Abstract:
Embodiments of the present disclosure provide an array substrate and a manufacturing method thereof, and a display device. The array substrate includes a base substrate, a first electrode pattern, a second electrode pattern, and an active layer pattern disposed on the base substrate, a first electrode protection pattern coating the first electrode pattern, and a second electrode protection pattern coating the second electrode pattern. The active layer pattern is disposed between the first electrode pattern and the second electrode pattern. The first electrode protection pattern and the second electrode protection pattern are connected to two sides of the active layer pattern, respectively. The problem that, the active layer pattern cannot be connected to the first electrode pattern and the second electrode pattern due to the surface oxidation, when the first electrode pattern and the second electrode pattern adopt material with low resistance characteristic, is avoided, thus increasing the product yield.
Abstract:
A thin film transistor and a fabrication method thereof, an array substrate and a display panel are provided. The thin film transistor includes: a gate electrode (2), a source electrode (5) and a drain electrode (6) disposed in a same layer on a base substrate (1); a gate insulating layer (3) disposed on the gate electrode (2), the source electrode (5) and the drain electrode (6); an active layer (4) disposed on the gate insulating layer (3); a passivation layer (7) disposed on the active layer (4) and the gate insulating layer (3). A first via hole (81) and a second via hole (91) are disposed in the passivation layer (7); a third via hole (82) and a fourth via hole (92) are disposed in the passivation layer (7) and the gate insulating layer (3); a first connection pattern (8) and a second connection pattern (9) are disposed on the passivation layer (7); the first connection pattern (8) is connected with the active layer (4) and the source electrode (5) through the first via hole (81) and the third via hole (82) respectively; the second connection pattern (9) is connected with the active layer (4) and the drain electrode (6) through the second via hole (91) and the fourth via hole (92) respectively. The thin film transistor effectively reduces the influence of the parasitic capacitance between the source electrode and the gate electrode and the parasitic capacitance between the drain electrode and the gate electrode on the thin film transistor.
Abstract:
A thin film transistor, a manufacturing method thereof, an array substrate and a display apparatus are disclosed. The manufacturing method includes forming a gate electrode (2), a gate insulating layer (3), an active region (4), a source electrode (5) and a drain electrode (6) on a base substrate (1) with the active region being formed of ZnON material, and implanting the active region (4) with nitrogen ion while it being formed, so as to make the sub-threshold swing amplitude of the thin film transistor less than or equal to 0.5 mV/dec. The manufacturing method reduces the sub-threshold swing amplitude of the thin film transistor and improves the semiconductor characteristics of the thin film transistor.
Abstract:
Embodiments of the present invention relate to a display substrate and fabricating method thereof and a display device. The display substrate comprises a plurality of pixel groups, wherein each of said pixel groups comprises a plurality of color sub-pixels and a plurality of white sub-pixels. A first driving transistor is provided in a light emitting layer missing region of the color sub-pixel, for driving the color sub-pixel. A second driving transistor and a white sub-pixel are provided on the first driving transistor, the second driving transistor for driving the white sub-pixel. According to the technical solution, white light OLED display may be implemented by forming the white sub-pixel and the driving transistor thereof on the driving transistor of the color sub-pixel, while making use of the space on the thickness dimension of the color sub-pixel, so that the light emitting layer missing region in the color sub-pixel is fully utilized.