-
公开(公告)号:JP2013018714A
公开(公告)日:2013-01-31
申请号:JP2011151096
申请日:2011-07-07
申请人: Fujifilm Corp , 富士フイルム株式会社
IPC分类号: C07C67/62 , C07C67/28 , C07C67/30 , C07C69/54 , C07C69/657
摘要: PROBLEM TO BE SOLVED: To provide a method which can reduce a load on production facility due to acidic gas generated during reaction and can shorten reaction time in the production process of a carboxylic acid halide, and further can alleviate bad actions on following processes after the reaction; and to provide a method for effectively control side effects due to hydrogen chloride.SOLUTION: This method for producing the carboxylic acid halide comprises reacting a carboxylic acid with at least one halogenating agent selected from the group consisting of thionyl chloride, oxalyl chloride and phosgene, where the carboxylic acid is reacted with the halogenating agent in the presence of an amide compound (A) to generate the carboxylic acid halide, then the reactant separates into two phases of a phase (T) [mainly including the intended carboxylic acid halide] and a phase (W) [mainly including the acidic component generated from the halogenating agent and the amide compound (A)], and the target is obtained by removing the phase (W).
摘要翻译: 要解决的问题:提供一种可以减少由于反应中产生的酸性气体而导致的生产设备负荷的方法,并且可以缩短羧酸卤化物生产过程中的反应时间,并且还可以减轻以下的不良作用 反应后的过程; 并提供有效控制由于氯化氢引起的副作用的方法。 解决方案:这种制备羧酸卤化物的方法包括使羧酸与选自亚硫酰氯,草酰氯和光气的至少一种卤化剂反应,其中羧酸与卤化剂在 存在酰胺化合物(A)以产生羧酸卤化物,则反应物分成两相(T)(主要包括所需的羧酸卤化物)和相(W)[主要包括产生的酸性组分 来自卤化剂和酰胺化合物(A)],并且通过除去相(W)获得目标物。 版权所有(C)2013,JPO&INPIT
-
公开(公告)号:JP4121683B2
公开(公告)日:2008-07-23
申请号:JP35449299
申请日:1999-12-14
IPC分类号: C07C67/14 , C08F20/12 , C07C69/00 , C07C69/54 , C07C69/657 , C08F12/32 , C08F18/16 , C08F20/14 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/30 , C08F220/32 , C09D5/32 , C09D5/33 , C09D133/06 , C09D133/14 , C09K20060101 , G03C5/00 , G03F7/00 , G03F7/004 , G03F7/11 , H01L20060101 , H01L21/027 , H01L21/31 , H01L21/312 , H01L21/314 , H01L21/469 , H01L23/29
CPC分类号: C09D133/068 , C07C67/14 , C07C69/54 , C07C2603/24 , C08F220/18 , C08F220/28 , C08F220/32 , C09D133/14 , H01L21/0276 , H01L21/312 , Y10S430/111
摘要: Polymers are provided having the following formulas I and II:Polymers of the present invention can be used to provide an anti-reflective coating (ARC) material useful for submicrolithography processes using 248 nm KrF, 193 nm ArF and 157 nm F2 lasers. The polymers contain chromophore substituents which exhibit sufficient absorbance at wavelengths useful for such submicrolithography process. The ARC prevents back reflection from the surface of or lower layers in the semiconductor devices and solves the problem of the CD being altered by the diffracted and reflected light from such lower layers.
