摘要:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).
摘要:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator (10000) which is capable of generating one of either charge particles or an electromagnetic wave as a beam (10000A), a primary optical system (72) which is capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system (74) which is capable of including a first movable numerical aperture (10008) and a first detector (761;76) which detects secondary charge particles generated from the inspection object (W), the secondary charge particles passing through the first movable numerical aperture, an image processing system (763) which is capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector (76-2) arranged between the first movable numerical aperture (10008) and the first detector (76) and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object (W).
摘要:
A neutral beam ionizing apparatus for electron impact ionization of a substantially cylindrical neutral beam. The apparatus includes an electron source, and a circularly cylindrical ionizing region that is substantially free of magnetic fields. In one embodiment of the invention, the beam is a gas cluster beam, and the electron source includes a heated filament (1000) for emitting thermions, the filament including one or more direction reversals shaped to produce self-nulling magnetic fields so as to minimize the magnetic field due to filament heating current. In another embodiment of the invention, a neutral beam ionizing apparatus for electron impact ionization of a substantially cylindrical neutral beam includes at least one electron source (1402), and an elliptically cylindrical ionizing region (Fig.15). In one embodiment, the elliptically cylindrical ionizing region includes a pair of co-focal elliptically cylindrical electrodes biased so as to cause electrons emitted from the at least one electron source to orbit repeatedly through the axis of the beam to be ionized.