公开(公告)号：US06456364B1

公开(公告)日：2002-09-24

申请号：US09447238

申请日：1999-11-23

申请人： Shunzo Imai

发明人： Shunzo Imai

IPC分类号： G03B2758

CPC分类号： G03F7/70525 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70975

摘要： A semiconductor manufacturing apparatus having a guard system, an interlocking system operable in response to loss of function in a portion of the guard system, to stop a corresponding operation in the apparatus, and an interlock disabling switch for disabling the interlocking through the interlocking system. The structure accomplishes prompt disabling of the interlocking, to improve the efficiency of a maintenance or service operation. A safeguard can be achieved without a decrease of throughput.

摘要翻译： 一种半导体制造装置，其具有防护系统，可响应于防护系统的一部分功能的损失而操作的联锁系统，以停止装置中的对应操作，以及联锁禁用开关，用于禁止通过联锁系统的联锁。 该结构能够快速禁用互锁，提高维护或维修操作的效率。 可以在不降低吞吐量的情况下实现保护。

公开(公告)号：US4747608A

公开(公告)日：1988-05-31

申请号：US792584

申请日：1985-10-29

申请人： Mitsuya Sato ,  Nobuyoshi Deguchi ,  Shunzo Imai

发明人： Mitsuya Sato ,  Nobuyoshi Deguchi ,  Shunzo Imai

IPC分类号： H01L21/683 ,  B23B31/00

CPC分类号： H01L21/6838 ,  Y10T279/11 ,  Y10T279/3481

摘要： A wafer chuck for releasably holding a wafer, includes a base member having an upper surface for carrying and holding thereon the wafer, a lift mechanism operative on the wafer when it rests on the base member to move the wafer relative to the base member in a direction away from the base member, the lift mechanism having an operative member extending substantially in a direction to a radially inward position from a radially outward position of the base member, the operative member having an end portion movable, relative to the base member, between a first position at which it is retracted from the upper surface of the base member and a second position at which it is protrudent from the upper surface of the base member so as to engage with the wafer to move the same relative to the base member, and driving means for moving, relative to the base member, the end portion of the operative member between the first and second positions.

摘要翻译： 用于可释放地保持晶片的晶片卡盘包括具有用于承载和保持其上的晶片的上表面的基座构件;当晶片搁置在基座构件上时，其在晶片上操作以在晶片上相对于基座构件移动的升降机构 方向远离基座构件，提升机构具有一个可操作构件，其基本上沿着从基座构件的径向向外位置向径向向内位置的方向延伸，该操作构件具有可相对于底座构件在相对于底座构件之间移动的端部 从基部构件的上表面缩回的第一位置和从基部构件的上表面突出的第二位置，以便与晶片接合以使其相对于基座构件移动， 以及驱动装置，用于相对于基座构件在第一和第二位置之间移动操作构件的端部。

公开(公告)号：US4630922A

公开(公告)日：1986-12-23

申请号：US707235

申请日：1985-03-01

申请人： Shunzo Imai ,  Ichiro Ishiyama

发明人： Shunzo Imai ,  Ichiro Ishiyama

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70066 ,  G03F7/70241

摘要： An apparatus for irradiating a first object so as to achieve at least one of alignment between the first object and a second object and transfer of a pattern of the first object onto the second object. The apparatus includes an optical device disposed in the path of the irradiating beam to correct or prevent any change in the optical path length depending on the thickness of the first object.

摘要翻译： 一种用于照射第一物体以便实现第一物体和第二物体之间的对准中的至少一种并将第一物体的图案转移到第二物体上的装置。 该装置包括设置在照射光束的路径中的光学装置，以根据第一物体的厚度校正或防止光路长度的任何变化。

公开(公告)号：US4789294A

公开(公告)日：1988-12-06

申请号：US900711

申请日：1986-08-27

申请人： Mitsuya Sato ,  Shunzo Imai ,  Ryozo Hiraga

发明人： Mitsuya Sato ,  Shunzo Imai ,  Ryozo Hiraga

IPC分类号： H01L21/677 ,  B65H5/08

CPC分类号： H01L21/67778 ,  Y10S414/137 ,  Y10S414/138

摘要： A wafer processing apparatus, comprising a wafer processing station for processing a wafer, a key input portion for inputting wafer processing instructions into the wafer processing station, and wherein at least one of a portion for accommodating a wafer carrier for carrying the wafer, a mechanism for taking the wafer out of the wafer carrier and putting it back into the wafer carrier, wafer alignment station for aligning the wafer and a wafer observing station for allowing an operator to observe the wafer, is disposed at a front side of the apparatus to which the operator faces when actuating the key input portion.

摘要翻译： 一种晶片处理装置，包括用于处理晶片的晶片处理站，用于将晶片处理指令输入晶片处理站的键输入部分，并且其中用于容纳用于承载晶片的晶片载体的部分中的至少一个， 为了将晶片从晶片载体中取出并将其放回到晶片载体中，用于对准晶片的晶片对准站和用于允许操作者观察晶片的晶片观察站被布置在装置的前侧 当操作键输入部分时，操作者面对。

公开(公告)号：US06304005B1

公开(公告)日：2001-10-16

申请号：US09274111

申请日：1999-03-23

申请人： Shuji Aoki ,  Shunzo Imai

发明人： Shuji Aoki ,  Shunzo Imai

IPC分类号： H02J700

CPC分类号： H02J9/06 ,  Y10T307/615 ,  Y10T307/696 ,  Y10T307/724 ,  Y10T307/729 ,  Y10T307/766 ,  Y10T307/944

摘要： A fabrication apparatus including an emergency stop circuit which is an emergency stop switch has a first electromagnetic switch for supplying and shutting off power to the apparatus and a second electromagnetic switch for controlling power supply to an electromagnetic coil of the first electromagnetic switch. Power is supplied to the electromagnetic coil of the first electromagnetic switch from the primary side of the first electromagnetic switch via a contact of the second electromagnetic switch. An uninterruptible power source supplies power to an electromagnetic coil of the second electromagnetic switch via the emergency stop circuit. This emergency stop switch is inserted midway along a power line to the electromagnetic coil of the second electromagnetic switch. This allows a safe emergency stop of the fabrication apparatus for semiconductors and the like. When the operation of the fabrication apparatus stops due to stoppage of power, the apparatus is automatically reactivated after the power is recovered. This increases the productivity.

