Low-temperature thermal chemical vapor deposition apparatus and method of synthesizing carbon nanotube using the same
    10.
    发明公开
    Low-temperature thermal chemical vapor deposition apparatus and method of synthesizing carbon nanotube using the same 审中-公开
    对于低温和使用相同的碳纳米管的合成方法化学气相沉积设备

    公开(公告)号:EP1061041A1

    公开(公告)日:2000-12-20

    申请号:EP00304963.2

    申请日:2000-06-13

    摘要: A low-temperature chemical vapor deposition (CVD) apparatus and a method of synthesizing carbon nanotubes using the CVD apparatus. The thermal CVD apparatus includes: a reaction tube having a gas inlet portion and an exhaust portion, the reaction tube divided into a first region, which is spatially adjacent to the gas inlet portion, for thermally decomposing a gas entering through the gas inlet portion, and a second region, which is spatially adjacent to the exhaust portion, for synthesizing carbon nanotubes using the gas decomposed in the first region; a first resistance heater installed around the reaction tube, for maintaining the temperature of the first region at a first temperature; a second resistance heater installed around the reaction tube, for maintaining the temperature of the second region at a second temperature lower than the first temperature; and an insulator interposed between the first and second resistance heater for insulating the same. The carbon nanotube synthesis method includes forming a first metal catalyst film over a first substrate. The first metal catalyst film is etched with an etching gas to form a number of nano-sized catalytic particles, and a carbon source gas is thermally decomposed using a thermal chemical vapor deposition (CVD) apparatus having a reaction tube divided into first and second regions, maintained at different temperatures, wherein the carbon source gas is decomposed in the first region, which is a relatively high temperature region, of the reaction tube. Then, carbon nanotubes are synthesized over the catalytic particles using decomposed carbon source gas, in the second region whose temperature is lower than the first region.

    摘要翻译: 低温化学气相沉积(CVD)装置和使用合成的化学气相沉积装置的碳纳米管的方法。 该热CVD装置,包括:具有气体入口部的反应管和在部分排出,将反应管被分成第一区域,所有这一切都在空间上邻接气体输入部分,用于热分解经气体入口部进入的气体, 和第二区域,所有这一切都在空间上邻接排气部分,用于利用合成在第一区域中分解气体碳纳米管; 第一电阻加热器安装围绕反应管,用于在第一温度下保持所述第一区域的温度; 第二电阻加热器安装围绕反应管,用于在第二温度比所述第一温度低维护第二区域的温度; 和绝缘体上设置在第一和第二电阻加热器,用于绝缘同一之间。 碳纳米管合成方法包括:形成在第一催化剂基材的第一金属膜。 第一金属催化剂电影在蚀刻气体,以形成数纳米级催化颗粒的蚀刻,和碳源气体,使用热化学气相沉积具有反应管(CVD)设备热分解分为第一和第二区域 ,维持在不同温度,worin碳源气体在第一区域分解,所有这些是相对高的温度区域,将反应管的。 然后,碳纳米管合成并且使用分解的碳源气中的第二区域,其温度比第一区域低的催化颗粒。