EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240241448A1

    公开(公告)日:2024-07-18

    申请号:US18531191

    申请日:2023-12-06

    Inventor: Atsushi UEDA

    Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which plasma is generated from a droplet target of tin irradiated with laser light; a gas supply port supplying an etching gas containing hydrogen to the internal space; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port of a gas and an opening at the outside of the chamber as an exhaust port of the gas; an exhaust device; and a concentrating mirror. The partition wall has an inner circumferential surface on which tin is more likely to be deposited on a downstream side of a predetermined position on a downstream side of the plasma generation region in a flow direction of the gas inside the partition wall than on an upstream side of the predetermined position.

    DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20250102919A1

    公开(公告)日:2025-03-27

    申请号:US18807607

    申请日:2024-08-16

    Inventor: Atsushi UEDA

    Abstract: A differential evacuation device includes a connection pipe connecting a first chamber which outputs extreme ultraviolet light and a second chamber to which the extreme ultraviolet light is input, a first partition wall including a first opening and a first partition plate being arranged such that the extreme ultraviolet light passes through the first opening, a second partition wall including a second opening and a second partition plate being arranged such that the extreme ultraviolet light passes through the second opening, and a first exhaust port exhausting a gas in a first differential evacuation chamber between the first partition wall and the second partition wall. Here, the first partition wall is arranged such that the second opening is surrounded by a portion outside a first high pressure region where a pressure is highest in pressure distribution at the second partition plate on the first differential evacuation chamber side.

    EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240422889A1

    公开(公告)日:2024-12-19

    申请号:US18654475

    申请日:2024-05-03

    Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which a droplet target irradiated with laser light is turned into plasma and extreme ultraviolet light is generated, a light concentrating mirror arranged in the chamber and concentrating the extreme ultraviolet light, a gas curtain forming device injecting a gas to form a gas curtain intersecting an optical path of the extreme ultraviolet light propagating from the plasma generation region to the light concentrating mirror, an etching gas supply unit supplying an etching gas into the chamber, and a gas exhaust unit exhausting a residual gas in the chamber. Pressure in a second space that is a space on a side toward the light concentrating mirror from the gas curtain is lower than pressure in a first space that is a space on a side toward the plasma generation region from the gas curtain.

    TARGET SUPPLY SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20230266677A1

    公开(公告)日:2023-08-24

    申请号:US18149998

    申请日:2023-01-04

    CPC classification number: G03F7/70741 G03F7/70841 G03F1/24

    Abstract: A target supply system includes a load lock chamber configured to contain a solid target substance, a solid target supply pipe connected to the load lock chamber, a pressure regulator configured to regulate an externally supplied gas pressure, a gas pressure supply pipe connected to the pressure regulator, a melting tank connected to both the solid target supply pipe and the gas pressure supply pipe, and configured to melt the solid target substance supplied from the load lock chamber via the solid target supply pipe to generate a liquid target substance, a nozzle configured to discharge the liquid target substance by a gas pressure supplied from the pressure regulator to the melting tank via the gas pressure supply pipe, and a buffer tank configured to communicate with the melting tank and supply a gas pressure thereto when the solid target substance is supplied to the melting tank.

    EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220146943A1

    公开(公告)日:2022-05-12

    申请号:US17492280

    申请日:2021-10-01

    Abstract: An extreme ultraviolet light generation system may include a chamber, a first partition wall having at least one opening which provides communication between a first space and a second space, an EUV light concentrating mirror located in the second space and configured to concentrate extreme ultraviolet light generated in a plasma generation region located in the first space, a first gas supply port formed at the chamber, and a gas exhaust port formed in the first partition wall, a distance between the center of the plasma generation region and an edge of the at least one opening being equal to or more than a stop distance LSTOP [mm] calculated by the following equation. LSTOP=272.8·EVG0.4522·P−1 EAVG [eV] representing average kinetic energy of ions generated in the plasma generation region and P [Pa] representing a gas pressure inside the first partition wall

    CHAMBER DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20210289611A1

    公开(公告)日:2021-09-16

    申请号:US17156376

    申请日:2021-01-22

    Abstract: A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.

    EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240196505A1

    公开(公告)日:2024-06-13

    申请号:US18494016

    申请日:2023-10-25

    Inventor: Atsushi UEDA

    CPC classification number: H05G2/008 G03F7/36 G03F7/70033

    Abstract: An extreme ultraviolet light generation chamber device includes a chamber including, at an internal space thereof, a plasma generation region; an etching gas supply port supplying an etching gas; a cylindrical partition wall surrounding the plasma generation region, and having an opening on the internal space side as an inlet port and an opening at the outside of the chamber as an exhaust port; and a concentrating mirror reflecting extreme ultraviolet light generated at the plasma generation region and having passed through the inlet port. A first recessed portion is provided at a part of a first region among an inner peripheral surface of the partition wall. The first region is on a travel direction side of the laser light with respect to the plasma generation region and surrounded by a curved surface that forms 45 degrees with respect to the optical axis of the laser light.

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

    公开(公告)号:US20190364654A1

    公开(公告)日:2019-11-28

    申请号:US16536055

    申请日:2019-08-08

    Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; an EUV light focusing mirror located in the chamber; and a hydrogen gas release unit that is located in the chamber and includes an opening configured to release a hydrogen gas inward from around the EUV light focusing mirror and a first cooling medium channel through which a cooling medium passes.

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