公开(公告)号：US20210001429A1

公开(公告)日：2021-01-07

申请号：US16918789

申请日：2020-07-01

Applicant: ENTEGRIS, INC.

Inventor： Troy SCOGGINS

IPC: B23K26/40 ,  B23K26/12 ,  H01L21/02

Abstract: Described are methods of using laser energy to remove particles from a surface, such as a porous surface, optionally without causing ablation to the surface.

公开(公告)号：US20190084862A1

公开(公告)日：2019-03-21

申请号：US16137730

申请日：2018-09-21

Applicant: Entegris, Inc.

Inventor： Troy SCOGGINS ,  Rex Gerald Sheppard ,  Carlo Waldfried

IPC: C03B11/08 ,  C23C16/455 ,  C23C16/40

Abstract: Described are glass-forming molds made of a graphite mold body and a coating formed by atomic layer deposition, with the coating being made of alumina or a combination of alumina and yttria.

公开(公告)号：US20210363019A1

公开(公告)日：2021-11-25

申请号：US17396389

申请日：2021-08-06

Applicant: Entegris, Inc.

Inventor： Troy SCOGGINS ,  Rex Gerald SHEPPARD ,  Abuagela H. RASHED ,  Jonathan Loyd BURR

IPC: C01B32/956 ,  H01L21/02 ,  H01L21/324 ,  C04B41/87 ,  C04B35/52 ,  C04B41/00 ,  C04B41/50 ,  C01B32/97 ,  C01B32/21 ,  H01L29/16

Abstract: A silicon carbide-graphite composite is described, including (i) interior bulk graphite material and (ii) exterior silicon carbide matrix material, wherein the interior bulk graphite material and exterior silicon carbide matrix material inter-penetrate one another at an interfacial region therebetween, and wherein graphite is present in inclusions in the exterior silicon carbide matrix material. Such material may be formed by contacting a precursor graphite article with silicon monoxide (SiO) gas under chemical reaction conditions that are effective to convert an exterior portion of the precursor graphite article to a silicon carbide matrix material in which graphite is present in inclusions therein, and wherein the silicon carbide matrix material and interior bulk graphite material interpenetrate one another at an interfacial region therebetween. Such silicon carbide-graphite composite is usefully employed in applications such as implant hard masks in manufacturing solar cells or other optical, optoelectronic, photonic, semiconductor and microelectronic products, as well as in ion implantation system materials, components, and assemblies, such as beam line assemblies, beam steering lenses, ionization chamber liners, beam stops, and ion source chambers.

公开(公告)号：US20210013000A1

公开(公告)日：2021-01-14

申请号：US16923724

申请日：2020-07-08

Applicant: ENTEGRIS, INC.

Inventor： Troy SCOGGINS ,  Rex G. SHEPPARD ,  Abuagela H. RASHED ,  Amelia H.C. HART

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/18

Abstract: Described are porous protective liners for use in a vacuum chamber, the liners being made of inorganic carbonaceous material and having a porous surface, preferably with the pores being of an open-pore structure.

公开(公告)号：US20180240878A1

公开(公告)日：2018-08-23

申请号：US15753109

申请日：2016-08-18

Applicant: Entegris, Inc.

Inventor： Troy SCOGGINS ,  Rex Gerald SHEPPARD ,  Abuagela H. RASHED ,  Jonathan Loyd BURR

IPC: H01L29/16 ,  C01B32/20 ,  C01B32/956 ,  C04B35/52 ,  C04B41/00 ,  C04B41/50 ,  C04B41/87 ,  H01L21/02 ,  H01L21/324

CPC classification number: H01L29/1608 ,  C01B32/20 ,  C01B32/956 ,  C04B35/522 ,  C04B41/009 ,  C04B41/5059 ,  C04B41/87 ,  C04B2111/00405 ,  C04B2235/3826 ,  C04B2235/658 ,  C04B2235/6581 ,  C04B2235/72 ,  C04B2235/722 ,  C04B2235/726 ,  C04B2235/727 ,  C04B2235/728 ,  C04B2235/75 ,  C04B2235/77 ,  C04B2235/786 ,  C04B2235/9607 ,  H01L21/02425 ,  H01L21/02529 ,  H01L21/02612 ,  H01L21/324 ,  H01L29/1606 ,  C04B38/00 ,  C04B41/4529 ,  C04B41/4556

Abstract: A silicon carbide-graphite composite is described, including (i) interior bulk graphite material and (ii) exterior silicon carbide matrix material, wherein the interior bulk graphite material and exterior silicon carbide matrix material inter-penetrate one another at an interfacial region therebetween, and wherein graphite is present in inclusions in the exterior silicon carbide matrix material. Such material may be formed by contacting a precursor graphite article with silicon monoxide (SiO) gas under chemical reaction conditions that are effective to convert an exterior portion of the precursor graphite article to a silicon carbide matrix material in which graphite is present in inclusions therein, and wherein the silicon carbide matrix material and interior bulk graphite material interpenetrate one another at an interfacial region therebetween. Such silicon carbide-graphite composite is usefully employed in applications such as implant hard masks in manufacturing solar cells or other optical, optoelectronic, photonic, semiconductor and microelectronic products, as well as in ion implantation system materials, components, and assemblies, such as beam line assemblies, beam steering lenses, ionization chamber liners, beam stops, and ion source chambers.