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    Photosensitive resin composition for black matrix
    2.
    发明授权
    Photosensitive resin composition for black matrix 有权
    用于黑色矩阵的光敏树脂组合物

    公开(公告)号：US08822127B2

    公开(公告)日：2014-09-02

    申请号：US12997224

    申请日：2009-09-28

    申请人： Dong Chang Choi ,  Kyung Soo Choi ,  Ho Chan Ji ,  Geun Young Cha ,  Sung-Hyun Kim

    发明人： Dong Chang Choi ,  Kyung Soo Choi ,  Ho Chan Ji ,  Geun Young Cha ,  Sung-Hyun Kim

    IPC分类号： G03F7/004 ,  G03F7/027 ,  G02F1/13

    CPC分类号： G03F7/0007 ,  G02F1/133512 ,  G03F7/0048 ,  G03F7/032

    摘要： A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.

    摘要翻译： 提供了一种用于黑矩阵和由其形成的黑矩阵的光敏树脂组合物。 用于黑色基质的感光性树脂组合物包括由5-30重量％的沸点为110-159℃的第一溶剂，55-90重量％的沸点为160〜 200℃和3-15重量％的沸点为201-280℃的第三溶剂，第一溶剂，第二溶剂和第三溶剂是脂族化合物，并且使用至少一种溶剂 选自烷基酯，烷基酮，烷基醚和烷基醇的组合物，因此可以获得没有表面缺陷的均匀的薄膜，并且感光性树脂组合物具有优异的加工性能，同时确保高的遮光性 因此可以获得具有少量缺陷的黑矩阵图案，因此可用于液晶显示器。

    FLUORINE-BASED RESINS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME
    3.
    发明申请
    FLUORINE-BASED RESINS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME 有权
    基于氟的树脂和包含其的感光树脂组合物

    公开(公告)号：US20140212812A1

    公开(公告)日：2014-07-31

    申请号：US14237139

    申请日：2012-05-31

    申请人： Minjung Kim ,  Han Soo Kim ,  Kyung Soo Choi

    发明人： Minjung Kim ,  Han Soo Kim ,  Kyung Soo Choi

    IPC分类号： G03F7/038

    CPC分类号： G03F7/0388 ,  C08F14/18 ,  C08F214/18 ,  C08F214/182 ,  C08F220/18 ,  C08F222/1006 ,  C09D4/00 ,  C09D4/06 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/033 ,  C08F2220/185 ,  C08F2220/1883 ,  C08F220/24 ,  C08F220/06 ,  C08F226/02 ,  C08F212/08

    摘要： The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

    摘要翻译： 本申请涉及具有新颖结构的氟基树脂和包含其的感光性树脂组合物。 包含根据本申请的示例性实施方案的氟基树脂的感光性树脂组合物具有优异的光敏性和显影性，并且可以增加涂膜的接触角以防止水渍。 因此，根据本申请的示例性实施方案的包含氟基树脂的感光性树脂组合物可以应用于各种感光材料，特别是当制造用于LCD的滤色器图案时，可以优选应用。

    Method for manufacturing color filter and color filter manufactured by using the same
    4.
    发明授权
    Method for manufacturing color filter and color filter manufactured by using the same 有权
    制造使用该滤色器的滤色器和滤色器的方法

    公开(公告)号：US08597861B2

    公开(公告)日：2013-12-03

    申请号：US12450549

    申请日：2008-03-06

    申请人： Dae-Hyun Kim ,  Dong-Chang Choi ,  Kyung-Soo Choi ,  Ho-Chan Ji ,  Hyun-Sik Kim ,  Geun-Young Cha ,  Sung-Hyun Kim ,  Jae-Joon Kim ,  Min-A Yu ,  Mi-Ae Kim ,  Mi-Kyoung Kim

    发明人： Dae-Hyun Kim ,  Dong-Chang Choi ,  Kyung-Soo Choi ,  Ho-Chan Ji ,  Hyun-Sik Kim ,  Geun-Young Cha ,  Sung-Hyun Kim ,  Jae-Joon Kim ,  Min-A Yu ,  Mi-Ae Kim ,  Mi-Kyoung Kim

    IPC分类号： G02B5/20

    CPC分类号： G02B5/201

    摘要： The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.