-
公开(公告)号:JP2005041781A
公开(公告)日:2005-02-17
申请号:JP2003199682
申请日:2003-07-22
申请人: Chisso Corp , Chisso Sekiyu Kagaku Kk , チッソ株式会社 , チッソ石油化学株式会社
发明人: ITO TOSHIYUKI , KATO TAKASHI
IPC分类号: G02F1/13 , C07C69/003 , C07C69/007 , C07C69/65 , C07C69/653 , C07C69/657 , C07D207/452 , C07D239/26 , C07D319/06 , C08F220/18 , C08F220/70 , C08F236/04 , C09K19/30 , C09K19/34 , G02F1/1335 , G02F1/13363 , G02F1/1337
摘要: PROBLEM TO BE SOLVED: To provide a compound having a polymerizable group and properties such as high reactivity of polymerization, a wide temperature range of a liquid crystal phase, great helical twisting force and good miscibility, a composition comprising the compound and having good coating properties, etc., and a polymer obtained by polymerizing the composition and having characteristics such as good optical anisotropy or good mechanical strengths. SOLUTION: The compound is represented formula (1) [wherein, at least either one of R 1 and R 2 is the polymerizable group; B is the following bivalent group G1, G2 or G3 in which an optional hydrogen is substituted with a halogen; As are each a single bond, a 1,4-cyclohexenylene, a 1,4-phenylene or the like; Z is a single bond or a 1-20C alkylene or the like; m and n are each independently an integer of 0-10; and the total of m and n is an integer of 1-10]. The composition comprises the compound and the polymer is obtained from the composition. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译: 要解决的问题:为了提供具有聚合性基团的化合物和聚合反应性高,液晶相的宽温度范围,大的螺旋扭转力和良好的混溶性等特性,包含该化合物并具有 良好的涂布性等,以及通过使组合物聚合而获得的具有良好光学各向异性或良好机械强度等特性的聚合物。 化合物表示式(1)[其中,R“SP 1”和“R”SP 2中的至少一个是可聚合基团; B是其中任选的氢被卤素取代的以下二价基团G1,G2或G3; 各自为单键,1,4-亚环己基,1,4-亚苯基等; Z是单键或1-20C亚烷基等; m和n各自独立地为0-10的整数; 并且m和n的总数为1-10的整数]。 该组合物包含该化合物,并且该聚合物由该组合物获得。 版权所有(C)2005,JPO&NCIPI
-
公开(公告)号:JP2842441B2
公开(公告)日:1999-01-06
申请号:JP36658897
申请日:1997-12-26
IPC分类号: C07D295/14 , B01J31/00 , C07B61/00 , C07C67/313 , C07C69/12 , C07C69/657 , C07C69/716 , C07C211/46 , C07C227/08 , C07C227/14 , C07C229/24 , C07C229/30 , C07C229/44 , C07D215/00 , C07D215/48 , C07D215/54
-
公开(公告)号:JP2788221B2
公开(公告)日:1998-08-20
申请号:JP5103396
申请日:1996-02-14
IPC分类号: C07D295/14 , B01J31/00 , C07B61/00 , C07C67/313 , C07C69/12 , C07C69/657 , C07C69/716 , C07C211/46 , C07C227/08 , C07C227/14 , C07C229/24 , C07C229/30 , C07C229/44 , C07D215/00 , C07D215/48 , C07D215/54
-
-
公开(公告)号:JPH08119902A
公开(公告)日:1996-05-14
申请号:JP26250094
申请日:1994-10-26
发明人: NISHIBORI SETSUO , ONISHI HIDEAKI
IPC分类号: C07C69/63 , C07C69/657 , C07C69/76 , C07F9/09 , C08K5/10 , C08K5/11 , C08K5/12 , C08K5/52 , C08K5/521 , C09K15/06
摘要: PURPOSE: To provide a new tribromoneopentyl alcohol derivative useful as a frame-retardant for various polymeric materials without causing the lowering of heat-resistance, light-resistance, etc., of the polymeric material and having low bleeding tendency. CONSTITUTION: This derivative is a compound of formula I [(n) is 2 or 4; X is group of formula II ((m) is 0-2), formula III or formula IV when n=2 or formula V or formula VI (Y is I or Br) when n=4], e.g. bis(tribromoneopentyl) oxalate. The compound of formula I can be produced from tribromoneopentyl alcohol in a solvent or in the absence of solvent without using a catalyst or in the presence of a catalyst e.g. by the following reactions using more than equivalent amount of the alcohol based on an acid: (i) a dehydration reaction of the alcohol with a carboxylic acid, (ii) an acylation reaction with a carboxylic acid anhydride followed by dehydration reaction, (iii) a transesterification reaction with a lower alcohol carboxylic acid ester, (iv) a dehalogenative hydrogenation reaction with a carboxylic acid halide or a phosphoric acid halide in a non-aqueous system or (v) a dehalogenative hydrogenation reaction by the phase transfer reaction with a carboxylic acid halide, etc.
