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1.发明申请公开(公告)号：US20080050675A1
公开(公告)日：2008-02-28
申请号：US11844591
申请日：2007-08-24
IPC分类号： G03C1/00
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392
摘要： A positive resist composition comprising: (A) a resin having a repeating unit represented by a specific formula (I) and a repeating unit represented by a specific formula (A1); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (F) a surfactant represented by a specific formula (II); and a pattern forming method using the same.
摘要翻译： 正型抗蚀剂组合物，其包含：（A）具有由特定式（I）表示的重复单元的树脂和由特定式（A1）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（F）由特定式（II）表示的表面活性剂; 以及使用该图案形成方法的图案形成方法。
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公开(公告)号：US20100297553A1
公开(公告)日：2010-11-25
申请号：US12785019
申请日：2010-05-21
申请人： Hiromi KANDA , Fumiyuki Nishiyama
发明人： Hiromi KANDA , Fumiyuki Nishiyama
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0048 , G03F7/2041 , Y10S430/108
摘要： A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）具有单环或多环脂环族烃结构且能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，（B）在用一种处理时能够产生酸的化合物 的光化射线和辐射，以及（F）含有30〜60质量％的氟原子的比表面活性剂和使用其的图案形成方法。
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3.发明授权公开(公告)号：US07811740B2
公开(公告)日：2010-10-12
申请号：US11245136
申请日：2005-10-07
申请人： Hiromi Kanda , Fumiyuki Nishiyama
发明人： Hiromi Kanda , Fumiyuki Nishiyama
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0048 , G03F7/2041 , Y10S430/108
摘要： A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）具有单环或多环脂环族烃结构且能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，（B）在用一种处理时能够产生酸的化合物 的光化射线和辐射，以及（F）含有30〜60质量％的氟原子的比表面活性剂和使用其的图案形成方法。
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4.发明授权Positive resist composition and pattern forming method using the resist composition 有权使用抗蚀剂组合物的正型抗蚀剂组合物和图案形成方法公开(公告)号：US07592126B2
公开(公告)日：2009-09-22
申请号：US11377728
申请日：2006-03-17
申请人： Fumiyuki Nishiyama
发明人： Fumiyuki Nishiyama
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a β-(meth)acroyloxy-γ-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring which may have a substituent; and (B) a compound capable of generating an organic acid represented by the formula (2), (3), (3′), (4) or (5) as defined herein upon irradiation of actinic rays or radiation.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）不溶于或微溶于碱但不能在酸的作用下分解以提高在碱性显影剂中的溶解度的树脂，所述树脂具有β-（甲基）丙酰氧基-γ- 由下式（1）表示的含有可以具有取代基的内酯环的丁内酯重复单元; 和（B）能够产生由光化射线或辐射照射时所定义的式（2），（3），（3'），（4）或（5）表示的有机酸的化合物。
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5.发明授权公开(公告)号：US07122589B2
公开(公告)日：2006-10-17
申请号：US10669603
申请日：2003-09-25
IPC分类号： C08K5/36
CPC分类号： G03F7/0397 , C08K5/45 , G03F7/0045 , H01L21/312 , Y10S430/106 , Y10S430/122
摘要： A positive resist composition comprising: (A) a resin having alicyclic hydrocarbon groups in side chains, containing specified two types of repeating units, which increases the solubility in an alkali developing solution by the action of an acid; and (B) a particular sulfonium compound having a specified structure and capable of generating an acid upon irradiation with an actinic ray or radiation.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）在侧链中具有脂环族烃基的树脂，其含有特定的两种重复单元，其通过酸的作用增加在碱性显影液中的溶解度; 和（B）具有特定结构并且能够在用光化射线或辐射照射时产生酸的特定锍化合物。
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6.发明授权Resist composition, resist film therefrom and method of forming negative pattern using the composition 有权抗蚀剂组合物，抗蚀剂膜和使用该组合物形成负型图案的方法公开(公告)号：US09122151B2
公开(公告)日：2015-09-01
申请号：US13406165
申请日：2012-02-27
CPC分类号： G03F7/004 , B23B3/10 , B32B3/10 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/325
摘要： A resist composition includes a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below.
