Abstract:
The present invention provides a carrier-attached copper foil, wherein an ultrathin copper foil is not peeled from the carrier prior to the lamination to an insulating substrate, but can be peeled from the carrier after the lamination to the insulating substrate. A carrier-attached copper foil comprising a copper foil carrier, an intermediate layer laminated on the copper foil carrier, and an ultrathin copper layer laminated on the intermediate layer, wherein the intermediate foil is configured with a Ni layer in contact with an interface of the copper foil carrier and a Cr layer in contact with an interface of the ultrathin copper layer, said Ni layer containing 1,000-40,000 µg/dm 2 of Ni and said Cr layer containing 10-100 µg/dm 2 of Cr is provided.
Abstract:
An exemplary embodiment of the present invention relates to a conductive structure body that comprises a darkening pattern layer having AlOxNy, and a method for manufacturing the same. The conductive structure body according to the exemplary embodiment of the present invention may prevent reflection by a conductive pattern layer without affecting conductivity of the conductive pattern layer, and improve a concealing property of the conductive pattern layer by improving absorbance. Accordingly, a display panel having improved visibility may be developed by using the conductive structure body according to the exemplary embodiment of the present invention.
Abstract:
Die Erfindung betrifft ein Verfahren zur Herstellung einer Leiterbahnstruktur auf einer flexiblen Kunststofffolie (51,61,90,95), eine danach hergestellte Leiterbahnstruktur, wobei die Leiterbahnstruktur mittels einer durch Bestrahlung ausgehärteten Kleberschicht (57,93,96) mit der Kunststofffolie verbunden ist und aus einer galvanisch mit mindestens einer Metallschicht (71,72) verstärkten, musterförmigen elektrisch leitenden Dünnfilmschicht (47,94,97) gebildet ist, sowie ein elektronisches Bauelement oder eine elektronische Schaltung mit einer derartigen Leiterbahnstruktur.
Abstract:
This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.