Power supply for portable radiographic detector
    5.
    发明授权
    Power supply for portable radiographic detector 有权
    便携式放射线检测仪的电源

    公开(公告)号:US07679062B2

    公开(公告)日:2010-03-16

    申请号:US12099184

    申请日:2008-04-08

    IPC分类号: H01L27/146

    CPC分类号: G01T7/00 G01T1/247

    摘要: A digital radiography detector has a two-dimensional array of photosensors disposed in rows and columns. Multiple signal traces connect to the photosensors and extend in a first direction along the two-dimensional array. A switching power supply is connected to a power source and has first and second storage inductors that are substantially matched, are electrically connected in series, include flux fields that are opposite in phase, and are aligned along the first direction of the signal traces.

    摘要翻译: 数字放射线检测器具有排列成行和列的光电传感器的二维阵列。 多个信号迹线连接到光电传感器并沿着二维阵列沿第一方向延伸。 开关电源连接到电源,并且具有基本匹配的串联电连接的第一和第二存储电感器包括相位相反并沿着信号迹线的第一方向排列的磁通场。

    METHOD FOR GROWING ARRAYS OF ALIGNED NANOSTRUCTURES ON SURFACES
    6.
    发明申请
    METHOD FOR GROWING ARRAYS OF ALIGNED NANOSTRUCTURES ON SURFACES 审中-公开
    用于在表面上生长对准的纳米结构阵列的方法

    公开(公告)号:US20080008844A1

    公开(公告)日:2008-01-10

    申请号:US11758448

    申请日:2007-06-05

    IPC分类号: H05H1/24

    CPC分类号: B81C1/00111 B82Y30/00

    摘要: The invention provides methods for growing an array of elongated nanostructures projecting from a surface. The nanostructures of the array are aligned substantially perpendicularly to the surface. In one aspect of the invention, the diameter of the nanostructures is between 10 nm and 200 nm. The methods of the invention can produce nanostructure growth at temperatures less than 350 degrees Celsius. Alignment of the nanostructures does not rely on epitaxial growth from a single crystal substrate, allowing a variety of substrates to be used.

    摘要翻译: 本发明提供了用于生长从表面突出的细长纳米结构阵列的方法。 阵列的纳米结构基本上垂直于表面排列。 在本发明的一个方面,纳米结构的直径在10nm和200nm之间。 本发明的方法可以在低于350摄氏度的温度下产生纳米结构生长。 纳米结构的对准不依赖于单晶衬底的外延生长,允许使用各种衬底。

    Plasma generating apparatus and plasma treatment apparatus
    8.
    发明授权
    Plasma generating apparatus and plasma treatment apparatus 有权
    等离子体发生装置和等离子体处理装置

    公开(公告)号:US08133348B2

    公开(公告)日:2012-03-13

    申请号:US11914954

    申请日:2006-04-26

    IPC分类号: H01L21/306

    摘要: A plasma generating apparatus includes a coaxial convertor for coaxial-converting a microwave, a generally annular ring slot that passes the coaxial-converted microwave, and a dielectric window that propagates the microwave passed through the ring slot. A plasma is produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.

    摘要翻译: 等离子体发生装置包括用于同轴转换微波的同轴转换器,通过同轴转换的微波的大致环形的环槽,以及传播通过环形槽的微波的介电窗口。 通过介电窗口传播的微波产生等离子体。 这使得能够在大面积上稳定地形成具有均匀分布的等离子体。

    REUSABLE SAMPLE HOLDING DEVICE PERMITTING READY LOADING OF VERY SMALL WET SAMPLES
    10.
    发明申请
    REUSABLE SAMPLE HOLDING DEVICE PERMITTING READY LOADING OF VERY SMALL WET SAMPLES 失效
    可重复使用的样品保持装置允许非常小的样品的准备加载

    公开(公告)号:US20100193398A1

    公开(公告)日:2010-08-05

    申请号:US12365698

    申请日:2009-02-04

    IPC分类号: B65D85/00 B23P11/00

    摘要: A reusable sample-holding device for readily loading very small wet samples for observation of the samples by microscopic equipment, in particular in a vacuum environment. Embodiments may be used with a scanning electron microscope (SEM), a transmission electron microscope (TEM), an X-ray microscope, optical microscope, and the like. For observation of the sample, embodiments provide a thin-membrane window etched in the center of each of two silicon wafers abutting to contain the sample in a small uniform gap formed between the windows. This gap may be adjusted by employing spacers. Alternatively, the thickness of a film established by the fluid in which the sample is incorporated determines the gap without need of a spacer. To optimize resolution each window may have a thickness on the order of 50 nm and the gap may be on the order of 50 nm.

    摘要翻译: 一种可重复使用的样品保持装置,用于容易地加载非常小的湿样品,以通过显微设备,特别是在真空环境中观察样品。 实施例可以用扫描电子显微镜(SEM),透射电子显微镜(TEM),X射线显微镜,光学显微镜等来使用。 为了观察样品,实施方案提供了在两个硅晶片的每一个的中心蚀刻的薄膜窗口,其邻接以将样品容纳在窗口之间形成的小的均匀间隙中。 该间隙可以通过使用间隔物来调节。 或者,通过其中包含样品的流体建立的膜的厚度确定了间隙而不需要间隔物。 为了优化分辨率,每个窗口可以具有大约50nm的厚度,并且间隙可以在50nm量级。