Circuit board having electric component and its manufacturing method
    2.
    发明授权
    Circuit board having electric component and its manufacturing method 失效
    具有电气元件的电路板及其制造方法

    公开(公告)号:US06225570B1

    公开(公告)日:2001-05-01

    申请号:US09125260

    申请日:1998-08-10

    IPC分类号: H05K116

    摘要: This invention provides a circuit board having an electric component which has an electric element smaller than a conventional element. A circuit pattern (5) which includes a pair of contact electrodes (3, 3) is formed on the surface of a board (1) made of an insulating material. A photoresist film (7) is formed on the surface of the board (1). At least one electric element forming hole (9) is formed in the photoresist film (7) by a lithography technology so as to expose at least part of the pair of the contact electrodes (3, 3). The electric element forming hole (9) is filled with an electric element forming paste material to form an electric element (13). A protective film (15) made of a synthetic resin is so formed as to cover the electric element forming hole (9).

    摘要翻译: 本发明提供一种电路板,其具有比常规元件小的电气元件的电气部件。 在由绝缘材料制成的板(1)的表面上形成包括一对接触电极(3,3)的电路图案(5)。 在板(1)的表面上形成光致抗蚀剂膜(7)。 通过光刻技术在光致抗蚀剂膜(7)中形成至少一个电子元件形成孔(9),以暴露所述一对接触电极(3,3)的至少一部分。 电元件形成孔(9)填充有电子元件形成膏材以形成电元件(13)。 由合成树脂制成的保护膜(15)形成为覆盖电气元件形成孔(9)。

    Pattern transfer apparatus
    3.
    发明授权
    Pattern transfer apparatus 失效
    图案转印装置

    公开(公告)号:US4630922A

    公开(公告)日:1986-12-23

    申请号:US707235

    申请日:1985-03-01

    CPC分类号: G03F7/70066 G03F7/70241

    摘要: An apparatus for irradiating a first object so as to achieve at least one of alignment between the first object and a second object and transfer of a pattern of the first object onto the second object. The apparatus includes an optical device disposed in the path of the irradiating beam to correct or prevent any change in the optical path length depending on the thickness of the first object.

    摘要翻译: 一种用于照射第一物体以便实现第一物体和第二物体之间的对准中的至少一种并将第一物体的图案转移到第二物体上的装置。 该装置包括设置在照射光束的路径中的光学装置,以根据第一物体的厚度校正或防止光路长度的任何变化。

    Alignment device
    5.
    发明授权
    Alignment device 失效
    对准装置

    公开(公告)号:US4717257A

    公开(公告)日:1988-01-05

    申请号:US763710

    申请日:1985-08-08

    CPC分类号: G03F9/70

    摘要: An alignment device for aligning a reticle and a wafer with the aid of a projection lens system for projecting an integrated circuit pattern of the reticle onto the wafer, wherein a light beam from the wafer is passed throught the projection lens and is directed by way of an objective lens to a spatial filter to detect a positional relation between the reticle and the wafer. According to the position of an optical axis of the objective lens relative to an optical axis of the projection lens and according to the telecentricity of the projection lens, the spatial filter is displaced relative to the optical axis of the objective lens, whereby a particular component of the light beam from the wafer is positively extracted out, without being affected against by displacement of the objective lens for the alignment operation.

    摘要翻译: 一种用于借助于投影透镜系统对准标线片和晶片的对准装置,用于将光罩的集成电路图案投影到晶片上,其中来自晶片的光束穿过投影透镜并被引导通过 用于检测掩模版和晶片之间的位置关系的空间滤光器的物镜。 根据物镜的光轴相对于投影透镜的光轴的位置,并且根据投影透镜的远心度,空间滤光器相对于物镜的光轴移位,由此特定的部件 来自晶片的光束被肯定地抽出,而不受用于对准操作的物镜的位移的影响。

    Pressure-sensitive resistor sensor having electrodes with reduced contact resistance deviation
    7.
    发明授权
    Pressure-sensitive resistor sensor having electrodes with reduced contact resistance deviation 有权
    压敏电阻传感器具有接触电阻偏差降低的电极

