公开(公告)号：US11868043B2

公开(公告)日：2024-01-09

申请号：US17527819

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Andrew Ceballos ,  Kenichi Ohno ,  Rami Hourani ,  Ludovic Godet

IPC: C08K9/02 ,  G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  G03F7/16 ,  C09D7/65

CPC classification number: G03F7/0002 ,  C09D7/62 ,  C09D7/65 ,  C09D7/67 ,  G03F7/167

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

公开(公告)号：US12044963B2

公开(公告)日：2024-07-23

申请号：US16941304

申请日：2020-07-28

Applicant: Applied Materials, Inc.

Inventor： Amita Joshi ,  Ian Matthew McMackin ,  Rami Hourani ,  Yingdong Luo ,  Sivapackia Ganapathiappan ,  Ludovic Godet

IPC: G03F7/00 ,  B29C59/00 ,  B29C71/02 ,  B29C71/04 ,  C01G23/04 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  B29C59/005 ,  B29C71/02 ,  B29C71/04 ,  C01G23/043 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01P2004/64

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

公开(公告)号：US11567417B2

公开(公告)日：2023-01-31

申请号：US17579349

申请日：2022-01-19

Applicant: Applied Materials, Inc.

Inventor： Jing Jiang ,  Suraj Yadav ,  Amita Joshi ,  Vivian Hsu

IPC: G03F7/20 ,  G02B6/26

Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

公开(公告)号：US12242186B2

公开(公告)日：2025-03-04

申请号：US18394133

申请日：2023-12-22

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  B82Y10/00 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  H01L21/28

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US11892771B2

公开(公告)日：2024-02-06

申请号：US17136959

申请日：2020-12-29

Applicant: Applied Materials, Inc.

Inventor： Andrew Ceballos ,  Rami Hourani ,  Kenichi Ohno ,  Yuriy Melnik ,  Amita Joshi

IPC: G03F7/00 ,  H01L21/28 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  B82Y10/00

CPC classification number: G03F7/0002 ,  C23C16/045 ,  C23C16/45527 ,  C23C16/45553 ,  G03F7/0005 ,  G03F7/2004 ,  H01L21/28123 ,  B82Y10/00

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.