METHOD FOR FABRICATING GALLIUM-DOPED LITHIUM LANTHANUM ZIRCONIUM OXIDE, AND ALL-SOLID-STATE BATTERY INCLUDING THE SAME

    公开(公告)号:US20230387452A1

    公开(公告)日:2023-11-30

    申请号:US18231883

    申请日:2023-08-09

    CPC classification number: H01M10/056 H01M4/382 H01M2004/027

    Abstract: The present invention provides a method for the fabrication of a LaZrGa(OH)x metal hydroxide precursor with a co-precipitation method in a continuous TFR reactor. The present invention also provides a method for the fabrication of an ion-doped all-solid-state lithium-ion conductive material with lithium ionic conductivity, and mixing which in the polymer base material, using a doctor-blade coating method to prepare a free standing double layered and triple layered organic-inorganic hybrid solid electrolyte membrane. Furthermore, the present invention provides an all-solid-state lithium battery using the aforementioned hybrid solid electrolyte membrane and measure the electrochemical performance. The all-solid-state lithium battery may enhance the lithium ionic conductivity, and lower the interfacial resistance between the solid electrolyte membrane and the electrode, therefore the battery may have excellent performance, and prevent the lithium-dendrite formation effectively to enhance the safety.

    Electrode component for generating large area atmospheric pressure plasma

    公开(公告)号:US11291744B2

    公开(公告)日:2022-04-05

    申请号:US16827215

    申请日:2020-03-23

    Abstract: An electrode component for generating large area atmosphere pressure plasma is provided. The electrode component comprises a first transparent insulation substrate, a first transparent electrode pattern, a second transparent electrode pattern, and a second transparent insulation substrate. The first transparent insulation substrate has a first thickness. The first transparent electrode pattern and the second transparent electrode pattern are formed on the upper surface of the first transparent insulation substrate and has a gap therebetween. The second transparent insulation substrate has a second thickness and covers the first transparent electrode pattern and the second transparent electrode pattern. The first thickness is greater than the second thickness in order to form atmospheric pressure plasma above the second transparent insulation substrate.

    ELECTRODE COMPONENT FOR GENERATING LARGE AREA ATMOSPHERIC PRESSURE PLASMA

    公开(公告)号:US20210068242A1

    公开(公告)日:2021-03-04

    申请号:US16827215

    申请日:2020-03-23

    Abstract: An electrode component for generating large area atmosphere pressure plasma is provided. The electrode component comprises a first transparent insulation substrate, a first transparent electrode pattern, a second transparent electrode pattern, and a second transparent insulation substrate. The first transparent insulation substrate has a first thickness. The first transparent electrode pattern and the second transparent electrode pattern are formed on the upper surface of the first transparent insulation substrate and has a gap therebetween. The second transparent insulation substrate has a second thickness and covers the first transparent electrode pattern and the second transparent electrode pattern. The first thickness is greater than the second thickness in order to form atmospheric pressure plasma above the second transparent insulation substrate.

    ELECTROPLATING APPARATUS
    6.
    发明申请

    公开(公告)号:US20190093252A1

    公开(公告)日:2019-03-28

    申请号:US16032522

    申请日:2018-07-11

    Abstract: An apparatus for electroplating which is applicable to the electroplating of workpiece is disclosed. The apparatus includes: an electroplating solution container, a target, an absorbent piece, and a power supply. All the electroplating solution, workpiece, absorbent piece, and target are placed inside the electroplating solution container with at least partial portions of each workpiece, absorbent piece and target submerged in the electroplating solution. The positive electrode of the power supply is electrically connected to the target while its negative electrode is electrically connected to the workpiece and absorbent piece simultaneously. When the power supply imposes a current through the circuit, the target releases metal ions into the electroplating solution and metal ions reduce and a metal coating is formed on the workpiece. In the meantime, carbocations in the electroplating solution are adsorbed on the absorbent piece.

    Endodontic file with high fatigue resistance
    7.
    发明授权
    Endodontic file with high fatigue resistance 有权
    具有高耐疲劳性的牙髓文件

    公开(公告)号:US09566131B2

    公开(公告)日:2017-02-14

    申请号:US14711136

    申请日:2015-05-13

    CPC classification number: A61C5/42 A61C2201/007

    Abstract: An endodontic file with improved fatigue resistance comprising a conical body made of a metal alloy and an amorphous titanium-zirconium-boron film deposited on a surface of the conical body.

