Photopolymerizable composition
    89.
    发明专利
    Photopolymerizable composition 失效
    光聚合组合物

    公开(公告)号:JPS61106613A

    公开(公告)日:1986-05-24

    申请号:JP22692884

    申请日:1984-10-30

    摘要: PURPOSE: The titled composition suitable as an UV-curable etching resist, obtained by mixing poly(N-vinylpyrrolidone), a hexahydrophthalic acid derivative, (meth)acrylamide and (meth)acrylol group-containing monomer.
    CONSTITUTION: The purpose photopolymerizable composition is obtained by mixing poly(n-vinylpyrrolidone) with a compound of formula I (wherein R
    1 , R
    2 and R
    3 are each H or CH
    3 ), a (meth)acrylamide of formula II (wherein R
    4 is H or CH
    3 ), a monomer containing at least one (meth)acryloyl group in the molecule (e.g., Carbitol acrylate or 2-hydroxyethyl methacrylate) and, optionally, a photopolymerization initiator (e.g., benzoin or benzil dimethyl ketal). The compounds of formula I are obtained by reacting (methyl)hexahydrophthalic anhydride with a hydroxyalkyl (meth)acrylate.
    COPYRIGHT: (C)1986,JPO&Japio

    摘要翻译: 目的:通过混合聚(N-乙烯基吡咯烷酮),六氢邻苯二甲酸衍生物,(甲基)丙烯酰胺和(甲基)丙烯酰基的单体得到的适合作为UV固化蚀刻抗蚀剂的标题组合物。 构成:通过将聚(N-乙烯基吡咯烷酮)与式I化合物(其中R 1,R 2和R 3各自为H或CH 3),式II的(甲基)丙烯酰胺(其中R 4为H或 CH 3),在分子中含有至少一个(甲基)丙烯酰基的单体(例如,卡必醇丙烯酸酯或甲基丙烯酸2-羟乙酯)和任选的光聚合引发剂(例如苯偶姻或苯偶酰二甲基缩酮)。 式I化合物是通过使(甲基)六氢邻苯二甲酸酐与(甲基)丙烯酸羟烷基酯反应得到的。

    90.
    发明专利
    失效

    公开(公告)号:JPS5051189A

    公开(公告)日:1975-05-07

    申请号:JP9565673

    申请日:1973-08-25

    IPC分类号: C08F269/00 C08F271/02