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公开(公告)号:US20220306787A1
公开(公告)日:2022-09-29
申请号:US17617868
申请日:2020-06-29
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Kazuteru NAGASAKA , Masatomi IRISAWA , Yuji ODA
IPC: C08F222/38 , C08F220/56 , C08F290/06 , C08F220/58 , C08F122/38
Abstract: A polymerizable composition includes an amide compound represented by Formula (1) and a polymerization initiator.
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公开(公告)号:US20210079252A1
公开(公告)日:2021-03-18
申请号:US16620253
申请日:2018-06-12
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Masatomi IRISAWA
IPC: C09D129/04 , C09D139/06 , C09D4/06 , C08J5/24 , C08F220/56 , C08F220/28 , C08L67/00
Abstract: A coating composition containing a water-soluble polymer selected from the group consisting of the following (1) and (2): (1) a polyvinyl alcohol, a modified product thereof or a derivative thereof; and (2) a polyvinylpyrrolidone, a modified product thereof or a derivative thereof.
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3.
公开(公告)号:US20240117081A1
公开(公告)日:2024-04-11
申请号:US17767521
申请日:2020-11-10
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Kazuteru NAGASAKA , Masatomi IRISAWA , Yuji ODA
IPC: C08F20/58 , C09D4/00 , C09D11/101 , C09D11/106 , C09D11/322 , C09D11/38
CPC classification number: C08F20/58 , C09D4/00 , C09D11/101 , C09D11/106 , C09D11/322 , C09D11/38
Abstract: A polymerizable composition includes a water-soluble monofunctional acrylamide compound, a water-soluble photoradical initiator, a water-soluble photosensitizer, and an aqueous solvent.
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公开(公告)号:US20200073239A1
公开(公告)日:2020-03-05
申请号:US16463180
申请日:2017-11-21
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Masatomi IRISAWA
IPC: G03F7/038
Abstract: Provided are: a curable composition having excellent photolithographic properties and resin elution properties; a cured product of the curable composition; and a curing method of the curable composition. The curable composition is characterized by including: (A) at least one selected from the group consisting of a water-soluble polyfunctional (meth)acrylates and water-soluble polyfunctional (meth)acrylamides; and (B) a photosensitive group-containing water-soluble polymer. The water-soluble polyfunctional (meth)acrylates are preferably compounds represented by Formula (I) below, and the water-soluble polyfunctional (meth)acrylamides are preferably compounds represented by Formula (II) below. In Formulae (I) and (II), R1 represents a hydrogen atom, a methyl group, or a halogen atom; X1 represents an alkylene group having 1 to 6 carbon atoms that is optionally substituted with a hydroxy group; A represents an n-valent organic group; R11 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; m represents a number of 1 to 30; n represents a number of 2 to 12; and t represents a number of 2 to 12.
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公开(公告)号:US20240352203A1
公开(公告)日:2024-10-24
申请号:US18577499
申请日:2022-07-15
Applicant: ADEKA CORPORATION
Inventor: Hiromasa SAITO , Yousuke MURAMATSU , Mizuki SUZUKI , Masatomi IRISAWA
IPC: C08J5/18 , C07D487/04 , C08G61/12
CPC classification number: C08J5/18 , C07D487/04 , C08G61/124 , C08G2261/11 , C08G2261/1414 , C08G2261/1422 , C08G2261/1424 , C08G2261/148 , C08G2261/228 , C08G2261/3241 , C08J2365/00
Abstract: A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group.
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6.
公开(公告)号:US20200032021A1
公开(公告)日:2020-01-30
申请号:US16493865
申请日:2018-03-13
Applicant: ADEKA CORPORATION
Inventor: Masatomi IRISAWA , Kenji HARA
IPC: C08J7/18 , C09D4/06 , C09D11/101 , C09J4/06 , C07F9/30 , C07D295/037 , C07D211/46 , C07C215/40 , G03F7/029
Abstract: Provided are: a water-soluble composition which has excellent storage stability and is adaptable to a wide range of light sources and capable of forming a highly fine pattern; a method of producing a cured product of the same; a cured product of the same; and an acylphosphinate. The water-soluble composition contains: an acylphosphinate (A) represented by Formula (I) below, wherein X1 represents an aryl group having 6 to 15 carbon atoms; X2 represents a linear alkyl group having 1 to 8 carbon atoms or the like; Am+ represents an alkali metal ion or the like; and m represents a number of 1 to 3; and a compound (B) having a group represented by Formula (II) below, wherein R1 represents a hydrogen atom or the like; Z1 represents an oxygen atom or the like; R2 represents a hydrogen atom or the like; Z2 represents an alkylene group having 1 to 6 carbon atoms; n represents a number of 0 to 30; * means a bond; and, when the compound (B) has plural groups represented by Formula (II), plural R1′s, Z1′s, Z2′s and n's are each optionally the same or different.
