公开(公告)号：US20200158492A1

公开(公告)日：2020-05-21

申请号：US16665759

申请日：2019-10-28

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/956 ,  G01N21/95 ,  G06F30/398 ,  G06F30/392

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US20160178351A1

公开(公告)日：2016-06-23

申请号：US14949444

申请日：2015-11-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran AMIT ,  Barry LOEVSKY ,  Andrew HILL ,  Amnon MANASSEN ,  Nuriel AMIR ,  Vladimir LEVINSKI ,  Roie VOLKOVICH

IPC: G01B11/06 ,  G06F17/50 ,  G01B11/27

CPC classification number: G01B11/06 ,  G01B11/272 ,  G01B2210/56 ,  G01B2290/70 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  G06F17/5072 ,  G06F17/5081 ,  H01L22/30

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

Abstract translation: 提供了目标，目标元素和目标设计方法，其包括将目标结构设计为具有高于特定对比度阈值的高对比度至其偏振光背景，同时具有低于特定对比度阈值至其非极化背景下的特定对比度阈值的低对比度 光。 目标可能在设备特征尺度上具有细节，并且与设备设计规则兼容，并且当用偏振照明测量时保持光学对比度，并且因此被有效地用作计量目标。 同样提供了设计变型和相应的测量光学系统。

公开(公告)号：US20190033726A1

公开(公告)日：2019-01-31

申请号：US15753187

申请日：2017-12-15

Applicant: KLA-TENCOR CORPORATION

Inventor： Ido Adam ,  Vladimir LEVINSKI ,  Amnon MANASSEN ,  Yuval LUBASHEVSKY

IPC: G03F7/20

Abstract: Scatterometry overlay targets as well as target design and measurement methods are provided, which mitigate the effects of grating asymmetries in diffraction based overlay measurements. Targets comprise additional cells with sub-resolved structures replacing resolved coarse pitch gratings and/or comprise alternating sub-resolved structures with coarse pitch periodicity—to isolate and remove inaccuracies that result from grating asymmetries. Measurement methods utilize orthogonally polarized illumination to isolate the grating asymmetry effects in different measurement directions, with respect to the designed target structures.

公开(公告)号：US20150309402A1

公开(公告)日：2015-10-29

申请号：US14795549

申请日：2015-07-09

Applicant: KLA-Tencor Corporation

Inventor： Vladimir LEVINSKI ,  Feler YOEL ,  Daniel KANDEL

IPC: G03F1/42 ,  G06F17/50

CPC classification number: G03F1/42 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683 ,  G06F17/5072 ,  H01L22/30

Abstract: Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.

Abstract translation: 提供了计量目标，目标设计方法和计量方法。 计量目标包括属于两个或更多目标元素类型的目标元素。 每个目标元素类型包括将指定的生产参数偏移到指定范围的未解决的特征，从而为诸如焦点和剂量的过程参数提供灵敏度监控和优化工具。

公开(公告)号：US20190049858A1

公开(公告)日：2019-02-14

申请号：US15763662

申请日：2018-02-27

Applicant: KLA-TENCOR CORPORATION

Inventor： Evgeni GUREVICH ,  Michael E. ADEL ,  Roel GRONHEID ,  Yoel FELER ,  Vladimir LEVINSKI ,  Dana KLEIN ,  Sharon AHARON

IPC: G03F7/20

Abstract: Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER). Minimal required dimensions of target elements may be derived from analysis of the line properties and uncertainty error of metrology measurements, by either CDSEM (critical dimension scanning electron microscopy) or optical systems, with corresponding targets. The importance of this analysis is emphasized in view of the finding that stochastic noise may have increased importance with when using more localized models such as CPE (correctables per exposure). The uncertainty error estimation may be used for target design, enhancement of overlay estimation and evaluation of measurement reliability in multiple contexts.

公开(公告)号：US20190004439A1

公开(公告)日：2019-01-03

申请号：US16122495

申请日：2018-09-05

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G03F7/20 ,  G01N21/95 ,  G01N21/47 ,  G02B27/42

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：US20180342063A1

公开(公告)日：2018-11-29

申请号：US15757119

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： Yuval LUBASHEVSKY ,  Yuri PASKOVER ,  Vladimir LEVINSKI ,  Amnon MANASSEN

IPC: G06T7/13 ,  G06K9/00

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.