公开(公告)号：US20220172975A1

公开(公告)日：2022-06-02

申请号：US17672507

申请日：2022-02-15

Applicant: Applied Materials, Inc.

Inventor： Stephen Donald PROUTY ,  Andreas SCHMID ,  Jonathan SIMMONS ,  Sumanth BANDA

IPC: H01L21/683 ,  H01L21/673

Abstract: A substrate support pedestal comprises an electrostatic chuck, a cooling base, a gas flow passage, a porous plug, and a sealing member. The electrostatic chuck comprises body having a cavity. The cooling base is coupled to the electrostatic chuck via a bond layer. The gas flow passage is formed between a top surface of the electrostatic chuck and a bottom surface of the cooling base. The gas flow passage further comprises the cavity. The porous plug is positioned within the cavity to control the flow of gas through the gas flow passage. The sealing member is positioned in a groove formed in the cooling base and configured to form a seal between the cooling base and one or both of the porous plug and the body of the electrostatic chuck.

公开(公告)号：US20200234981A1

公开(公告)日：2020-07-23

申请号：US16222831

申请日：2018-12-17

Applicant: Applied Materials, Inc.

Inventor： Andreas SCHMID ,  Denis M. KOOSAU

IPC: H01L21/67 ,  H01L21/3065 ,  H01L21/687

Abstract: Aspects of the present disclosure generally relate to methods and apparatuses for adjusting an edge ring position, and for removing or replacing one or more components of a process kit of a process chamber. The process kit includes one or more of an edge ring, a support ring, a sliding ring, and other consumable or degradable components.

公开(公告)号：US20220406635A1

公开(公告)日：2022-12-22

申请号：US17352097

申请日：2021-06-18

Applicant: Applied Materials, Inc.

Inventor： Andrew MYLES ,  Andreas SCHMID ,  Phillip A. CRIMINALE ,  Steven E. BABAYAN

IPC: H01L21/67 ,  G05B23/02 ,  G01B9/02 ,  G01B11/27

Abstract: Examples disclosed herein are directed to a method and apparatus for determining a position of a ring within a process kit. In one example, a sensor assembly for a substrate processing chamber is provided. The sensor assembly includes a housing having a top surface, a bottom surface opposite the top surface, and a plurality of sidewalls connecting the top surface to the bottom surface. The housing also has a recess in the top surface, the recess forming an interior volume within the housing. The sensory assembly includes a bias member, and a contact member disposed on the bias member. The bias member and contact member are disposed within the recess. A sensor is configured to detect a displacement of the contact member. The displacement of the contact member corresponds to a relative position of an edge ring.

公开(公告)号：US20210343512A1

公开(公告)日：2021-11-04

申请号：US16863719

申请日：2020-04-30

Applicant: Applied Materials, Inc.

Inventor： Vijay D. PARKHE ,  Andreas SCHMID ,  Andrew Antoine NOUJAIM ,  Stephen Donald PROUTY ,  Alvaro GARCIA DE GORORDO ,  Martin PEREZ-GUZMAN

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683

Abstract: A substrate support assembly is described herein that includes a facility plate, a ground plate coupled to the facility plate, a fluid conduit disposed within the substrate support assembly disposed through the facility plate and the ground plate, and a connector coupled to the ground plate that houses a portion of the fluid conduit. The connector includes a biasing assembly and a fastener disposed in a pocket formed in the ground plate.

公开(公告)号：US20200373184A1

公开(公告)日：2020-11-26

申请号：US16857082

申请日：2020-04-23

Applicant: Applied Materials, Inc.

Inventor： Stephen Donald PROUTY ,  Andreas SCHMID ,  Jonathan SIMMONS ,  Sumanth BANDA

IPC: H01L21/683 ,  H01L21/673

Abstract: A substrate support pedestal comprises an electrostatic chuck, a cooling base, a gas flow passage, a porous plug, and a sealing member. The electrostatic chuck comprises body having a cavity. The cooling base is coupled to the electrostatic chuck via a bond layer. The gas flow passage is formed between a top surface of the electrostatic chuck and a bottom surface of the cooling base. The gas flow passage further comprises the cavity. The porous plug is positioned within the cavity to control the flow of gas through the gas flow passage. The sealing member is positioned adjacent to the porous plug and is configured to form one or more of a radial seal between the porous plug and the cavity and an axial seal between the porous plug and the cooling base.

公开(公告)号：US20240321610A1

公开(公告)日：2024-09-26

申请号：US18676429

申请日：2024-05-28

Applicant: Applied Materials, Inc.

