Copper electroplating method
    4.
    发明公开
    Copper electroplating method 审中-公开
    铜电镀法

    公开(公告)号:EP2865787A1

    公开(公告)日:2015-04-29

    申请号:EP13189652.4

    申请日:2013-10-22

    Abstract: The method for copper electroplating according to the present invention comprises an aqueous acidic copper plating bath and at least one reverse current pulse cycle consisting of one forward current pulse and one reverse current pulse wherein the fraction of the reverse charge to the forward charge applied to the substrate in said at least one current pulse cycle ranges between 0.1 to 5 %. The method is particularly suitable for simultaneously filling blind micro vias and plating trenches with a rectangular cross-sectional shape.

    Abstract translation: 根据本发明的用于电镀铜的方法包括含水酸性镀铜浴和至少一个由一个正向电流脉冲和一个反向电流脉冲组成的反向电流脉冲周期,其中反向电荷与施加到 所述至少一个电流脉冲周期中的衬底的范围在0.1至5%之间。 该方法特别适用于同时填充具有矩形横截面形状的盲孔和电镀槽。

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