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1.发明授权Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same 有权选择用于校正光刻设备中的网格变形的工艺配方的网格模型和使用其的光刻组件的方法公开(公告)号：US07468795B2
公开(公告)日：2008-12-23
申请号：US11484849
申请日：2006-07-12
申请人： Hubertus Johannes Gertrudus Simons , Henricus Johannes Lambertus Megens , Everhardus Cornelis Mos , Leonardus Henricus Marie Verstappen , Roy Werkman , Henricus Jacobus Maria Verhoeven
发明人： Hubertus Johannes Gertrudus Simons , Henricus Johannes Lambertus Megens , Everhardus Cornelis Mos , Leonardus Henricus Marie Verstappen , Roy Werkman , Henricus Jacobus Maria Verhoeven
IPC分类号： G01B11/00
CPC分类号： G03F9/7003 , G03F7/70516 , G03F7/70616 , G03F7/70633 , G03F9/7011 , G03F9/7019
摘要： A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.
摘要翻译： 公开了一种选择用于校正光刻设备中的网格变形的处理配方的网格模型的方法。 首先提供一组网格模型。 随后，通过对多个基板上的多个对准标记进行取向测量来获得对准数据。 对于每个网格模型，检查对齐数据是否适合解决网格模型。 如果是，则将网格模型添加到网格模型的子集中。 选择具有最低残差的网格模型。 除了对准数据之外，可以通过对基板数量上的多个覆盖标记执行覆盖测量来获得度量数据。 对于子集的每个网格模型，可以确定用于确定覆盖性能指标的模拟计量数据。 然后使用覆盖性能指标选择网格模型。
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2.发明授权公开(公告)号：US07969577B2
公开(公告)日：2011-06-28
申请号：US11520790
申请日：2006-09-14
IPC分类号： G01N21/55
CPC分类号： G03F7/70633
摘要： When using a scatterometer different portions of a target area may be at different focal depths. When the whole area is measured this results in part of it being out of focus. To compensate for this an array of lenses is placed in the back focal plane of the high numerical aperture lens.
摘要翻译： 当使用散射仪时，目标区域的不同部分可能处于不同的焦点深度。 当测量整个区域时，会导致部分失去焦点。 为了补偿这一点，将一组透镜放置在高数值孔径透镜的后焦平面中。
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公开(公告)号：US07415319B2
公开(公告)日：2008-08-19
申请号：US11396912
申请日：2006-04-04
IPC分类号： G06F19/00
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.
摘要翻译： 使用基于对准标记的对准偏移测量和先前批次中的基板上的覆盖目标的覆盖测量计算的偏移校正和过程校正来进行基板暴露之前的未对准的校正。
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4.发明申请公开(公告)号：US20080068609A1
公开(公告)日：2008-03-20
申请号：US11520790
申请日：2006-09-14
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： When using a scatterometer different portions of a target area may be at different focal depths. When the whole area is measured this results in part of it being out of focus. To compensate for this an array of lenses is placed in the back focal plane of the high numerical aperture lens.
摘要翻译： 当使用散射仪时，目标区域的不同部分可能处于不同的焦点深度。 当测量整个区域时，会导致部分失去焦点。 为了补偿这一点，将一组透镜放置在高数值孔径透镜的后焦平面中。
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公开(公告)号：US20070252994A1
公开(公告)日：2007-11-01
申请号：US11412112
申请日：2006-04-27
IPC分类号： G01B11/00
CPC分类号： H01L21/681 , H01L21/67092 , Y10T29/49131
摘要： An alignment apparatus for a substrate bonding system is provided with a first optical arm arranged to direct onto a detector radiation from a first alignment mark on a first substrate, and a second optical arm arranged to direct onto the detector radiation from a second alignment mark on a second substrate. The first alignment mark has a known location relative to a functional pattern provided on an opposite side of the first substrate, and the second alignment mark has a known location relative to a functional pattern provided on an opposite side of the second substrate. The substrate bonding system can be further provided with first and second substrate tables arranged to hold the first and second substrates such that they face one another, at least one of the substrate tables being movable in response to a signal output from the detector, thereby allowing the first and second substrates to be aligned with respect to each other for bonding.