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公开(公告)号:US20180305537A1
公开(公告)日:2018-10-25
申请号:US15766262
申请日:2016-10-14
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Masatomi IRISAWA
CPC classification number: C08L29/04 , C08K5/1515 , C08K5/29 , C08K5/3415 , C08K5/353 , C08L67/00 , C09D129/04 , G02B5/30 , G03F7/00 , C08K5/0025
Abstract: Provided are: a resin composition which has excellent transparency and coating properties and exhibits low liquid crystal-contaminating properties; and an optical film using the same. The resin composition contains a polyvinyl alcohol and a polyester, and the polyester has a carboxyl group and/or a carboxyl group salt as a substituent(s). The polyvinyl alcohol is preferably a homopolymer or a copolymer that contains vinyl alcohol as an essential monomer, and it is preferred that the polyvinyl alcohol has an acetoacetate group.
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公开(公告)号:US20240025909A1
公开(公告)日:2024-01-25
申请号:US18252527
申请日:2021-12-16
Applicant: ADEKA CORPORATION
Inventor: Hiromasa SAITO , Yousuke MURAMATSU , Mizuki SUZUKI , Masatomi IRISAWA
IPC: C07D487/04 , C08F122/22
CPC classification number: C07D487/04 , C08F122/22
Abstract: An object of the present invention is to provide a composition that gives a cured product excellent in heat resistance and solvent resistance. The present invention provides a compound represented by the general formula (I) below and having at least one reactive group in a molecule. In the formula, A represents a hydrocarbon ring having 6 carbon atoms; X1 and X2 each represent, for example, an aryl group having 6 to 30 carbon atoms and optionally substituted with a reactive group or a group having a reactive group; R1, R2, R3, R4, R6, R7, R8, and R9 each represent, for example, a hydrogen atom, a reactive group, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group; and R5 and R10 each represent, for example, a hydrogen atom, or a hydrocarbon group having 1 to 20 carbon atoms and optionally substituted with a reactive group.
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公开(公告)号:US20210107887A1
公开(公告)日:2021-04-15
申请号:US16970116
申请日:2019-02-15
Applicant: ADEKA CORPORATION
Inventor: Kenji HARA , Wataru MIYATA , Masatomi IRISAWA
IPC: C07D335/16 , C08F2/50 , C08F2/44 , C08F16/06
Abstract: Provided are: a radical polymerization initiator which has excellent sensitivity and solubility in water; a composition containing the same; a cured product of the composition; a method of producing the cured product; and a compound. The radical polymerization initiator contains a compound represented by Formula (A) below (wherein Z1 represents a direct bond or the like; Z2 represents >CR1022 or the like; R1 to R8 each represent a hydrogen atom or the like, or a group containing a salt-forming group, which is represented by Formula (B1) below (wherein L1 represents a direct bond or the like, B represents an acidic group salt or the like, b represents 1 to 10, and the asterisk (*) represents a binding site); at least one of R1 to R8 is the group containing a salt-forming group; R101 and the like each represent a hydrogen atom or the like; one or more hydrogen atoms in the alkyl group and the like used as R1 to R8 and the like are optionally substituted with an ethylenically unsaturated group or the like; one or more methylene groups in R1 to R8 and the like are optionally substituted with a double bond or the like; adjacent groups such as R1 and R2 are optionally bound together to form a ring and optionally form a fused ring with a benzene ring in Formula (A); and R′ represents a hydrogen atom or the like).
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公开(公告)号:US20180039179A1
公开(公告)日:2018-02-08
申请号:US15551736
申请日:2016-02-23
Applicant: ADEKA CORPORATION
Inventor: Toshihiko MURAI , Kenji HARA , Masatomi IRISAWA
CPC classification number: G03F7/11 , G03F7/0035 , G03F7/0226 , G03F7/0236 , G03F7/027 , G03F7/038 , G03F7/039 , G03F7/0392 , G03F7/095 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/32 , G03F7/322 , G03F7/325 , G03F7/40
Abstract: Provided are: a pattern-forming method by which a laminate that has excellent interlayer adhesion of a resist film, yields a high-definition pattern and exhibits excellent gas barrier properties and high solvent resistance is obtained; and an electronic device produced by the same. The pattern-forming method includes: the step (1) of forming a film using a composition on a support; the exposure step (2) of irradiating a prescribed part of the thus formed film with an active energy ray to modify the developability of the prescribed part; and the development step (3) of developing the film to obtain a pattern, wherein, a plurality of compositions that differ in solubility to a developing solution are used as the composition, and the resulting pattern has a multilayer structure.
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