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公开(公告)号:KR1020100063724A
公开(公告)日:2010-06-11
申请号:KR1020107006132
申请日:2008-07-11
申请人: 셀라니즈 이멀젼스 게엠베하
IPC分类号: C08F220/38 , C08F218/08 , C07C323/54
CPC分类号: C08F28/02 , C07C309/12 , C08F218/08 , C08F220/38 , C08F228/02 , C08F2220/382 , C08F2220/387 , C08L41/00
摘要: The invention relates to novel cross-linkable monomers that may be polymerized with ethylenically unsaturated comonomers to form cross-linkable copolymers. Said copolymers may particularly be used in the form of aqueous dispersions as formaldehyde-free adhesives or as coatings with good water resistance. The cross-linkable monomer is a compound in acid or salt form comprising an anion of the formula (I) and one or more cations for producing electrical neutrality, where Rand Rrepresent, independently of one another, hydrogen, alkyl, cycloalkyl, aryl, aralkyl,-COOR,-COOcator-CON(RR), Rand Rrepresent, independently of one another, hydrogen, alkyl, or aryl, catrepresents a monovalent cation, and one of the groups Ror Rmay also represent a group-X-R-CR(OH)(SO), wherein X, R, and Rassume one of the meanings listed below, Rrepresents hydrogen, alkyl, or aryl, X is selected from the group of direct C-C bond,-O-,-CH-O-,-CH-NR-,-COO-or-CONR-, Rrepresents hydrogen, alkyl, or aryl, Rrepresents alkylene, polyoxyalkylene, cycloalkylene, or arylene, and Rrepresents hydrogen, alkyl, cycloalkyl, or aryl.
摘要翻译: 本发明涉及可与烯属不饱和共聚单体聚合以形成可交联共聚物的新型可交联单体。 所述共聚物可特别以水分散体的形式用作不含甲醛的粘合剂或作为具有良好耐水性的涂料。 可交联单体是酸或盐形式的化合物,其包含式(I)的阴离子和用于产生电中性的一种或多种阳离子,其中Rand Rrepresent彼此独立地为氢,烷基,环烷基,芳基,芳烷基 ,-COOR,-COOcator-CON(RR),Rand Rrepresent彼此独立地为氢,烷基或芳基,表示一价阳离子,ROR R may中的一个也表示基团-XR-CR(OH) (SO),其中X,R和Rassume是下列所列含义之一,R表示氢,烷基或芳基,X选自直接CC键,-O - , - CH-O - , - CH- NR - , - COO-或-C CONR-,R表示氢,烷基或芳基,R表示亚烷基,聚氧化烯,亚环烷基或亚芳基,R表示氢,烷基,环烷基或芳基。
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公开(公告)号:KR1020100036966A
公开(公告)日:2010-04-08
申请号:KR1020090091661
申请日:2009-09-28
申请人: 도쿄 오카 고교 가부시키가이샤
IPC分类号: G03F7/004
CPC分类号: C07C309/10 , C07C309/12 , C07C309/17 , C07C309/19 , C07C309/67 , C07C311/48 , C07C311/51 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/0047
摘要: PURPOSE: A resist composition is provided to suppress the degeneration of a resist film and the change of a refractive index of a dipping solvent and to form a resist pattern with excellent shape. CONSTITUTION: A resist composition comprises: a base component(A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component(B) which generates acid upon exposure, wherein said acid-generator component(B) includes an acid generator(B1) composed of a compound having a base dissociable group within a cation moiety.