摘要翻译： 用于基板接合系统的对准装置设置有第一光学臂，布置成将第一对准标记上的检测器辐射引导到第一基板上，第二光臂布置成将检测器辐射从第二对准标记 第二基板。 第一对准标记具有相对于设置在第一基板的相对侧上的功能图案的已知位置，并且第二对准标记相对于设置在第二基板的相对侧上的功能图案具有已知位置。 衬底接合系统还可以设置有第一和第二衬底台，布置成保持第一和第二衬底使得它们彼此面对，至少一个衬底台可响应于从检测器输出的信号而可移动，从而允许 第一和第二基板相对于彼此对准以进行接合。
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公开(公告)号：US20070233305A1
公开(公告)日：2007-10-04
申请号：US11396912
申请日：2006-04-04
申请人： Roy Werkman , Everhardus Mos
发明人： Roy Werkman , Everhardus Mos
IPC分类号： G06F19/00
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.
摘要翻译： 使用基于对准标记的对准偏移测量和先前批次中的基板上的覆盖目标的覆盖测量计算的偏移校正和过程校正来进行基板暴露之前的未对准的校正。
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7.发明申请Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same 有权选择用于校正光刻设备中的网格变形的工艺配方的网格模型和使用其的光刻组件的方法公开(公告)号：US20070021860A1
公开(公告)日：2007-01-25
申请号：US11484849
申请日：2006-07-12
申请人： Hubertus Gertrudus Simons , Henricus Lambertus Megens , Everhardus Mos , Leonardus Marie Verstappen , Roy Werkman , Henricus Maria Verhoeven
发明人： Hubertus Gertrudus Simons , Henricus Lambertus Megens , Everhardus Mos , Leonardus Marie Verstappen , Roy Werkman , Henricus Maria Verhoeven
IPC分类号： G06F19/00
CPC分类号： G03F9/7003 , G03F7/70516 , G03F7/70616 , G03F7/70633 , G03F9/7011 , G03F9/7019
摘要： A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.
摘要翻译： 公开了一种选择用于校正光刻设备中的网格变形的处理配方的网格模型的方法。 首先提供一组网格模型。 随后，通过对多个基板上的多个对准标记进行取向测量来获得对准数据。 对于每个网格模型，检查对齐数据是否适合解决网格模型。 如果是，则将网格模型添加到网格模型的子集中。 选择具有最低残差的网格模型。 除了对准数据之外，可以通过对基板数量上的多个覆盖标记执行覆盖测量来获得度量数据。 对于子集的每个网格模型，可以确定用于确定覆盖性能指标的模拟计量数据。 然后使用覆盖性能指标选择网格模型。
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公开(公告)号：US07433038B2
公开(公告)日：2008-10-07
申请号：US11412112
申请日：2006-04-27
CPC分类号： H01L21/681 , H01L21/67092 , Y10T29/49131
摘要： An alignment apparatus for a substrate bonding system is provided with a first optical arm arranged to direct onto a detector radiation from a first alignment mark on a first substrate, and a second optical arm arranged to direct onto the detector radiation from a second alignment mark on a second substrate. The first alignment mark has a known location relative to a functional pattern provided on an opposite side of the first substrate, and the second alignment mark has a known location relative to a functional pattern provided on an opposite side of the second substrate. The substrate bonding system can be further provided with first and second substrate tables arranged to hold the first and second substrates such that they face one another, at least one of the substrate tables being movable in response to a signal output from the detector, thereby allowing the first and second substrates to be aligned with respect to each other for bonding.