    摘要翻译： 本发明涉及一种制造滤色器的方法和使用该滤色器制造的滤色器。 更具体地说，本发明涉及一种彩色滤光片的制造方法，其特征在于，对形成在基板上的黑矩阵（BM）图案进行等离子体处理，以增加黑矩阵图案和像素单元的斥墨性差异， 以及使用该滤色器制造的滤色片。 当使用本发明的制造方法时，可以提供一种滤色器，其中通过使用喷墨印刷方法在墨水排出期间在像素单元中或在墨水排出期间不在像素单元之间进行混色，其中由于不充分而变色 不发生，表面是均匀的，并且在像素单元中或像素单元之间存在微不足道的步骤。

    BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES
    5.
    发明申请
    BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES 审中-公开
    具有高遮光性和改进粘合性能的黑色矩阵组合物

    公开(公告)号：US20110151379A1

    公开(公告)日：2011-06-23

    申请号：US12965715

    申请日：2010-12-10

    申请人： Dong Chang Choi ,  Kyung Soo Choi ,  Ho Chan Ji ,  Geun Young Cha ,  Sang Chul Lee

    发明人： Dong Chang Choi ,  Kyung Soo Choi ,  Ho Chan Ji ,  Geun Young Cha ,  Sang Chul Lee

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0007 ,  G02F1/133512 ,  G03F7/0048 ,  G03F7/031 ,  G03F7/032

    摘要： The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display including the same. The black matrix photosensitive resin composition comprises an alkali-soluble binder resin, a multi-functional monomer having an ethylenic unsaturated double bond, a photopolymerization initiator, an adhesion accelerator, a solvent, and a colorant comprising black pigments. A Cardo type binder is mixed in an amount of 10 to 90 wt % and an acryl type binder is mixed in an amount of 10 to 90 wt % based on a total weight of the alkali-soluble binder resin including the Cardo type binder and the acryl type binder.

    摘要翻译： 本发明涉及一种具有高遮光性和改善粘合性的黑色基质感光性树脂组合物和包含该黑色矩阵的液晶显示器的黑色矩阵。 黑色感光性树脂组合物包含碱溶性粘合剂树脂，具有烯属不饱和双键的多官能单体，光聚合引发剂，粘合促进剂，溶剂和包含黑色颜料的着色剂。 将Cardo型粘合剂以10〜90重量％的量混合，丙烯酸类粘合剂的混合量相对于包含Cardo型粘合剂的碱溶性粘合剂树脂的总重量为10〜90重量％ 丙烯酸类粘合剂。

    Cleaning agent composition for a positive or a negative photoresist
    8.
    发明申请
    Cleaning agent composition for a positive or a negative photoresist 有权
    用于正性或负性光致抗蚀剂的清洁剂组合物

    公开(公告)号：US20050119142A1

    公开(公告)日：2005-06-02

    申请号：US10500752

    申请日：2003-01-09

    申请人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    发明人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    IPC分类号： C11D3/37 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  G03F7/16 ,  G03F7/42 ,  H01L21/027 ,  H01L21/304 ,  C11D1/00

    CPC分类号： C11D7/264 ,  C11D3/3707 ,  C11D7/263 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/168

    摘要： The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.

    摘要翻译： 本发明涉及一种用于清洁光致抗蚀剂的组合物，并且提供一种清洁组合物，其中在清洁含有负性光致抗蚀剂的颜料之后，光致抗蚀剂的残留物不残留在清洁区域和未清洁区域之间的边界表面上， 软烤，暴露和发达。 本发明提供一种用于清洗正性或负性光致抗蚀剂的组合物，其包含（a）0.1-20wt。 ％和分子量为50至2000的烷基氧化物聚合物和（b）80至99.9重量％ ％的有机溶剂含有：（b-1）1〜20重量份二丙二醇甲基醚（DPGME），10〜50重量份N-甲基吡咯烷酮（NMP）和50〜90重量份 甲基异丁基酮（MIBK）的重量，或（b-2）10至90重量份的二甲基甲醛（DMF）或二甲基乙酰胺（DMAc）和10至50重量份的乙酸正丁酯。