公开(公告)号：US20230326722A1

公开(公告)日：2023-10-12

申请号：US18129932

申请日：2023-04-03

Applicant: ASM IP Holding B.V.

Inventor： Thomas Fitzgerald ,  Ruchik Bhatt

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32633 ,  H01J37/32357 ,  H01J2237/002 ,  H01J2237/338

Abstract: A gas-delivery assembly and reactor system including the gas-delivery system are disclosed. The gas-delivery assembly includes a transport tube and a baffle to facilitate desired distribution of gas that can include activated species.

公开(公告)号：US20230089167A1

公开(公告)日：2023-03-23

申请号：US17946304

申请日：2022-09-16

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Yingzong Bu ,  Todd Dunn ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Paul Ma

IPC: C23C16/44

Abstract: Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.

公开(公告)号：US20210398843A1

公开(公告)日：2021-12-23

申请号：US17354879

申请日：2021-06-22

Applicant: ASM IP HOLDING B.V.

Inventor： Thomas Fitzgerald

IPC: H01L21/687

Abstract: A susceptor can include a face that is configured to support a substrate thereon and a plurality of channels extending into the face and radially outwardly relative to a center of the face. One or more of the plurality of channels may include an elongate portion and a flash-out portion. The elongate portion may have a width less than a threshold width along the entirety of the elongate portion. The flash-out portion may be in fluid communication with the elongate portion and may include a first section having a first width and a second section having a second width greater than the first width. The first section may be disposed radially inward of the second section.

公开(公告)号：US20230313367A1

公开(公告)日：2023-10-05

申请号：US18127785

申请日：2023-03-29

Applicant: ASM IP Holding B.V.

Inventor： Ankit Kimtee ,  Akshay Phadnis ,  Kyle Fondurulia ,  Thomas Fitzgerald

IPC: C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4411 ,  C23C16/45565 ,  C23C16/45544

Abstract: A reactor system for use in semiconductor processing, such as for chemical vapor deposition (CVD), atomic layer deposition (ALD), and other deposition steps, that makes use of a reactor module with two or more reaction chambers. The reactor system includes components of a cooling system to provide enhanced temperature uniformity across a chamber lid enclosing the housing or vessel containing the reaction chambers. In part, the cooling system is adapted to utilize convective heat transfer and includes a finned heat sink positioned at the center of the chamber lid in the center space between the external portions of the showerheads of the reaction chambers. Further, the cooling system includes a fan positioned to have its outlet at the center space and over the finned heat sink so that air is directed into the center space and onto the heat sink.

公开(公告)号：US20230175126A1

公开(公告)日：2023-06-08

申请号：US18072773

申请日：2022-12-01

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Yingzong Bu ,  Paul Ma ,  Shubham Garg

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4405 ,  C23C16/4583 ,  C23C16/45565 ,  C23C16/45578 ,  H01L21/68757

Abstract: A reactor can include a reaction chamber, a substrate support configured to support a substrate on a top side of the substrate support, and an elongate delivery apparatus disposed within the reaction chamber. The substrate support may be actuated to an upper position and to a lower position along a vertical axis within the reaction chamber. The substrate support may have a maximum horizontal dimension from the vertical axis along a horizontal axis substantially orthogonal to the vertical axis. The elongate delivery apparatus may have an inner horizontal dimension greater than the maximum horizontal dimension of the substrate support. The delivery apparatus can allow gas to pass through an interior of the delivery apparatus. The delivery apparatus can include a plurality of apertures. Each of the plurality of apertures can allow passage of the gas from the interior of the delivery apparatus into the reaction chamber.

公开(公告)号：US20230063286A1

公开(公告)日：2023-03-02

申请号：US17896557

申请日：2022-08-26

Applicant: ASM IP Holding B.V.

Inventor： Thomas Fitzgerald ,  Ruchik Bhatt

IPC: C23C16/455

Abstract: A baffle for use in a reaction chamber may comprise a baffle first end, a baffle second end, and a baffle space enclosed by a baffle wall system and the reaction chamber floor, wherein the baffle first end may comprise a baffle aperture disposed therethrough configured to allow a fluid to flow from the reaction chamber volume into the baffle space through the baffle aperture and exit the baffle space through a vacuum aperture in the reaction chamber floor toward a vacuum source.

公开(公告)号：US20230061477A1

公开(公告)日：2023-03-02

申请号：US17895370

申请日：2022-08-25

Applicant: ASM IP Holding B.V.

Inventor： Thomas Fitzgerald ,  Rohan Rane ,  Jereld Winkler ,  Ankit Kimtee ,  Todd Robert Dunn

IPC: C23C16/458 ,  C23C16/455

Abstract: A reaction chamber may comprise a reaction chamber volume enclosed within the reaction chamber; a susceptor configured to support a substrate disposed in the reaction chamber volume; a reaction space above the susceptor, and a lower chamber space below the susceptor, within the reaction chamber volume; and/or a sealing system causing the reaction space and the lower chamber space to be at least partially fluidly separate. A sealing system may comprise a spacer plate surrounding and coupled to the susceptor; and/or a spring coupled to the spacer plate and the susceptor having a spring bias toward a compressed position or an extended position, such that the spring bias facilitates creation of at least a partial seal between the spacer plate and the susceptor, causing at least partial fluid separation between the reaction space and the lower chamber space as the susceptor moves up and down within the reaction chamber.