公开(公告)号：US20230175126A1

公开(公告)日：2023-06-08

申请号：US18072773

申请日：2022-12-01

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Yingzong Bu ,  Paul Ma ,  Shubham Garg

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4405 ,  C23C16/4583 ,  C23C16/45565 ,  C23C16/45578 ,  H01L21/68757

Abstract: A reactor can include a reaction chamber, a substrate support configured to support a substrate on a top side of the substrate support, and an elongate delivery apparatus disposed within the reaction chamber. The substrate support may be actuated to an upper position and to a lower position along a vertical axis within the reaction chamber. The substrate support may have a maximum horizontal dimension from the vertical axis along a horizontal axis substantially orthogonal to the vertical axis. The elongate delivery apparatus may have an inner horizontal dimension greater than the maximum horizontal dimension of the substrate support. The delivery apparatus can allow gas to pass through an interior of the delivery apparatus. The delivery apparatus can include a plurality of apertures. Each of the plurality of apertures can allow passage of the gas from the interior of the delivery apparatus into the reaction chamber.

公开(公告)号：US20240240323A1

公开(公告)日：2024-07-18

申请号：US18411900

申请日：2024-01-12

Applicant: ASM IP Holding B.V.

Inventor： Ryan Paull ,  Andrew O'Reilly ,  Ashwin Agathya Boochakravarthy ,  Jereld Lee Winkler ,  Chen Ni ,  Gnyanesh Trivedi

IPC: C23C16/52 ,  C23C16/455 ,  F16K7/00 ,  G05D16/20

CPC classification number: C23C16/52 ,  C23C16/45544 ,  C23C16/45557 ,  F16K7/00 ,  G05D16/2013

Abstract: A reactor system configured to use valve pulsing to control precursor pressure as part of substrate or other processing. A controller in the reactor system runs a pressure control module to process pressure signals from a pressure sensor sensing pressure within an accumulator disposed between a reaction chamber and a precursor source vessel. Based on a pressure set point for the accumulator and the sensed pressure feedback, the controller generates valve control or valve pulsing signals to operate one or more fill valves used to control fill of the accumulator with gas (e.g., precursor) from the precursor source vessel. The fill valves may be high-speed diaphragm valves configured for operation in high temperature applications to be fully opened or fully closed, and the control signals cause the valves to rapidly pulse open and closed to adjust the pressure within the accumulator.

公开(公告)号：US20230089167A1

公开(公告)日：2023-03-23

申请号：US17946304

申请日：2022-09-16

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Yingzong Bu ,  Todd Dunn ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Paul Ma

IPC: C23C16/44

Abstract: Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.

公开(公告)号：US20210214846A1

公开(公告)日：2021-07-15

申请号：US17149023

申请日：2021-01-14

Applicant: ASM IP HOLDING B.V.

Inventor： Dinkar Nandwana ,  Carl Louis White ,  Eric James Shero ,  William George Petro ,  Herbert Terhorst ,  Gnyanesh Trivedi ,  Mark Olstad ,  Ankit Kimtee ,  Kyle Fondurulia ,  Michael Schmotzer ,  Jereld Lee Winkler

IPC: C23C16/455 ,  C23C16/458

Abstract: The present disclosure pertains to embodiments of a showerhead assembly which can be used to deposit semiconductor layers using processes such as atomic layer deposition (ALD). The showerhead assembly has a showerhead which has an increased thickness which advantageously decreases reactor chamber size and decreases cycling time. Decreased cycling time can improve throughput and decrease costs.