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公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译： 辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。 辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。 其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。
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公开(公告)号：US20100040977A1
公开(公告)日：2010-02-18
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译： 辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。 辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成 优异的抗蚀剂图案。 其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。
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公开(公告)号：US07897821B2
公开(公告)日：2011-03-01
申请号：US12873265
申请日：2010-08-31
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C07C31/34
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.
摘要翻译： 下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基 具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数 至3，p表示1至8的自然数。
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公开(公告)号：US07812105B2
公开(公告)日：2010-10-12
申请号：US11914024
申请日：2006-05-11
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
摘要翻译： 提供了对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状，具有优异的基本性能，特别是提供宽DOF和高分辨率辐射敏感性树脂组合物 优秀的LER。 还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。 该新化合物由下式（2）表示，其中R4表示甲基，三氟甲基或氢原子，Rfs中的至少一个表示氟原子或具有1至10个的直链或支链全氟烷基 碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示金属离子或鎓阳离子，m表示1〜3的整数，p表示 是1〜8的整数。
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公开(公告)号：US20100063232A1
公开(公告)日：2010-03-11
申请号：US12514168
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.
摘要翻译： 包含下式（10）所示的重复单元的树脂作为辐射敏感性酸发生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。 其中R1表示氢原子等，M +表示特定阳离子，n为1至5的整数。
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公开(公告)号：US07956142B2
公开(公告)日：2011-06-07
申请号：US12514168
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
IPC分类号： C08F128/02
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.
摘要翻译： 包含下式（10）所示的重复单元的树脂作为辐射敏感性酸发生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。 其中R1表示氢原子等，M +表示特定阳离子，n为1至5的整数。
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公开(公告)号：US20100324329A1
公开(公告)日：2010-12-23
申请号：US12873265
申请日：2010-08-31
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C07C309/04
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.
摘要翻译： 下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基 具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数 至3，p表示1至8的自然数。
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公开(公告)号：US20090069521A1
公开(公告)日：2009-03-12
申请号：US11914024
申请日：2006-05-11
申请人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
发明人： Tomoki Nagai , Eiji Yoneda , Takuma Ebata , Takanori Kawakami , Makoto Sugiura , Tsutomu Shimokawa , Makoto Shimizu
IPC分类号： C08F214/18 , C07C317/02 , C07C69/52 , C07D209/56 , C08F228/02
CPC分类号： C09D133/14 , C07C309/10 , C07C309/12 , C07C309/19 , C07C309/20 , C07C381/12 , C07D209/76 , C08F20/38 , C08F28/00 , C08F28/02 , C08F214/18 , C08F220/12 , C08F220/18 , C08F220/24 , C08F220/28 , C08F228/02 , C09D141/00 , G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
摘要翻译： 提供了对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状，具有优异的基本性能，特别是提供宽DOF和高分辨率辐射敏感性树脂组合物 优秀的LER。 还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。 该新化合物由下式（2）表示，其中R4表示甲基，三氟甲基或氢原子，Rfs中的至少一个表示氟原子或具有1至10个的直链或支链全氟烷基 碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示金属离子或鎓阳离子，m表示1〜3的整数，p表示 是1〜8的整数。
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公开(公告)号：US08026039B2
公开(公告)日：2011-09-27
申请号：US12514212
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
摘要翻译： 辐射敏感性树脂组合物包括包含下式（1）所示的重复单元和溶剂的树脂。 辐射敏感性树脂组合物作为辐射敏感性酸产生剂具有优异的性能，包括仅在很小程度上对环境和人体有不利影响的树脂，并且可以形成具有高分辨率并形成 优异的抗蚀剂图案。 其中R1表示氢原子等，M +表示特定的阳离子，n表示1〜5的整数。
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