摘要翻译： 用于基板接合系统的对准装置设置有第一光学臂，布置成将第一对准标记上的检测器辐射引导到第一基板上，第二光臂布置成将检测器辐射从第二对准标记 第二基板。 第一对准标记具有相对于设置在第一基板的相对侧上的功能图案的已知位置，并且第二对准标记相对于设置在第二基板的相对侧上的功能图案具有已知位置。 衬底接合系统还可以设置有第一和第二衬底台，布置成保持第一和第二衬底使得它们彼此面对，至少一个衬底台可响应于从检测器输出的信号而可移动，从而允许 第一和第二基板相对于彼此对准以进行接合。
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公开(公告)号：US20060103822A1
公开(公告)日：2006-05-18
申请号：US10990335
申请日：2004-11-17
申请人： Roy Werkman , Franciscus Van Bilsen , Bart Swinnen
发明人： Roy Werkman , Franciscus Van Bilsen , Bart Swinnen
IPC分类号： G03B27/52
CPC分类号： G03F7/70633 , G03F9/7046
摘要： The invention relates to a method of optimizing an alignment strategy for processing batches of substrates in a lithographic projection apparatus. First, all substrates in a plurality of batches of substrates in the lithographic projection apparatus are sequentially aligned and exposed using a predefined alignment strategy. Then, alignment data is determined for each substrate in the plurality of batches of substrates. Next, at least one substrate in each batch of substrates is selected to render a set of selected substrates comprising at least one substrate in each batch. In a metrology tool, overlay data for each of the selected substrates is determined. Then, overlay indicator values for a predefined overlay indicator are calculated for the predefined alignment strategy and for other possible alignment strategies. In this calculation, the alignment data and the overlay data of the selected substrates is used. Finally, an optimal alignment strategy is determined, the strategy being defined as alignment strategy among the predefined alignment strategy and the other possible alignment strategies with a lowest overlay indicator value.
摘要翻译： 本发明涉及一种优化用于在光刻投影设备中处理批次的基板的对准策略的方法。 首先，光刻投影设备中的多批基板中的所有基板使用预定义的对准策略顺序对准和曝光。 然后，确定多批基板中的每个基板的对准数据。 接下来，选择每批衬底中的至少一个衬底，以在每批中提供包含至少一个衬底的一组选定衬底。 在计量工具中，确定每个所选择的基底的覆盖数据。 然后，为预定义的对齐策略和其他可能的对准策略计算预定义重叠指示符的覆盖指示符值。 在该计算中，使用所选择的基板的对准数据和覆盖数据。 最后，确定最佳对准策略，该策略被定义为预定义对准策略中的对准策略和具有最低覆盖指标值的其他可能的对准策略。
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公开(公告)号：US07042552B1
公开(公告)日：2006-05-09
申请号：US10990335
申请日：2004-11-17
CPC分类号： G03F7/70633 , G03F9/7046
摘要： The invention relates to a method of optimizing an alignment strategy for processing batches of substrates in a lithographic projection apparatus. First, all substrates in a plurality of batches of substrates in the lithographic projection apparatus are sequentially aligned and exposed using a predefined alignment strategy. Then, alignment data is determined for each substrate in the plurality of batches of substrates. Next, at least one substrate in each batch of substrates is selected to render a set of selected substrates including at least one substrate in each batch. In a metrology tool, overlay data for each of the selected substrates is determined. Then, overlay indicator values for a predefined overlay indicator are calculated for the predefined alignment strategy and for other possible alignment strategies. In this calculation, the alignment data and the overlay data of the selected substrates is used. Finally, an optimal alignment strategy is determined, the strategy being defined as alignment strategy among the predefined alignment strategy and the other possible alignment strategies with a lowest overlay indicator value.
摘要翻译： 本发明涉及一种优化用于在光刻投影设备中处理批次的基板的对准策略的方法。 首先，光刻投影设备中的多批基板中的所有基板使用预定义的对准策略顺序对准和曝光。 然后，确定多批基板中的每个基板的对准数据。 接下来，选择每批衬底中的至少一个衬底，以在每批中提供包括至少一个衬底的一组选定衬底。 在计量工具中，确定每个所选择的基底的覆盖数据。 然后，为预定义的对齐策略和其他可能的对准策略计算预定义重叠指示符的覆盖指示符值。 在该计算中，使用所选择的基板的对准数据和覆盖数据。 最后，确定最佳对准策略，该策略被定义为预定义对准策略中的对准策略和具有最低覆盖指标值的其他可能的对准策略。
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