    Abstract translation: 具有改善的抗疲劳性的牙髓质文件包括由金属合金制成的圆锥体和沉积在锥体的表面上的无定形钛 - 锆 - 硼薄膜。

    Physical vapor deposition of an aluminum nitride film
    8.
    发明授权
    Physical vapor deposition of an aluminum nitride film 有权
    氮化铝膜的物理气相沉积

    公开(公告)号:US09484198B1

    公开(公告)日:2016-11-01

    申请号:US14687474

    申请日:2015-04-15

    CPC classification number: C23C14/0617 C23C14/0036 C23C14/345 C23C14/3485

    Abstract: A method for physical vapor deposition of an aluminum nitride film, comprising: positioning a substrate and an aluminum target in a chamber; vacuuming the chamber so that a chamber pressure is at a base pressure between 7.1×10−7-5×10−6 torr; conducting a working gas composed of argon gas and nitrogen gas into the chamber so that the chamber pressure is at a working pressure between 3-7 mtorr; and depositing the aluminum nitride film on the substrate by applying a high power impulse power supply to the aluminum target and applying a direct current bias power supply to the substrate under the working pressure and a substrate temperature between room temperature (25° C.) to 200° C.; wherein a power of the high power impulse power supply is between 500-600 W and a frequency thereof is between 750-1250 Hz, and a bias of the direct current bias power supply is between −50-0 V.

    Abstract translation: 一种用于氮化铝膜的物理气相沉积的方法,包括:将基底和铝靶定位在腔室中; 对腔室进行抽真空,使得腔室压力在7.1×10-7-5×10-6乇之间的基础压力; 将由氩气和氮气组成的工作气体引入室中,使得室压力在3-7mtorr之间的工作压力; 以及通过向铝靶施加大功率脉冲电源并在工作压力和基板温度(室温(25℃)至+ 25℃)之间向衬底施加直流偏压电源,将氮化铝膜沉积在衬底上 200°C。 其中高功率脉冲电源的功率在500-600W之间,其频率在750-1250Hz之间,直流偏置电源的偏压在-50-0V之间。

    PHYSICAL VAPOR DEPOSITION OF AN ALUMINUM NITRIDE FILM
    9.
    发明申请
    PHYSICAL VAPOR DEPOSITION OF AN ALUMINUM NITRIDE FILM 审中-公开
    硝酸铝膜的物理气相沉积

    公开(公告)号:US20160307749A1

    公开(公告)日:2016-10-20

    申请号:US14687474

    申请日:2015-04-15

    CPC classification number: C23C14/0617 C23C14/0036 C23C14/345 C23C14/3485

    Abstract: A method for physical vapor deposition of an aluminum nitride film, comprising: positioning a substrate and an aluminum target in a chamber; vacuuming the chamber so that a chamber pressure is at a base pressure between 7.1×10−7-5×10−6 torr; conducting a working gas composed of argon gas and nitrogen gas into the chamber so that the chamber pressure is at a working pressure between 3-7 mtorr; and depositing the aluminum nitride film on the substrate by applying a high power impulse power supply to the aluminum target and applying a direct current bias power supply to the substrate under the working pressure and a substrate temperature between room temperature (25° C.) to 200° C.; wherein a power of the high power impulse power supply is between 500-600 W and a frequency thereof is between 750-1250 Hz, and a bias of the direct current bias power supply is between −50-0 V.

    Abstract translation: 一种用于氮化铝膜的物理气相沉积的方法,包括:将基底和铝靶定位在腔室中; 对腔室进行抽真空,使得腔室压力在7.1×10-7-5×10-6乇之间的基础压力; 将由氩气和氮气组成的工作气体引入室中,使得室压力在3-7mtorr之间的工作压力; 以及通过向铝靶施加大功率脉冲电源并在工作压力和基板温度(室温(25℃)至+ 25℃)之间向衬底施加直流偏压电源,将氮化铝膜沉积在衬底上 200°C。 其中高功率脉冲电源的功率在500-600W之间,其频率在750-1250Hz之间,直流偏置电源的偏压在-50-0V之间。

    HARD MAGNETIC ALLOY THIN FILM USED IN HIGH DENSITY PERPENDICULAR MAGNETIC RECORDING MEDIUM
    10.
    发明申请
    HARD MAGNETIC ALLOY THIN FILM USED IN HIGH DENSITY PERPENDICULAR MAGNETIC RECORDING MEDIUM 审中-公开
    硬密度磁记录介质使用的硬磁合金薄膜

    公开(公告)号:US20160180874A1

    公开(公告)日:2016-06-23

    申请号:US14578665

    申请日:2014-12-22

    CPC classification number: G11B5/851 G11B5/653 H01F10/123 H01F41/18

    Abstract: This invention discloses a hard magnetic alloy thin film used in a high density perpendicular magnetic recording medium. This film incorporates a glass substrate and a ferromagnetic layer formed on the glass substrate. The ferromagnetic layer is deposited onto the substrate using a sputtering deposition and an annealing. After annealing, a single-layered ferromagnetic film with high perpendicular magnetic anisotropy is achieved.

    Abstract translation: 本发明公开了一种用于高密度垂直磁记录介质的硬磁合金薄膜。 该膜包括形成在玻璃基板上的玻璃基板和铁磁层。 使用溅射沉积和退火将铁磁层沉积到衬底上。 退火后,实现了具有高垂直磁各向异性的单层铁磁膜。

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