摘要翻译: 目的:提供抗蚀剂组合物以抑制抗蚀剂膜的退化和浸渍溶剂的折射率的变化,并形成具有优异形状的抗蚀剂图案。 构成:抗蚀剂组合物包含:在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分(A) 以及在暴露时产生酸的酸发生剂组分(B),其中所述酸产生剂组分(B)包括由在阳离子部分内具有碱解离基团的化合物组成的酸发生剂(B1)。
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公开(公告)号:KR1020090102664A
公开(公告)日:2009-09-30
申请号:KR1020090024827
申请日:2009-03-24
申请人: 신에쓰 가가꾸 고교 가부시끼가이샤
IPC分类号: G03F7/004 , G03F7/039 , H01L21/312
CPC分类号: G03F7/0045 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07D333/46 , C07D493/08 , C07D493/18 , C08K5/42 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/111 , H01L21/312
摘要: PURPOSE: A novel photoacid generator is provided to easily use with resin among the resist materials and control the acid release. CONSTITUTION: A photoacid generator senses and reacts with ultraviolet ray, far ultraviolet ray, electron beam, EUV, X ray, excimer laser, γ-ray or synchrotron radiation and generates sulfonic acid. The photoacid generator is a resist material for chemical amplification. The sulfonic acid is denoted by the chemical formula 1a, ROC(=O)R1-COOCH2CF2SO3-H+.
摘要翻译: 目的:提供一种新型光致酸发生器,可轻松与抗蚀剂材料中的树脂一起使用,并控制酸的释放。 构成:光致酸发生器感测紫外线,远紫外线,电子束,EUV,X射线,准分子激光,γ射线或同步加速器辐射并产生磺酸。 光致酸产生剂是用于化学扩增的抗蚀材料。 磺酸由化学式1a表示,ROC(= O)R1-COOCH2CF2SO3-H +。
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公开(公告)号:KR1020080070559A
公开(公告)日:2008-07-30
申请号:KR1020080007622
申请日:2008-01-24
申请人: 삼성전자주식회사
IPC分类号: G03F7/004
CPC分类号: C07D493/08 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/111 , Y10S430/122 , Y10S430/123 , G03F7/0047
摘要: A photoacid generator, a photoresist composition containing the photoacid generator, and a method for forming a pattern by using the composition are provided to obtain a photoresist pattern having a uniform profile. A photoacid generator comprises at least one sulfonium salt cation part selected from sulfonium salt cation parts represented by the formulas 1, 2, 3 and 4; and a sulfonium salt anion part containing a carboxyl group as a hydrophilic site represented by the formula 5, wherein R1, R2, R3 and R4 are independently H or a C1-C5 alkyl group; n is 1-3; and X is a C4-C10 cyclo group, an adamantal group or a cycloheptane group containing an oxygen atom.
摘要翻译: 提供光酸产生剂,含有光致酸发生剂的光致抗蚀剂组合物和通过使用该组合物形成图案的方法,以获得具有均匀轮廓的光致抗蚀剂图案。 光酸产生剂包含至少一种选自由式1,2,3和4表示的锍盐阳离子部分的锍盐阳离子部分; 和含有羧基作为由式5表示的亲水性位点的锍盐阴离子部分,其中R 1,R 2,R 3和R 4独立地为H或C 1 -C 5烷基; n为1-3; X是C 4 -C 10环基,金刚烷基或含有氧原子的环庚烷基。
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公开(公告)号:KR1020060129257A
公开(公告)日:2006-12-15
申请号:KR1020067014123
申请日:2004-08-11
申请人: 헌츠만 페트로케미칼 엘엘씨
发明人: 아난타네니,프라카사,알. , 그레이,존 , 레너,마티,제이. , 스미스,조오지,에이 , 루이스,데이비드,씨 , 챔피온,도날드,에이치. , 휴웰,크리스토퍼,제이.
IPC分类号: C07C309/68 , C07C309/65 , C07C309/63 , C11D1/28
CPC分类号: C07C303/32 , A61K8/466 , A61Q5/02 , A61Q19/10 , C07C303/02 , C07C303/22 , C07C309/12 , C11D1/28 , C07C309/08
摘要: The present invention provides acylalkylisethionate esters useful in consumer products. The acylalkylisethionate esters are produced by reacting one or more carboxylic acids with one or more alkyl-substituted hydroxyalkyl sulfonates under esterification reaction conditions. The alkyl- substituted hydroxyalkyl sulfonates used as a raw material in producing the esters are prepared by reacting bisulfite with one or more alkylene oxides.