-
公开(公告)号:JPS5839816B2
公开(公告)日:1983-09-01
申请号:JP13727979
申请日:1979-10-23
申请人: KOGYO GIJUTSUIN
发明人: SHIMIZU KAZUO
IPC分类号: C07C67/08 , C07C67/40 , C07C69/657 , C07C69/67
-
公开(公告)号:JPS5793932A
公开(公告)日:1982-06-11
申请号:JP16106181
申请日:1981-10-12
发明人: HIGAKI YUUZOU
IPC分类号: C07C69/675 , A61K8/00 , A61K8/30 , A61K8/34 , A61K8/37 , A61Q1/00 , A61Q1/04 , A61Q1/12 , A61Q17/00 , A61Q17/04 , A61Q19/00 , C07C67/08 , C07C69/657
摘要: NEW MATERIAL:An intramolecular oligoesterified product of 12-hydroxystearic acid and/or ricinoleic acid expressed by formulaI(X is H; group expressed by formula II is alkyl residue of 12-hydroxystearic acid or ricinoleic acid; n is an interger >=0) and an ester thereof with a monohydric alcohol. USE:An oily base for a cosmetic. The compound expressed by formulaIchanges from the liquid state into a paste and further wax, assumes various forms and has improved compatibility with another oil, good touch, water holding property without irritant action on the skin and deterioration in quality with time. PROCESS:The hydroxyl group and carboxyl group present in 12-hydroxystearic acid and ricinoleic acid are subjected to the intramolecular esterifying reaction to give the compound expressed by formulaI. The carboxyl groups in the reaction product are partially or wholly esterified with an aliphatic monohydric alcohol to adjust the viscosity, lubricity, gloss, melting point, and water holding property, etc. of the aimed compound.
-
公开(公告)号:JP2011526905A
公开(公告)日:2011-10-20
申请号:JP2011516508
申请日:2009-06-23
发明人: ヒューワット トレイシー , マイケル マーフィー ピーター
IPC分类号: C07C69/65 , C07C69/653 , C07C69/657 , C07C235/08 , C07C309/17
CPC分类号: C07C69/65 , C07C69/657 , C07C235/08
摘要: 式2A、2Bまたは2C
(Ra−O−CO−)
2 Y 式2A、
R
a −O−CO−Y−CO−O−(CH
2 CH
2 )R
f 式2B
R
a −O−CO−Y−CO−O−R 式2C
を含む化合物であって、
式中、
R
a は、基(i)R
f (CH
2 CF
2 )
d −(C
g H
2g )−、(ii)R
f OCF
2 CF
2 −(C
g H
2g )−、(iii)R
f OCFHCF
2 O(CH
2 CH
2 O)
v −(C
g H
2g )−、(iv)R
f OCFHCF
2 O(C
w H
2w )−、(v)R
f OCF(CF
3 )CONH−(C
g H
2g )−または(vi)R
f (CH
2 )
h [(CF
2 CF
2 )
i (CH
2 CH
2 )
j ]
k であり、
各R
f は、独立に、C
c F
(2c+1) であり、cは、2〜約6であり、dは、1〜約3であり、gは、1〜4であり、vは、1〜約4であり、wは、約3〜約12であり、hは、1〜約6であり、i、jおよびkは、それぞれ独立に、1、2または3、またはこれらの混合であり、ただし、基(vi)の炭素原子の合計数は約8〜約22であり、
Yは、式−C
e H
(2e-2) −
のオレフィン性不飽和を有する鎖状または分岐ジラジカルであり、
式中、eは、2または3であり、
Rは、Hまたは鎖状または分岐アルキル基C
b H
(2b+1) −であり、
bは、1〜約18である、化合物。
-
-
-
-
-
-
-
-
-