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公开(公告)号：US20200043773A1
公开(公告)日：2020-02-06
申请号：US16532843
申请日：2019-08-06
申请人： EBARA CORPORATION
发明人： Osamu Nabeya , Satoru Yamaki , Makoto Fukushima
IPC分类号： H01L21/683 , H01L21/67 , B24B37/30 , H01L21/02 , H01L21/304
摘要： A substrate holding apparatus is provided, which includes a top ring main body to which an elastic film having a surface that can suck a substrate can be attached, a first line communicating with a first area of the plurality of areas, a second line communicating with a second area different from the first area of the plurality of areas, a pressure adjuster that can pressurize the first area by feeding fluid into the first area through the first line and can generate negative pressure in the second area through the second line, and a determiner that performs determination of whether or not the substrate is sucked to the elastic film based on a volume of the fluid fed into the first area or a measurement value corresponding to pressure in the first area.
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公开(公告)号：US10213896B2
公开(公告)日：2019-02-26
申请号：US15402703
申请日：2017-01-10
申请人： EBARA CORPORATION
发明人： Makoto Fukushima , Hozumi Yasuda , Keisuke Namiki , Osamu Nabeya , Shingo Togashi , Satoru Yamaki , Shintaro Isono
IPC分类号： B24B37/30
摘要： An elastic membrane capable of precisely controlling a polishing profile in a narrow area of a wafer edge portion is disclosed. The elastic membrane includes a contact portion to be brought into contact with a substrate; a first edge circumferential wall extending upwardly from a peripheral edge of the contact portion; and a second edge circumferential wall having a horizontal portion connected to an inner circumferential surface of the first edge circumferential wall. The inner circumferential surface of the first edge circumferential wall includes an upper inner circumferential surface and a lower inner circumferential surface, both of which are perpendicular to the contact portion. The upper inner circumferential surface extends upwardly from the horizontal portion of the second edge circumferential wall, and the lower inner circumferential surface extends downwardly from the horizontal portion.
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公开(公告)号：US09815171B2
公开(公告)日：2017-11-14
申请号：US14537809
申请日：2014-11-10
申请人： EBARA CORPORATION
发明人： Satoru Yamaki , Hozumi Yasuda , Keisuke Namiki , Osamu Nabeya , Makoto Fukushima , Shingo Togashi
CPC分类号： B24B37/32 , B24B37/04 , B24B37/107
摘要： A substrate holder capable of preventing an increase in a polishing rate of an edge portion of a substrate, even when polishing a plurality of substrates successively, is disclosed. The substrate holder includes: a top ring body configured to hold the substrate; and a retaining ring disposed so as to surround the substrate held by the top ring body. The retaining ring includes a pad pressing structure in an annular shape which is to be brought into contact with the polishing pad, and the pad pressing structure has a width in a range of 3 mm to 7.5 mm.
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公开(公告)号：US08859070B2
公开(公告)日：2014-10-14
申请号：US13687263
申请日：2012-11-28
申请人： Ebara Corporation
发明人： Hozumi Yasuda , Katsuhide Watanabe , Keisuke Namiki , Osamu Nabeya , Makoto Fukushima , Satoru Yamaki , Shingo Togashi
CPC分类号： B32B3/08 , B24B37/30 , B32B3/18 , B32B27/12 , Y10T428/21 , Y10T428/24174 , Y10T428/24851
摘要： An elastic member for use in a substrate holding apparatus includes an elastic member and a first reinforcing member. The first reinforcing member has a higher rigidity than the elastic membrane and reinforces substantially an entire area of the contact portion of the elastic membrane. The contact portion of the elastic member has a contact portion for contact with the substrate. The first peripheral wall portion of the elastic membrane is coupled to a peripheral end of the contact portion and extends upwardly. The second peripheral wall portion of the elastic member defines a first chamber on an outer side thereof and a second chamber on an inner side thereof. The first reinforcing member is embedded in substantially the entire area of the contact portion of the elastic membrane.
摘要翻译： 用于基板保持装置的弹性构件包括弹性构件和第一加强构件。 第一加强构件具有比弹性膜更高的刚性，并且基本上加强弹性膜的接触部分的整个区域。 弹性构件的接触部分具有用于与衬底接触的接触部分。 弹性膜的第一周壁连接到接触部分的外周端并向上延伸。 弹性构件的第二周壁部分在其外侧上限定第一室，在其内侧限定第二室。 第一加强构件嵌入在弹性膜的接触部分的大致整个区域中。
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公开(公告)号：US20210335650A1
公开(公告)日：2021-10-28
申请号：US17371518
申请日：2021-07-09
申请人： EBARA CORPORATION
发明人： Satoru Yamaki , Makoto Fukushima , Keisuke Namiki , Osamu Nabeya , Shingo Togashi , Tomoko Owada , Yoshikazu Kato
IPC分类号： H01L21/687 , B24B37/30 , B24B37/10 , B24B7/04
摘要： An elastic membrane to be used for a polishing head includes a contact portion configured to come into contact with a wafer, an annular side wall provided to stand on an outer peripheral end of the contact portion, a first partition wall linearly extending inward in a radial direction in sectional view from the side wall, and a second partition wall linearly extending inward and upward in the radial direction in sectional view from an outer peripheral end portion of the contact portion, wherein the first partition wall, the second partition wall, and the side wall constitute an edge pressure chamber for pressing an edge of the wafer.
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公开(公告)号：US20200206868A1
公开(公告)日：2020-07-02
申请号：US16724504
申请日：2019-12-23
申请人： Ebara Corporation
发明人： Tomoko Owada , Makoto Fukushima , Keisuke Namiki , Osamu Nabeya , Shingo Togashi , Satoru Yamaki , Yoshikazu Kato
IPC分类号： B24B49/04 , B24B41/047
摘要： A polishing apparatus includes a rotatable head body having a pressing surface, a retainer ring configured to press a polishing surface while rotating together with the head body, a stationary ring, local load applying devices configured to apply a local load to the stationary ring, and a controller. The local load applying devices include a first pressing member and a second pressing member connected to the stationary ring. The first pressing member is disposed in the upstream side of the retainer ring in the traveling direction of the polishing surface, and the second pressing member is disposed in the downstream side. The controller calculates the inclination angle of the stationary ring based on a measured value of the height of at least one of the first pressing member and the second pressing member.
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