摘要翻译: 本发明提供了可用于消费品的酰基烷基羟乙基磺酸盐酯。 酰基烷基羟乙基磺酸酯通过在酯化反应条件下使一种或多种羧酸与一种或多种烷基取代的羟烷基磺酸酯反应来制备。 用作生产酯的原料的烷基取代羟烷基磺酸盐是通过使亚硫酸氢盐与一种或多种烯化氧反应来制备的。
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公开(公告)号:KR101899789B1
公开(公告)日:2018-09-20
申请号:KR1020120037529
申请日:2012-04-10
申请人: 스미또모 가가꾸 가부시키가이샤
IPC分类号: C07C309/27 , G03F7/004 , C07C57/28
CPC分类号: C07C309/12 , C07C25/18 , C07C303/32 , C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D327/08 , C07D333/46 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y02P20/55
摘要: 화학식 I로표시되는염: 화학식 I상기화학식 I에서, Q및 Q는각각독립적으로불소원자또는 C-C퍼플루오로알킬그룹이고, n은 0 또는 1이고, L은단일결합또는 C-C알칸디일그룹이고, 여기서메틸렌그룹은산소원자또는카보닐그룹으로대체될수 있고, 단 L은 n이 0일때 단일결합이아니고, 환 W는 C-C지방족환이고, 여기서메틸렌그룹은산소원자, 황원자, 카보닐그룹또는설포닐그룹으로대체될수 있고, 수소원자는하이드록실그룹, C-C알킬그룹또는 C-C알콕시그룹으로대체될수 있고, R은하이드록실그룹, 또는보호그룹으로보호된하이드록실그룹이고, Z는유기양이온이다.
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公开(公告)号:KR101899787B1
公开(公告)日:2018-09-20
申请号:KR1020120037518
申请日:2012-04-10
申请人: 스미또모 가가꾸 가부시키가이샤
IPC分类号: C07C309/04 , C07C321/26 , G03F7/004
CPC分类号: C07C309/17 , C07C25/18 , C07C303/32 , C07C309/06 , C07C309/07 , C07C309/12 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D333/46 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要: 화학식 I로표시되는염: 화학식 I상기화학식 I에서, Q및 Q는각각독립적으로불소원자또는 C-C퍼플루오로알킬그룹이고, L은 C-C2가포화탄화수소그룹이고, 여기서메틸렌그룹은산소원자또는카보닐그룹으로대체될수 있고, L및 L은각각단일결합또는 C-C2가포화알킬그룹이고, 여기서메틸렌그룹은산소원자또는카보닐그룹으로대체될수 있고, 환 W및환 W는각각 C-C탄화수소환이고, R및 R는각각수소원자또는 C-C알킬그룹이고, R은 C-C알킬그룹이고, t는 0 내지 2의정수이고, Z는유기대이온이다.
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公开(公告)号:KR101874481B1
公开(公告)日:2018-08-02
申请号:KR1020150140570
申请日:2015-10-06
发明人: 폴제이.라비움 , 비풀자인 , 수잔엠.콜리 , 제임스더블유.새커리 , 제임스에프.카메론 , 에이미엠.곽 , 데이비드에이.발레리
CPC分类号: G03F7/038 , C07C309/12 , C07C381/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38 , H01L21/0274
摘要: 포토레지스트조성물은상기반복단위의적어도반이광산-발생반복단위인제1 폴리머, 및산의작용하에서알칼리현상액에서용해도의변화를나타내는제2 폴리머를포함한다. 상기제1 폴리머에서, 각각의상기광산-발생반복단위는광산-발생작용기및 염기-용해도-향상작용기를포함한다.
