAKA, Tadashi ,  ISHIDA, Tomohisa ,  YUKAWA, Shojiro

IPC分类号： C08L101/02 ,  C08K5/23 ,  G02B5/30

CPC分类号： G02B5/3083 ,  C08F120/04 ,  C08F120/28 ,  C08J7/047 ,  C08J2301/12 ,  C08J2400/105 ,  C08J2400/106 ,  C08K5/05 ,  C08K5/23 ,  C08L101/02 ,  C09D7/65 ,  C09D201/025 ,  C09D201/08 ,  G02B1/08 ,  G02B5/3016 ,  G02F1/133528

摘要： There is provided a cured-film formation composition that forms a cured film having excellent photoreaction efficiency and solvent resistance, and high adhesion, an orientation material for photo-alignment, and a retardation material formed with the orientation material. The cured-film formation composition comprises a component (A) that is a compound having a photo-aligning group and one substituent selected from a hydroxy group, a carboxy group, and an amino group; a component (B) that is a hydrophilic polymer having one or more substituents selected from a hydroxy group, a carboxy group, and an amino group; and a component (C) that is a cross-linking agent that reacts with the component (A) and the component (B) and reacts at a temperature lower than a sublimation temperature of the component (A), wherein when the component (B) is an acrylic polymer, the cured-film formation composition further comprises a component (E) that is an adhesion enhancing component. The cross-linking agent of the component (C) may be more hydrophilic than the component (A). The orientation material is formed by forming a cured film with the cured-film formation composition and utilizing photo-alignment technique. The retardation material is obtained by applying a polymerizable liquid crystal on the orientation material and curing it.

公开(公告)号：EP2711774A1

公开(公告)日：2014-03-26

申请号：EP12789179.4

申请日：2012-05-09

申请人： Nissan Chemical Industries, Ltd.

发明人： YUKAWA, Shojiro

IPC分类号： G03F7/023 ,  C08F12/22 ,  G03F7/004

CPC分类号： C08F26/06 ,  C08F12/08 ,  C08F12/22 ,  C08F212/14 ,  G03F7/0005 ,  G03F7/0233 ,  C08F222/40 ,  C08F212/08

摘要： There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition comprising: a polymer (A) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol% to 100 mol% of a total molar number of unit structures constituting the polymer; and a photosensitizer (B). The polymer (A) preferably has a weight average molecular weight of 1,000 to 50,000. A cured film obtained from the photosensitive resin composition. A microlens prepared from the photosensitive resin composition.

公开(公告)号：EP2530524A1

公开(公告)日：2012-12-05

申请号：EP11736902.5

申请日：2011-01-19

申请人： Nissan Chemical Industries, Ltd.

发明人： YUKAWA, Shojiro ,  ARASE, Shinya ,  TAKEYAMA, Toshiaki ,  ENDO, Yuki ,  MORO, Takeo

IPC分类号： G03F7/004 ,  G02B3/00 ,  G03F7/023

CPC分类号： G02B3/0012 ,  C07D405/06 ,  C07D405/14 ,  G03F7/0226 ,  G03F7/0233

摘要： There is provided a resist composition suitable for forming a microlens which is excellent in transparency, heat resistance, and sensitivity characteristics, excellent in solubility in a developer, and as the result thereof has high resolution. A positive resist composition comprising: a component (A): an alkali-soluble polymer; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; a component (C): a crosslinkable compound of Formula (1):

[where R 1 , R 2 , and, R 3 are independently a C 1-6 alkylene group or oxyalkylene group which are optionally branched; and E 1 , E 2 , and E 3 are independently a group containing a structure of Formula (2) or Formula (3):


(where R 4 is a hydrogen atom or a methyl group)]; and a component (D): a solvent.

摘要翻译： 提供了适于形成透明性，耐热性和灵敏度特性优异，在显影剂中溶解性优异的微透镜的抗蚀剂组合物，其结果是具有高分辨率。 一种正型抗蚀剂组合物，其包含：组分（A）：碱溶性聚合物; 成分（B）：具有被光解以产生碱溶性基团的有机基团的化合物; 组分（C）：式（1）的可交联化合物：[其中R 1，R 2和R 3独立地为任选支化的C 1-6亚烷基或氧化烯基; 和E 1，E 2和E 3独立地是含有式（2）或式（3）的结构的基团：（其中R 4是氢原子或甲基）]; 和组分（D）：溶剂。

公开(公告)号：EP2302456A1

公开(公告)日：2011-03-30

申请号：EP09797841.5

申请日：2009-07-07

申请人： Nissan Chemical Industries, Ltd.

发明人： YUKAWA, Shojiro ,  KISHIOKA, Takahiro ,  SAKAGUCHI, Takahiro ,  SODA, Hiroyuki

IPC分类号： G03F7/023 ,  C08F12/32 ,  G02B1/04 ,  G02B3/00 ,  G02F1/1333 ,  G03F7/004

CPC分类号： G03F7/0233 ,  C08F2/48 ,  C08F212/32 ,  C09D125/08 ,  G02B3/0012 ,  G03F7/094 ,  G03F7/40 ,  C08F220/06 ,  C08F212/08 ,  C08F212/14

摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1):

where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3≤n1≤1.0.

摘要翻译： 本发明提供一种正型抗蚀剂具有优异的透明性，耐热性，和折射率的组合物特别是用于形成微透镜和形成平坦化膜 - ; 以及微透镜和平坦化膜形成为从正型抗蚀剂组合物。 一种正型抗蚀组合物，含有（A）成分：碱可溶性聚合物，其包含具有联苯结构的结构单元; 成分（B）：具有有机基团的化合物进行光分解而产生碱溶性基团; 和组分（C）：溶剂。 的正型抗蚀剂组合物worin的碱溶性聚合物作为组分（A）是包含式结构单元的聚合物（1）：其中，当假定构成聚合物（A）的结构单元的总数设为1.0时， （1）构成式单元结构的比N1的聚合物（A）SATIS外资企业0.3‰‰¤1.0¤n1。