公开(公告)号：US11740565B2

公开(公告)日：2023-08-29

申请号：US17784951

申请日：2020-12-09

Applicant: ASML Netherlands B.V.

Inventor： Taylor John Hartung ,  Yue Ma ,  Marc Guy Langlois ,  Jeremy Burke ,  Esteban Joseph Sandoval Johnson

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/7085 ,  G03F7/70808

Abstract: Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.

公开(公告)号：US20230010251A1

公开(公告)日：2023-01-12

申请号：US17784951

申请日：2020-12-09

Applicant: ASML Netherlands B.V.

Inventor： Taylor John Hartung ,  Yue Ma ,  Marc Guy Langlois ,  Jeremy Burke ,  Esteban Joseph Sandoval Johnson

IPC: G03F7/20

Abstract: Systems, apparatuses, and methods are provided for a collector flow ring (CFR) housing configured to mitigate an accumulation of fuel debris in an extreme ultraviolet (EUV) radiation system. An example CFR housing can include a plurality of showerhead flow channel outlets configured to output a plurality of first gaseous fluid flows over a plurality of portions of a plasma-facing surface of the CFR housing. The example CFR housing can further include a gutter purge flow channel outlet configured to output a second gaseous fluid flow over a fuel debris-receiving surface of the CFR housing. The example CFR housing can further include a shroud mounting structure configured to support a shroud assembly, a cooling flow channel configured to transport a fluid, and a plurality of optical metrology ports configured to receive a plurality of optical metrology tubes.

公开(公告)号：US10955749B2

公开(公告)日：2021-03-23

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodriges Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart, IV ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US10901329B2

公开(公告)日：2021-01-26

申请号：US16575068

申请日：2019-09-18

Applicant: ASML Netherlands B.V.

Inventor： Marc Guy Langlois

IPC: G03F7/00 ,  G03F7/20 ,  H05G2/00

Abstract: Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.

公开(公告)号：US11822252B2

公开(公告)日：2023-11-21

申请号：US17155951

申请日：2021-01-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodreigues Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

公开(公告)号：US10606180B2

公开(公告)日：2020-03-31

申请号：US15453884

申请日：2017-03-08

Applicant: ASML Netherlands, B.V.

Inventor： Marc Guy Langlois

IPC: G03F7/20 ,  H05G2/00

Abstract: Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.

公开(公告)号：US20180259861A1

公开(公告)日：2018-09-13

申请号：US15453884

申请日：2017-03-08

Applicant: ASML Netherlands, B.V.

Inventor： Marc Guy Langlois

IPC: G03F7/20 ,  B08B7/00 ,  B08B9/00

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  H05G2/005

Abstract: Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.