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公开(公告)号:KR101844307B1
公开(公告)日:2018-04-02
申请号:KR1020110039308
申请日:2011-04-27
IPC分类号: G03F7/004 , C07C317/04 , C08K5/41
CPC分类号: G03F7/0045 , C07C309/10 , C07C309/12 , C07C309/17 , C07C381/12 , C07D207/27 , G03F7/0046
摘要: -C(=O)N
摘要翻译: 提供了包含-C(= O)N <结构的基于氮的官能组分的新的光产酸剂化合物。 还提供了包含本发明的至少一种PAG的光刻胶组合物。
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公开(公告)号:KR101813298B1
公开(公告)日:2017-12-28
申请号:KR1020127024723
申请日:2011-02-10
申请人: 바스프 에스이
IPC分类号: C07C309/08 , C07C311/53 , C07D207/444 , G03F7/004
CPC分类号: C07C381/12 , C07C25/18 , C07C309/08 , C07C309/12 , C07C311/53 , C07C333/06 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D207/28 , C07D233/38 , C07D241/08 , C07D295/205 , C07D295/215 , C07D493/08 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要: 본발명은화학식 I 또는 II의산을발생시키는화합물, 예를들면상응하는술포늄및 아이오도늄염 뿐만아니라, 상응하는술포닐옥심에관한것으로서, 화학식 I 및화학식 II에서, X는 CH또는 CO이고; Y는 O, NR, S, O(CO), O(CO)O, O(CO)NR, OSO, O(CS) 또는 O(CS)NR이고; R은예를들면 C-C알킬, C-C할로알킬, C-C알케닐, C-C시클로알케닐, 페닐-C-C-알킬, C-C시클로알킬, C-C시클로알킬-C-C알킬, 개재된 C-C알킬, 개재된 C-C시클로알킬, 개재된 C-C시클로알킬-C-C알킬, 개재된 C-C시클로알케닐, 페닐, 나프틸, 안트라실, 페난트릴, 비페닐릴, 플루오레닐또는헤테로아릴 (모두치환되지않거나치환됨)이거나; 또는 R은 NRR이고; R및 R은예를들면 C-C시클로알킬렌, C-C시클로알킬-C-C알킬렌, C-C알킬렌, C-C할로알킬렌, C-C알케닐렌, C-C시클로알케닐렌, 페닐렌, 나프틸렌, 안트라실렌, 페난트릴렌, 비페닐렌또는헤테로아릴렌 (모두치환되지않거나치환됨)이고; R는예를들면 C-C시클로알킬, C-C시클로알킬-C-C알킬, C-C알킬, C-C할로알킬, C-C알케닐, C-C시클로알케닐, 페닐-C-C-알킬이고; R및 R은예를들면수소, C-C시클로알킬, C-C시클로알킬-C-C알킬, C-C알킬, C-C할로알킬, C-C알케닐, C-C시클로알케닐, 페닐-C-C-알킬, Ar, (CO)R, (CO)OR또는 SOR이고; Ar은페닐, 비페닐릴, 플루오레닐, 나프틸, 안트라실, 페난트릴또는헤테로아릴 (모두치환되지않거나치환됨)이다.
摘要翻译: 本发明化合物,例如相应的锍和碘,以及用于产生式盐I或医生的II,涉及到一个相应的磺酰肟其中,在式I和式II中,X为CH或CO; Y是O,NR,S,O(CO),O(CO)O,O(CO)NR,OSO,O(CS)或O(CS)NR; G.řeunye CC烷基,CC-卤代烷基,链烯基CC,CC环烯基,苯基,-CC-烷基,环烷基CC,CC环烷基烷基-CC经由CC烷基,环烷基通过CC,插 CC环烷基-C 1 -C 6烷基,间隔的CC环烯基,苯基,萘基,蒽基,菲基,联苯基,芴基或杂芳基(全部未被取代或被取代)。 或者R是NRR; R和R,用于eunye CC亚环烷基,环烷基CC -CC - 亚烷基,亚烷基 - CC,CC卤代亚烷基,亚烯基CC,CC环烯基,亚苯基,亚萘基,二甲苯蒽基,菲基亚烷基, 联亚苯基或亚杂芳基(全部未被取代或被取代); řneunye G. C-C环烷基,C-C环烷基,-C-C - 烷基,C-C烷基,C-C卤代烷基,C-C链烯基,C-C环烯基,苯基,-C-C-烷基。 R 1和R 2例如为氢,C 1 -C 6烷基,C 1 -C 6烷基,C 1 -C 2卤代烷基,C 2 -C 6烯基,C 3 -C 6环烯基, )OR或SOR; Ar是苯基,联苯基,芴基,萘基,蒽基,菲基或杂芳基(全部未被取代或被取代)。 &lt;式(I)&gt;
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