公开(公告)号：US10216102B2

公开(公告)日：2019-02-26

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US09921497B2

公开(公告)日：2018-03-20

申请号：US15306982

申请日：2015-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerardus Arnoldus Hendricus Franciscus Janssen ,  Martijn Van Baren

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70875 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  H01L21/67 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67265 ,  H01L21/67742

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

公开(公告)号：US09529277B2

公开(公告)日：2016-12-27

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US09891542B2

公开(公告)日：2018-02-13

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20170242349A1

公开(公告)日：2017-08-24

申请号：US15387461

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Peter Paul Steijaert ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Franciscus Van De Mast

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.