摘要翻译： 抗蚀剂组合物包含含有下述通式（Ia）和（Ib）的重复单元（a）和下述通式（II）的重复单元（b）中任何一种但基本上不含重复单元的树脂（A） 其中引入醇羟基，以及通式（III-a）和（III-b）的化合物（B）中的任何一种。
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7.发明授权公开(公告)号：US08241833B2
公开(公告)日：2012-08-14
申请号：US12785019
申请日：2010-05-21
申请人： Hiromi Kanda , Fumiyuki Nishiyama
发明人： Hiromi Kanda , Fumiyuki Nishiyama
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0048 , G03F7/2041 , Y10S430/108
摘要： A positive resist composition comprising (A) resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkaline developer, (B) a compound capable of generating an acid upon treatment with one of an actinic ray and radiation and (F) a specific surfactant containing a fluorine atom in an amount of from 30 to 60 mass %, and a pattern-forming method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）具有单环或多环脂环族烃结构且能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，（B）在用一种处理时能够产生酸的化合物 的光化射线和辐射，以及（F）含有30〜60质量％的氟原子的比表面活性剂和使用其的图案形成方法。
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8.发明授权Resist composition for immersion exposure and pattern formation method using the same 有权用于浸渍曝光的抗蚀组合物和使用其的图案形成方法公开(公告)号：US07326516B2
公开(公告)日：2008-02-05
申请号：US11050721
申请日：2005-02-07
申请人： Fumiyuki Nishiyama , Hyou Takahashi
发明人： Fumiyuki Nishiyama , Hyou Takahashi
CPC分类号： G03F7/0392 , G03F7/0048 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition for immersion, comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a photoacid generator; and (C) a mixed solvent containing an alkylene glycol alkyl ether carboxylate and a propylene glycol monomethyl ether.
摘要翻译： 用于浸渍的抗蚀剂组合物包括：（A）在酸的作用下在碱性显影剂中的溶解度增加的树脂; （B）光致酸发生器; 和（C）含有亚烷基二醇烷基醚羧酸酯和丙二醇单甲基醚的混合溶剂。
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9.发明申请Positive photosensitive composition and pattern forming method using the same 审中-公开正光敏组合物和使用其的图案形成方法公开(公告)号：US20070072118A1
公开(公告)日：2007-03-29
申请号：US11525911
申请日：2006-09-25
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/2041
摘要： A positive photosensitive composition comprising: a resin which comprises a repeating unit having a diamantane structure and decomposes under an action of an acid to increase a solubility in an alkali developer; a compound capable of generating an acid upon irradiation with actinic rays or radiation; a compound represented by the following formula (1); and a solvent: wherein R1 represents a hydrogen atom or an alkyl group, m represents an integer of from 1 to 30, n represents an integer of from 0 to 3, and p represents an integer of from 0 to 5.
摘要翻译： 一种正型光敏组合物，其包含：树脂，其包含具有双金刚烷结构的重复单元，并在酸的作用下分解以提高在碱性显影剂中的溶解度; 能够在用光化射线或辐射照射时产生酸的化合物; 由下式（1）表示的化合物; 和溶剂：其中R 1表示氢原子或烷基，m表示1至30的整数，n表示0至3的整数，p表示从 0到5。
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公开(公告)号：US20060210922A1
公开(公告)日：2006-09-21
申请号：US11377728
申请日：2006-03-17
申请人： Fumiyuki Nishiyama
发明人： Fumiyuki Nishiyama
IPC分类号： G03C1/76
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a β-(meth)acroyloxy-γ-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring which may have a substituent; and (B) a compound capable of generating an organic acid represented by the formula (2), (3), (3′), (4) or (5) as defined herein upon irradiation of actinic rays or radiation.
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