    公开(公告)号:US06626046B2

    公开(公告)日:2003-09-30

    申请号:US09962265

    申请日:2001-09-26

    IPC分类号: G01L900

    CPC分类号: G01L1/205

    摘要: It is the objective of this invention to reduce deviation in contact resistance variation between electrodes among pressure-sensitive resistor sensors. The sensor is composed of a pair of films. One film has a plurality of electrode portions extending in a certain direction and the other film has at least one electrode portion that is arranged in a transverse relation with a plural of the electrode portions on the other film. Contact points generated by applied pressure are limited to crossing points between the electrode portions of the pair of films. As a result, variation in contact resistance due to applied pressure shift becomes more constant. Thus, it is possible to reduce deviation of contact resistance between the electrodes among sensors.

    摘要翻译: 本发明的目的是减少压敏电阻传感器中电极之间的接触电阻变化的偏差。 传感器由一对薄膜组成。 一个膜具有沿一定方向延伸的多个电极部分,另一个膜具有至少一个与另一个膜上的多个电极部分呈横向关系的电极部分。 通过施加的压力产生的接触点被限制在该对电极的电极部分之间的交叉点。 结果,由于施加的压力偏移引起的接触电阻的变化变得更加恒定。 因此,可以减少传感器之间的电极之间的接触电阻的偏差。

    Pressure sensitive transducer with pressure sensitive layer including
semi-conductive particles
    8.
    发明授权
    Pressure sensitive transducer with pressure sensitive layer including semi-conductive particles 失效
    带有敏感层的压敏传感器,包括半导体颗粒

    公开(公告)号:US6121870A

    公开(公告)日:2000-09-19

    申请号:US343048

    申请日:1999-06-29

    IPC分类号: G01L1/20 H01C10/12 H01C10/10

    CPC分类号: H01C10/12

    摘要: Pressure sensitive layers are disposed on respective resin films through electrodes to face each other, and include high conductivity flaky carbon particles and low conductivity amorphous-based carbon particles. The two kinds of carbon particles are bound together by a resin-system binder. Accordingly, when a pushing force is applied to the resin films, an average distance between the carbon particles is decreased to cause a tunnel conduction phenomenon, resulting in a decrease in conductive resistance between the electrodes. As a result, a pressure sensing property can be made gentle.

    摘要翻译: 压敏层通过电极相对设置在相应的树脂膜上,并且包括高导电性片状碳颗粒和低导电性无定形碳颗粒。 两种碳颗粒通过树脂系粘合剂结合在一起。 因此,当向树脂膜施加推力时,碳粒子之间的平均距离减小,导致隧道传导现象,导致电极之间的导电电阻降低。 结果,可以使压力感测特性变得平缓。

    Mask aligner
    9.
    发明授权
    Mask aligner 失效
    面罩对齐器

    公开(公告)号:US4479711A

    公开(公告)日:1984-10-30

    申请号:US446366

    申请日:1982-12-02

    IPC分类号: G03F9/00 G03B27/52

    CPC分类号: G03F9/7076

    摘要: In a mask aligner, the actual element pattern of a mask is transferred onto a resist applied to the surface of a wafer, while the alignment pattern of the mask is not transferred onto said resist. That is, the line width of the alignment pattern of the mask is a line width which is not transferred to the wafer. If the pattern of the mask is formed so that the line width of the alignment pattern is thin as compared with that of the actual element pattern, the exposure amount in the alignment pattern portion on the resist applied to the surface of the wafer becomes excessive due to the diffraction phenomenon and thus, the alignment pattern of the mask is not transferred onto the wafer.

    摘要翻译: 在掩模对准器中,掩模的实际元件图案被转移到施加到晶片表面的抗蚀剂上,同时掩模的对准图案不被转印到所述抗蚀剂上。 也就是说,掩模的对准图案的线宽是不传送到晶片的线宽。 如果掩模的图案形成为使得对准图案的线宽与实际元件图案相比较薄,则施加到晶片表面的抗蚀剂上的对准图案部分中的曝光量变得过大 因此,掩模的对准图案不会转印到晶片上。