VERFAHREN UND VORRICHTUNG ZUR TROCKNUNG VON SCHALTUNGSSUBSTRATEN
    1.
    发明授权
    VERFAHREN UND VORRICHTUNG ZUR TROCKNUNG VON SCHALTUNGSSUBSTRATEN 有权
    方法和设备进行干燥的电路基板

    公开(公告)号:EP1697980B1

    公开(公告)日:2009-08-12

    申请号:EP04803007.6

    申请日:2004-12-22

    IPC分类号: H01L21/306 F26B3/30

    CPC分类号: H01L21/67034 F26B3/30

    摘要: The invention relates to a method and to a device for drying circuit substrates (13), in particular semi-conductor substrates. According to the invention, a circuit surface (30) is rinsed by means of a rinsing liquid (10) during a rinsing phase and is dried in a subsequent drying phase. In the rinsing phase, the circuit substrate is displaced in a direction of the flat extension thereof, transversally and in relation to a liquid level (28) of the rinsing liquid mirror, in such a manner that a liquid meniscus is formed in a transition area which varies according to the relative movement thereof, between the circuit surface and the liquid level, and the transition area moistened by the liquid meniscus is impinged upon by thermal radiation (36) in the drying phase.

    OPTISCHES SYSTEM MIT EINER KAMERAEEINRICHTUNG ZUR BETRACHTUNG MEHERERER ENTFERNT VONEINANDER ANGEORDNETER GEGENSTÄNDE
    2.
    发明公开
    OPTISCHES SYSTEM MIT EINER KAMERAEEINRICHTUNG ZUR BETRACHTUNG MEHERERER ENTFERNT VONEINANDER ANGEORDNETER GEGENSTÄNDE 审中-公开
    选择系统MIT EINER KAMERAEEINRICHTUNG ZUR BETACHACHUNG MEHERERER ENTFERNT VINEINANDER ANGEORDNETERGEGENSTÄNDE

    公开(公告)号:EP1706771A1

    公开(公告)日:2006-10-04

    申请号:EP04803006.8

    申请日:2004-12-22

    CPC分类号: G02B27/143 G02B27/144

    摘要: The invention relates to an optical system (40), for viewing several objects (61, 63), arranged remotely from each other, by means of a camera device (42), comprising a first prism device (43), on the optical axis (41) and in the beam path (47) of the camera device, for the generation of two part beam paths (48, 49) and two object prism devices (51, 52), each arranged in a part beam path and each provided for one object. Both the outlet prism (51) and also the outlet prism (52) are provided with an illumination device embodied as a light diode (57 or 58), each of which emits a illumination beam (59, 60). Said arrangement clearly permits, by means of a inspection device (40) inserted in a contact gap (65) between two substrates (62, 63), checking of the correct alignment of two contact surfaces (61, 63) for mutual contacting, or aligning the contact surfaces (61, 63) with relation to a contact axis (66) which corresponds to the axis of the partial beam paths (49, 48).

    摘要翻译: 本发明涉及一种光学系统(40),用于借助于包括第一棱镜装置(43)的照相机装置(42)来观看彼此远离地布置的多个物体(61,63),所述第一棱镜装置在光轴上 (41)和相机装置的光束路径(47)中,用于产生两个部分光束路径(48,49)和两个物体棱镜装置(51,52),每个物体棱镜装置布置在部分光束路径中并且每个都提供 为一个对象。 出口棱镜(51)和出口棱镜(52)都设置有构造为发光二极管(57或58)的照明装置,每个照明装置发射照明光束(59,60)。 所述装置通过插入两个基板(62,63)之间的接触间隙(65)中的检查装置(40)清楚地允许检查用于相互接触的两个接触表面(61,63)的正确对准,或者 使接触表面(61,63)相对于与部分光束路径(49,48)的轴线相对应的接触轴线(66)对准。

    VORRICHTUNG ZUM AUFBRINGEN VON LOTKUGELN
    7.
    发明授权
    VORRICHTUNG ZUM AUFBRINGEN VON LOTKUGELN 有权
    装置施加用焊球

    公开(公告)号:EP1370387B1

    公开(公告)日:2004-07-28

    申请号:EP02730154.8

    申请日:2002-04-12

    IPC分类号: B23K3/06

    摘要: The invention relates to a device for applying solder globules to a substrate (7, 9) and for remelting the solder globules onto soldering points (6) of the substrate (7, 9). Said device has a capillary (3) for guiding the solder globule (5) to the soldering point (6) and for placing the soldering globule (5) on the free end (4) of the capillary (3) opposite the smoldering point. The invention also relates to a device for guiding heat to the solder globule (5) in order to remelt said solder globule, and a pressing device (10) for holding down the substrate (7, 9) in order to prevent the substrate (7, 9) from springing back when the solder globule (5) is placed and remelted.

    BEHANDLUNGSEINRICHTUNG FÜR WAFER
    10.
    发明公开
    BEHANDLUNGSEINRICHTUNG FÜR WAFER 有权
    治疗设备晶圆

    公开(公告)号:EP1328965A1

    公开(公告)日:2003-07-23

    申请号:EP01988943.5

    申请日:2001-10-24

    IPC分类号: H01L21/00

    CPC分类号: H01L21/68728 H01L21/68735

    摘要: The invention relates to a treatment device for cleaning or ashing the surfaces of flat wafers (10). At least one flat base plate (30) is provided as an electrode in a treatment chamber (40), said treatment chamber being able to be evacuated. Troughs (31) are arranged in the base plate. Said troughs are embodied and distributed in such a way that they are suitable for receiving support pieces (20) and have at least one arrangement or position adapted to the form of the wafer to be treated. The support pieces also comprise a bearing surface. The height of the at least one bearing surface comes to rest at a level (1) above the base plate after insertion into the respective trough.