Semiconductor package
    1.
    发明授权

    公开(公告)号:US11594506B2

    公开(公告)日:2023-02-28

    申请号:US17030181

    申请日:2020-09-23

    Abstract: A semiconductor package is provided. The semiconductor package includes a first conductive layer, a plurality of first conductive pads, a plurality of second conductive pads, and a first dielectric layer. The first conductive pads are electrically connected to the first conductive layer. The second conductive pads are electrically disconnected from the first conductive layer.

    Semiconductor device packages and methods of manufacturing the same

    公开(公告)号:US11114370B2

    公开(公告)日:2021-09-07

    申请号:US16675013

    申请日:2019-11-05

    Abstract: A semiconductor device package includes a substrate, a redistribution structure, a conductive pad, a conductive element, and a conductive via. The redistribution structure is disposed over the substrate and includes a first dielectric layer and a first conductive layer. The conductive pad is disposed on a first surface of the first dielectric layer. The conductive element is disposed in the first dielectric layer and is electrically connected to the conductive pad. The conductive via extends from the conductive pad toward the substrate through the conductive element and the first dielectric layer. The first conductive layer is separated from the conductive via.

    Semiconductor device package and method of manufacturing the same

    公开(公告)号:US10811347B2

    公开(公告)日:2020-10-20

    申请号:US16234048

    申请日:2018-12-27

    Inventor: Shun-Tsat Tu

    Abstract: A semiconductor device package is provided, which includes a semiconductor device, a redistribution layer, an under bump metallurgy (UBM) structure, a passivation layer and a protection layer. The semiconductor device has an active surface. The redistribution layer is disposed on the active surface of the semiconductor device and electrically connected to the semiconductor device. The UBM structure is disposed on the redistribution layer. The passivation layer is disposed on the redistribution layer and surrounding the UBM structure and having a first surface. The protection layer is disposed on the redistribution layer and having a first surface. The first surface of the passivation layer is substantially coplanar with the first surface of the protection layer.

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