公开(公告)号：US20220306807A1

公开(公告)日：2022-09-29

申请号：US17564997

申请日：2021-12-29

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Yang SU ,  Yung-Lung TSENG ,  Chun-Wei SU

IPC: C08G73/10 ,  C09D179/08

Abstract: A polyimide, a film composition, and film prepared from the same are provided. The polyimide is a product of a reactant (a) and a reactant (b). The reactant (a) consists of a first dianhydride and a second dianhydride. The first dianhydride has a structure represented by Formula (I) and the second dianhydride has a structure represented by Formula (II) wherein R1, R2 and Ar1 are as defined in specification. The reactant (b) includes a first diamine, wherein the first diamine is and R3, R4, R5, or R6 are as defined in specification.

公开(公告)号：US20190204740A1

公开(公告)日：2019-07-04

申请号：US16226147

申请日：2018-12-19

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Yang SU ,  Chih-Jen YANG ,  Chyi-Ming LEU

IPC: G03F7/075 ,  G03F7/20 ,  G03F7/028 ,  C08L83/04

CPC classification number: G03F7/0757 ,  C08G77/08 ,  C08G77/20 ,  C08G77/46 ,  C08K3/36 ,  C08K2201/005 ,  C08L83/04 ,  G03F7/028 ,  G03F7/0755 ,  G03F7/2002

Abstract: A photosensitive composite material is provided. The photosensitive composite material includes 0.1-20.5 parts by weight of a nanoporous silica material, 10.9-68.6 parts by weight of a siloxane polymer, and 10.9-89 parts by weight of a photosensitive siloxane composition, including a siloxane polymer having at least one terminal functional group being vinyl group and a siloxane polymer having at least one terminal functional group being thiol group, based on 100 parts by weight of the photosensitive composite material. The siloxane polymer is a homopolymer of a monomer having a structure of Formula (I) wherein each of R is independently a linear or branched C1-C10 alkyl group, n is a positive integer between 10 and 1000, X includes an alkoxysilyl group, a methacrylate group, an epoxy group, a vinyl group, or an acrylate group.

公开(公告)号：US20230229080A1

公开(公告)日：2023-07-20

申请号：US18189546

申请日：2023-03-24

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yu-Yang SU ,  Chih-Jen YANG ,  Yung-Lung TSENG

IPC: G03F7/038

CPC classification number: G03F7/038

Abstract: A photosensitive composition and film prepared from the same are provided. The photosensitive composition includes 100 parts by weight of polyimide, 0.25-50 parts by weight of initiator and 0.25-100 parts by weight of crosslinking agent. The polyimide is a product of a reactant (a) and a reactant (b) via a reaction. The reactant (a) consists of a first dianhydride and a second dianhydride. The molar ratio of the first dianhydride to the second dianhydride is 3:7 to 8:2. The reactant (b) includes a first diamine. The first dianhydride, the second dianhydride and the first diamine are disclosed in the specification.

公开(公告)号：US20180127649A1

公开(公告)日：2018-05-10

申请号：US15806995

申请日：2017-11-08

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Yi-Chun LIU ,  Yu-Yang SU ,  Chun-Hsiang WEN

IPC: C09K11/70 ,  B22F1/02 ,  B22F1/00

CPC classification number: C09K11/703 ,  B22F1/0018 ,  B22F1/02 ,  B22F2301/25 ,  B22F2304/054 ,  B82Y20/00 ,  B82Y40/00 ,  Y10S977/774 ,  Y10S977/813 ,  Y10S977/815 ,  Y10S977/824 ,  Y10S977/892 ,  Y10S977/95

Abstract: A method for manufacturing a quantum dot and a quantum dot are provided. The method includes adding a core semiconductor precursor solution into a seed composition solution. The seed composition solution includes a seed composition, and the seed composition is a dendrimer-metal nanoparticle composite. The core semiconductor precursor solution includes a first semiconductor ion and a second semiconductor ion. The method also includes carrying out a first synthesis reaction to form a core semiconductor material wrapping the seed composition. The core semiconductor material is formed by combining the first semiconductor ion with the second semiconductor ion.