摘要翻译： 包括紧急停止开关的紧急停止电路的制造装置具有用于向设备供电和断电的第一电磁开关和用于控制对第一电磁开关的电磁线圈供电的第二电磁开关。 电力通过第二电磁开关的接触从第一电磁开关的初级侧提供给第一电磁开关的电磁线圈。 不间断电源通过紧急停止电路向第二电磁开关的电磁线圈供电。 该紧急停止开关沿电力线的中途插入第二电磁开关的电磁线圈。 这样可以安全地紧急停止半导体制造装置等。 当制造装置的操作由于电力停止而停止时，在恢复电力之后自动重新启动装置。 这提高了生产率。

公开(公告)号：US5463497A

公开(公告)日：1995-10-31

申请号：US261229

申请日：1994-06-16

申请人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

发明人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

IPC分类号： G02B3/00 ,  G02B26/08 ,  G02B27/14 ,  G02B27/48 ,  G03F7/20 ,  G02B27/10 ,  F21K7/00

CPC分类号： G02B3/0056 ,  G02B26/0891 ,  G02B27/123 ,  G02B27/126 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70583 ,  G02B27/0961 ,  G02B3/0087

摘要： An illumination device includes a radiation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

摘要翻译： 照明装置包括辐射源; 光学积分器具有沿垂直于该装置的光轴的平面设置的透镜阵列; 第一光学系统，用于对来自辐射源的相干光束进行分频并产生彼此基本不相干的多个光束，第一光学系统还有效地将光束投影到不同方向的光学积分器并且叠加光束 在光学积分器上彼此相依; 以及第二光学系统，用于将光束从光学积分器的透镜引导到要被照射的表面，并且用于将光束彼此叠置在待照亮的表面上。

公开(公告)号：US5153773A

公开(公告)日：1992-10-06

申请号：US534246

申请日：1990-06-07

申请人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

发明人： Masato Muraki ,  Akiyoshi Suzuki ,  Shunzo Imai

IPC分类号： G02B3/00 ,  G02B26/08 ,  G02B27/14 ,  G02B27/48 ,  G03F7/20

CPC分类号： G02B3/0056 ,  G02B26/0891 ,  G02B27/123 ,  G02B27/126 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70583 ,  G02B27/0961 ,  G02B3/0087

摘要： An illumination device includes a raidation source; an optical integrator having an array of lenses disposed along a plane perpendicular to an optical axis of the device; a first optical system for amplitude-dividing a coherent beam from the radiation source and producing plural beams which are substantially incoherent with each other, the first optical system also being effective to project the beams to the optical integrator in different directions and to superpose the beams upon one another on the optical integrator; and a second optical system for directing beams from the lenses of the optical integrator to a surface to be illuminated and for superposing the beams upon one another on the surface to be illuminated.

摘要翻译： 照明装置包括突袭源; 光学积分器具有沿垂直于该装置的光轴的平面设置的透镜阵列; 第一光学系统，用于对来自辐射源的相干光束进行分频并产生彼此基本不相干的多个光束，第一光学系统还有效地将光束投影到不同方向的光学积分器并且叠加光束 在光学积分器上彼此相依; 以及第二光学系统，用于将光束从光学积分器的透镜引导到要被照射的表面，并且用于将光束彼此叠置在待照亮的表面上。

公开(公告)号：US4758127A

公开(公告)日：1988-07-19

申请号：US892734

申请日：1986-07-28

申请人： Shunzo Imai ,  Hiroshi Sato ,  Kazuo Iizuka

发明人： Shunzo Imai ,  Hiroshi Sato ,  Kazuo Iizuka

IPC分类号： G03B23/02 ,  G03F7/20 ,  H01L21/673 ,  H01L21/677 ,  B65D85/30 ,  G03B9/02 ,  G03B41/16

CPC分类号： H01L21/67359 ,  G03B23/02 ,  G03F1/66 ,  G03F7/70741 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778

摘要： An apparatus includes a plurality of cassettes each for containing a mask or reticle having thereon an integrated circuit pattern, each cassette having a holder for holding the mask or reticle while covering the lower surface thereof, the apparatus further including a carrier for storing therein the cassettes in a layered fashion, a fork for selectively taking out one of the holders from the carrier and an elevator for feeding the take-out holder to a separation station so that the mask or reticle is automatically taken out from, fed from and moved back into the carrier.

摘要翻译： 一种装置包括多个盒，每个盒用于容纳其上具有集成电路图案的掩模或掩模版，每个盒具有用于在覆盖其下表面的同时保持掩模或掩模版的保持器，该装置还包括用于在其中存储盒的载体 以分层方式，用于选择性地从托架中取出一个保持器的叉子和用于将取出夹持器馈送到分离站的电梯，使得掩模或掩模版被自动地从其中取出，从中馈送并移回 承运人