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44 条记录 (耗时 0.012 秒)

    VAPORIZER
    4.
    发明授权
    VAPORIZER 有权
    喷雾器

    公开(公告)号：EP1427868B1

    公开(公告)日：2005-06-15

    申请号：EP02717526.4

    申请日：2002-02-28

    申请人： Porter Instrument Company, Inc.

    发明人： Porter, George ,  Wolf, Seth, B, ,  Albrecht, Charles, W,

    IPC分类号： C23C16/448 ,  B01F3/02

    CPC分类号： F22B27/16 ,  B01F3/022 ,  B01F3/04049 ,  B01F5/0413 ,  B01F2215/0096 ,  B67D2210/0006 ,  C23C16/4481 ,  C23C16/4486 ,  F16K27/003 ,  F22B27/14 ,  Y10T137/87885

    摘要： A vaporizer (64E) is provided for delivering vapor streams such as high purity streams to a processing destination, such as a wafer processing chamber. The vaporizer includes a heated base having one or more seamless slots (18) formed in one of its faces for carrying a liquid which is vaporized by heat from the heated plate. In one embodiment, the vaporizer includes an atomizer (64) for atomizing the liquid prior to vaporization to reduce the temperature of vaporization. In one embodiment, the vaporizer includes a heat exhanger (94F) having cross-slots (108) intersecting a plurality of seamless slots (18F) to reduce unvaporized liquid exiting the vaporizer.

    摘要翻译： 提供蒸发器（64E）用于将诸如高纯度流的蒸气流输送到处理目的地，例如晶片处理室。 蒸发器包括加热的基座，其具有形成在其一个面中的一个或多个无缝槽（18），用于承载通过加热板的热量而蒸发的液体。 在一个实施例中，蒸发器包括用于在汽化之前雾化液体以降低汽化温度的雾化器（64）。 在一个实施例中，蒸发器包括热交换器（94F），其具有与多个无缝狭槽（18F）相交叉的交叉狭槽（108）以减少离开蒸发器的未汽化的液体。

    FLOW CONTROLLER
    5.
    发明公开
    FLOW CONTROLLER 审中-公开
    流量控制

    公开(公告)号：EP1374004A2

    公开(公告)日：2004-01-02

    申请号：EP02706478.1

    申请日：2002-02-28

    申请人： Porter Instrument Company, Inc.

    发明人： PORTER, George, K. ,  WOLF, Seth B. ,  ALBRECHT, Charles, W.

    IPC分类号： G05D7/06

    CPC分类号： F22B27/16 ,  B01F3/022 ,  B01F3/04049 ,  B01F5/0413 ,  B01F2215/0096 ,  B67D2210/0006 ,  C23C16/4481 ,  C23C16/4486 ,  F16K27/003 ,  F22B27/14 ,  Y10T137/87885

    摘要： A flow controller (46) is provided for delivering a precise volume of fluid such as high purity fluid streams to a processing destination, such as a wafer procession chamber. The flow controller includes a base (16) with a seamless slot (18) formed in a face thereof, providing a predictable pressure drop. The seamless slot (18) is in fluidic communication with a sensor channel (52) extending downwardly from the seamless slot first having temperature sensors (57) thereon for inferring the mass flow through the flow controller. A valve is in fluidic communication with the seamless slot and is operably connected to the temperature sensors such (57) that the valve opening is adjusted until the mass flow inferred by the temperature sensors is equal to a desired mass flow.

    Process system and process liquid supply method
    10.
    发明公开
    Process system and process liquid supply method 有权
    EinFlüssigkeitslieferungssystemund -verfahren

    公开(公告)号：EP1775754A1

    公开(公告)日：2007-04-18

    申请号：EP06021231.3

    申请日：2006-10-10

    申请人： TOKYO ELECTRON LIMITED

    发明人： Yamamoto, Shu ,  Chouno, Yasuhiro ,  Tokuno, Yoshichika

    IPC分类号： H01L21/00 ,  B01F15/04 ,  B01F3/08

    CPC分类号： B01F3/08 ,  B01F15/0022 ,  B01F15/0408 ,  B01F2215/0096 ,  H01L21/6704 ,  H01L21/67051 ,  H01L21/6715 ,  H01L21/67253

    摘要： A process system produces a process liquid of a predetermined concentration in a blending tank by blending solutions respectively supplied from a plurality of solution supply sources, supplies the process liquid to a supply tank to store therein the process liquid, and supplies the process liquid from the supply tank to a process liquid discharge port. In this process system, whether a concentration of the process liquid in the supply tank has changed or not is judged. When it is judged that the concentration of the process liquid in the supply tank has changed, the process liquid is additionally supplied from the blending tank to the supply tank, or the solution is directly supplied from the solution supply source to the supply tank, so as to maintain the concentration of the process liquid.

    摘要翻译： 处理系统通过混合从多个溶液供应源分别供应的溶液，在混合罐中产生预定浓度的处理液，将处理液供应到供应罐以在其中储存处理液体，并将处理液从 供应罐到处理液体排出口。 在该处理系统中，判断供给罐中的处理液的浓度是否变化。 当判断供应罐中的处理液的浓度已经改变时，处理液从混合罐另外供应到供应罐，或者溶液从溶液供应源直接供应到供应罐，因此 以保持工艺液体的浓度。