摘要:
The invention provides a CSP type semiconductor device with high reliability. The semiconductor device includes a pad electrode (4) formed on a semiconductor substrate (1), a first passivation film (5) covering an end portion of the pad electrode (4) and having a first opening (6) on the pad electrode (4), a plating layer (7) formed on the pad electrode (4) in the first opening (6), a second passivation film (9) covering an exposed portion of the pad electrode (4) between an end portion of the first passivation film (5) and the plating layer (7), covering an end portion of the plating layer (7), and having a second opening (10) on the plating layer (7), and a conductive terminal (11) formed on the plating layer (7) in the second opening (10).
摘要:
This invention provides a semiconductor device that solves a problem that a pattern of a wiring formed on a back surface of a semiconductor substrate (2) is reflected on an output image. A light receiving element (1) (e.g. a CCD, an infrared ray sensor, a CMOS sensor, or an illumination sensor) is formed on a front surface of a semiconductor substrate (2), and a plurality of ball-shaped conductive terminals (11) is disposed on a back surface of the semiconductor substrate (2). Each of the conductive terminals (11) is electrically connected to a pad electrode (e) on the front surface of the semiconductor substrate (2) through a wiring layer (9). The wiring layers (9) and the conductive terminals (11) are formed on the back surface of the semiconductor substrate (2) except in a region overlapping the light receiving element (1) in a vertical direction, and are not disposed in a region overlapping the light receiving element (1).
摘要:
The invention prevents a pad electrode (3) for external connection of a semiconductor device from being damaged. An electronic circuit, a first pad electrode (3) connected to the electronic circuit, and a second pad electrode (4) connected to the first pad electrode (3) are formed on a semiconductor substrate (1). A first protection film (5) is formed, covering the first pad electrode (3) and having an opening on the second pad electrode (4) only. A wiring layer (10) is further formed, being connected to the back surface of the first pad electrode (3) through a via hole penetrating the semiconductor substrate (1) and extending from the via hole onto the back surface of the semiconductor substrate (1).
摘要:
This invention provides a semiconductor device that solves a problem that a pattern of a wiring formed on a back surface of a semiconductor substrate (2) is reflected on an output image. A light receiving element (1) (e.g. a CCD, an infrared ray sensor, a CMOS sensor, or an illumination sensor) is formed on a front surface of a semiconductor substrate (2), and a plurality of ball-shaped conductive terminals (11) is disposed on a back surface of the semiconductor substrate (2). Each of the conductive terminals (11) is electrically connected to a pad electrode (e) on the front surface of the semiconductor substrate (2) through a wiring layer (9). The wiring layers (9) and the conductive terminals (11) are formed on the back surface of the semiconductor substrate (2) except in a region overlapping the light receiving element (1) in a vertical direction, and are not disposed in a region overlapping the light receiving element (1).
摘要:
The invention prevents a pad electrode (3) for external connection of a semiconductor device from being damaged. An electronic circuit, a first pad electrode (3) connected to the electronic circuit, and a second pad electrode (4) connected to the first pad electrode (3) are formed on a semiconductor substrate (1). A first protection film (5) is formed, covering the first pad electrode (3) and having an opening on the second pad electrode (4) only. A wiring layer (10) is further formed, being connected to the back surface of the first pad electrode (3) through a via hole penetrating the semiconductor substrate (1) and extending from the via hole onto the back surface of the semiconductor substrate (1).
摘要:
The invention provides a CSP type semiconductor device with high reliability. The semiconductor device includes a pad electrode (4) formed on a semiconductor substrate (1), a first passivation film (5) covering an end portion of the pad electrode (4) and having a first opening (6) on the pad electrode (4), a plating layer (7) formed on the pad electrode (4) in the first opening (6), a second passivation film (9) covering an exposed portion of the pad electrode (4) between an end portion of the first passivation film (5) and the plating layer (7), covering an end portion of the plating layer (7), and having a second opening (10) on the plating layer (7), and a conductive terminal (11) formed on the plating layer (7) in the second opening (10).
摘要:
The invention provides a semiconductor device that solves a problem of reflection of a pattern of a wiring (9) formed on a back surface of a semiconductor substrate (2) on an output image. A reflection layer (8) is formed between a light receiving element (1) and a wiring layer (9), that reflects an infrared ray toward a light receiving element (1) the without transmitting it to the wiring layer (9), the infrared ray entering from a light transparent substrate (6) toward the wiring layer (9) through a semiconductor substrate (2). The reflection layer (8) is formed at least in a region under the light receiving element (1) uniformly or only under the light receiving element (1). Alternatively, an anti-reflection layer having a function of absorbing the entering infrared ray to prevent transmission thereof may be formed instead of the reflection layer.
摘要:
The invention provides a semiconductor device that solves a problem of reflection of a pattern of a wiring (9) formed on a back surface of a semiconductor substrate (2) on an output image. A reflection layer (8) is formed between a light receiving element (1) and a wiring layer (9), that reflects an infrared ray toward a light receiving element (1) the without transmitting it to the wiring layer (9), the infrared ray entering from a light transparent substrate (6) toward the wiring layer (9) through a semiconductor substrate (2). The reflection layer (8) is formed at least in a region under the light receiving element (1) uniformly or only under the light receiving element (1). Alternatively, an anti-reflection layer having a function of absorbing the entering infrared ray to prevent transmission thereof may be formed instead of the reflection layer.
摘要:
The invention provides a CSP type semiconductor device with high reliability. The semiconductor device includes a pad electrode (4) formed on a semiconductor substrate (1) with insulation films (2, 3) interposed therebetween, a plating layer (7) formed on the pad electrode (4), a conductive terminal (9) formed on the plating layer and electrically connected with the pad electrode (4), and a first passivation film (5) covering the insulation films (2, 3) and a side end portion of the pad electrode (4), in which an exposed portion of the pad electrode (4) that causes corrosion is covered by forming a second passivation film (10) so as to cover the first passivation film (5), the plating layer (7), and a portion of a sidewall of the conductive terminal (9).