Inventor： Yaoling PAN ,  Patrick John TAE ,  Michael D. WILLWERTH ,  Leonard M. TEDESCHI ,  Daniel Sang BYUN ,  Philip Allan KRAUS ,  Phillip CRIMINALE ,  Changhun LEE ,  Rajinder DHINDSA ,  Andreas SCHMID ,  Denis M. KOOSAU

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/66 ,  H03K17/955

CPC classification number: H01L21/67259 ,  H01J37/32477 ,  H01J37/3288 ,  H01L22/12 ,  H03K17/955 ,  H01J2237/022

Abstract: The present disclosure generally relates to a method and apparatus for determining a metric related to erosion of a ring assembly used in an etching within a plasma processing chamber. In one example, the apparatus is configured to obtain a metric indicative of erosion on an edge ring disposed on a substrate support assembly in a plasma processing chamber. A sensor obtains the metric for the edge ring. The metric correlates to the quantity of erosion in the edge ring. In another example, the ring sensor may be arranged outside of a periphery of a substrate support assembly. The metric may be acquired by the ring sensor through a plasma screen.

公开(公告)号：US20240112894A1

公开(公告)日：2024-04-04

申请号：US18371641

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Sankaranarayanan RAVI ,  Alvaro GARCIA ,  Martin Perez GUZMAN ,  Stephen D. PROUTY ,  Andreas SCHMID

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32724 ,  H01L21/6833 ,  H01J2237/002 ,  H01J2237/2007

Abstract: A method and apparatus for cooling a semiconductor chamber are described herein. A semiconductor chamber component, includes a powered region, a grounded region, and a fluid conduit disposed within the semiconductor chamber component and passing through the powered region and grounded region, the fluid conduit comprising a ceramic material.

公开(公告)号：US20210254957A1

公开(公告)日：2021-08-19

申请号：US17161271

申请日：2021-01-28

Applicant: Applied Materials, Inc.

Inventor： Sathyendra GHANTASALA ,  Leonid DORF ,  Evgeny KAMENETSKIY ,  Peter MURAOKA ,  Denis M. KOOSAU ,  Rajinder DHINDSA ,  Andreas SCHMID

IPC: G01B7/06 ,  H01L21/67 ,  H01L21/687 ,  H01J37/32

Abstract: Disclosed herein is a method and apparatus for controlling surface characteristics by measuring capacitance of a process kit ring. The method includes interfacing a ring with a jig assembly for measuring capacitance in at least a first location of the ring. The ring has that includes a top surface, a bottom surface, and an inner surface opposite an outer surface. At least the bottom surface has an external coating placed thereon. The method further includes contacting a measuring device to the first location on the outer surface proximate the bottom surface. The measuring device contacts an opening in the external coating to the body. The measuring device contacts a first conductive member that is electrically coupled to the ring. A capacitance is measured on the measuring device. The capacitance across the top surface is measured.

公开(公告)号：US20210082730A1

公开(公告)日：2021-03-18

申请号：US16997300

申请日：2020-08-19

Applicant: Applied Materials, Inc.

Inventor： Yogananda SARODE VISHWANATH ,  Steven E. BABAYAN ,  Stephen Donald PROUTY ,  Alvaro Garcia DE GORORDO ,  Andreas SCHMID ,  Andrew Antoine NOUJAIM

IPC: H01L21/683 ,  H01J37/32

Abstract: Embodiments described herein relate to a substrate support assembly which enables a cryogenic temperature operation of an electrostatic chuck (ESC) so that a substrate disposed thereon is maintained at a cryogenic processing temperature suitable for processing while other surfaces of a processing chamber are maintained at a different temperature. The substrate support assembly includes an electrostatic chuck (ESC), an ESC base assembly coupled to the ESC having a base channel disposed therein, and a facility plate having a facility channel disposed therein. The facility plate includes a plate portion and a wall portion. The plate portion is coupled to the ESC base assembly and the wall portion coupled to the ESC with a seal assembly. A vacuum region is defined by the ESC, the ESC base assembly, the plate portion of the facility plate, the wall portion of the facility plate, and the seal assembly.

公开(公告)号：US20200290835A1

公开(公告)日：2020-09-17

申请号：US16306176

申请日：2017-06-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Andreas SCHMID ,  Brian BURROWS ,  David ISHIKAWA ,  Joseph YUDOVSKY

IPC: B65H23/198 ,  C04B35/80 ,  C04B35/628 ,  B65H23/195

Abstract: Apparatus for qualification and repair of multi-filament tow are provided herein. In some embodiments, an apparatus in for inspecting and repairing a multi-filament tow includes a first spool having a multi-filament tow wound on the first spool; a first tow tensioner following the first spool to impart a predetermined tension on the multi-filament tow; a de-sizing chamber comprising a heater to heat the multi-filament tow to a first temperature suitable for removing a coating on the multi-filament tow; an inspection chamber configured to inspect the multi-filament tow for defects; a repair chamber configured to repair the defects in the multi-filament tow; a second tow tensioner following the repair chamber to impart a predetermined tension on the multi-filament tow; and a second spool following the second tow tensioner to collect the multi-filament tow.