Abstract:
The invention provides a production method capable of forming a thin film resistance element having a thickness and a shape controlled in a high accuracy in a printed circuit board (core material). The production method of a thin film resistance element formed on a printed circuit board, has the steps of forming a thin film resistance layer having a predetermined thickness on the printed circuit board through an insulation layer by a dry process used in producing a semiconductor, forming an electrically conductive layer on the thin resistance layer, and etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. Thereby, it is possible to form the thin film resistance element having a thickness and a shape controlled in a high accuracy on the printed circuit board (core material).
Abstract:
In a printed circuit board comprising an insulative substrate 20, a first conductive layer 22 and a first insulative layer 23 formed on the insulative substrate 20 in order, a circuit pattern 25 provided in parallel with the longitudinal direction of the first conductive layer 22 and a second insulative layer 26, the printed circuit board is further composed of a plurality of grooves 27L and 27R formed on both sides of the circuit pattern 25 in the first and second insulative layers 23 and 26 so as to expose the first conductive layer 22 and a second conductive layer 28, which is formed on the second insulative layer 26 continuously from an inner wall of the one groove 27L to an inner wall of the other groove 27R so as to connect to the conductive layer 22. The conductive layer 28 connected to the conductive layer 22 through the first and second insulative layers 23 and 26 forms a structure of surrounding the circuit pattern 25.
Abstract:
In a printed circuit board comprising an insulative substrate 20, a first conductive layer 22 and a first insulative layer 23 formed on the insulative substrate 20 in order, a circuit pattern 25 provided in parallel with the longitudinal direction of the first conductive layer 22 and a second insulative layer 26, the printed circuit board is further composed of a plurality of grooves 27L and 27R formed on both sides of the circuit pattern 25 in the first and second insulative layers 23 and 26 so as to expose the first conductive layer 22 and a second conductive layer 28, which is formed on the second insulative layer 26 continuously from an inner wall of the one groove 27L to an inner wall of the other groove 27R so as to connect to the conductive layer 22. The conductive layer 28 connected to the conductive layer 22 through the first and second insulative layers 23 and 26 forms a structure of surrounding the circuit pattern 25.
Abstract:
The invention provides a production method capable of forming a thin film resistance element having a thickness and a shape controlled in a high accuracy in a printed circuit board (core material). The production method of a thin film resistance element formed on a printed circuit board, has the steps of forming a thin film resistance layer having a predetermined thickness on the printed circuit board through an insulation layer by a dry process used in producing a semiconductor, forming an electrically conductive layer on the thin resistance layer, and etching the electrically conductive layer selectively so as to make, at least, a pair of electrically conductive pads, resulting in the thin film resistance element having a predetermined value of resistivity between the pair of electrically conductive pads. Thereby, it is possible to form the thin film resistance element having a thickness and a shape controlled in a high accuracy on the printed circuit board (core material).