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    Adjustable resolution interferometric lithography system
    3.
    发明授权
    Adjustable resolution interferometric lithography system 有权
    可调分辨率干涉光刻系统

    公开(公告)号：US07492442B2

    公开(公告)日：2009-02-17

    申请号：US10927309

    申请日：2004-08-27

    申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

    发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

    IPC分类号： G03B27/54 ,  G03B27/52

    CPC分类号： G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

    摘要： A lithographic system includes a laser outputting a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a prism for forming interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable without replacing any optical components in an optical path of the lithographic system. The beamsplitter is movable along the optical path to adjust the resolution. The prism includes a plurality of sets of facets, each set of facets corresponding to a particular resolution. Each set of facets corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. The resolution is adjustable. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.

    摘要翻译： 光刻系统包括输出激光束的激光; 分束器将激光束分成多个光束; 以及用于使用所述多个光束在基板上形成干涉条纹的棱镜。 光刻系统的分辨率是可调节的，而不替代光刻系统的光路中的任何光学部件。 分束器可沿着光路移动以调节分辨率。 棱镜包括多组小平面，每组面对应于特定分辨率。 每组小平面对应于沿着光路的特定分束器位置和/或特定分辨率。 分束器包括线性光栅或棋盘格栅。 梁是N路对称的。 分辨率可调。 通过沿着光路移动分束器来调节系统的数值孔径。 液体可以在基板和棱镜之间。

    Interferometric lithographic projection apparatus
    6.
    发明授权
    Interferometric lithographic projection apparatus 有权
    干涉光刻投影仪

    公开(公告)号：US07751030B2

    公开(公告)日：2010-07-06

    申请号：US11341381

    申请日：2006-01-30

    申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Diane C. McCafferty ,  Harry Sewell ,  Justin L. Kreuzer

    发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Diane C. McCafferty ,  Harry Sewell ,  Justin L. Kreuzer

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70408

    摘要： A lithographic projection apparatus includes an illumination system, an interchangeable upper optics module, and a lower optics module. The illumination system provides a beam of radiation. The interchangeable upper optics module receives the beam and includes, sequentially, a beam splitter that splits the beam into portions, an aperture plate, and a plurality of reflecting surfaces. The lower optics module receives portions of the beam from respective ones the reflecting surfaces and directs the portions of the beam onto a substrate. Interference fringes or contact hole patterns are formed on the substrate using the portions of the beam.

    摘要翻译： 光刻投影设备包括照明系统，可互换的上部光学模块和下部光学模块。 照明系统提供辐射束。 可互换的上光学模块接收光束，并且依次包括将光束分成多个部分的光束分离器，孔板和多个反射表面。 下部光学模块从相应的反射表面接收光束的部分并将光束的部分引导到衬底上。 使用梁的部分在基板上形成干涉条纹或接触孔图案。

    Adjustable Resolution Interferometric Lithography System
    7.
    发明申请
    Adjustable Resolution Interferometric Lithography System 有权
    可调分辨率干涉光刻系统

    公开(公告)号：US20070070321A1

    公开(公告)日：2007-03-29

    申请号：US11561238

    申请日：2006-11-17

    申请人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

    发明人： Louis Markoya ,  Aleksandr Khmelichek ,  Harry Sewell

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

    摘要： A lithographic system includes a source of a laser beam; a beamsplitter dividing the laser beam into a plurality of beams; and a plurality of reflecting surfaces that forms interference fringes on a substrate using the plurality of beams. Resolution of the lithographic system is adjustable by adjusting angular orientation of the reflecting surfaces. The beamsplitter is movable along the optical path to adjust the resolution. The reflecting surfaces may be facets of a prism. Each reflecting surface corresponds to a particular beamsplitter position along the optical path, and/or to a particular resolution. The beamsplitter includes a linear grating or a checkerboard grating. The beams are N-way symmetric. A numerical aperture of the system is adjustable by moving the beamsplitter along the optical path. A liquid can be between the substrate and the prism.

    摘要翻译： 光刻系统包括激光束源; 分束器将激光束分成多个光束; 以及多个反射表面，其使用所述多个光束在基板上形成干涉条纹。 光刻系统的分辨率可通过调整反射表面的角度方向来调节。 分束器可沿着光路移动以调节分辨率。 反射面可以是棱镜的面。 每个反射表面对应于沿着光路的特定分束器位置和/或特定分辨率。 分束器包括线性光栅或棋盘格栅。 梁是N路对称的。 通过沿着光路移动分束器来调节系统的数值孔径。 液体可以在基板和棱镜之间。

    Use of multiple reticles in lithographic printing tools
    8.
    发明授权
    Use of multiple reticles in lithographic printing tools 有权

    公开(公告)号：US06967713B2

    公开(公告)日：2005-11-22

    申请号：US10939328

    申请日：2004-09-14

    申请人： Andrew W. McCullough ,  Christopher Mason ,  Louis Markoya ,  Harry Sewell

    发明人： Andrew W. McCullough ,  Christopher Mason ,  Louis Markoya ,  Harry Sewell

    IPC分类号： G03F7/22 ,  G03F7/20 ,  H01L21/027 ,  G03B27/62 ,  G03B27/42 ,  G03C5/00

    CPC分类号： G03F7/70516 ,  G03F7/70283 ,  G03F7/70358 ,  G03F7/70466 ,  G03F7/70733

    摘要： A reticle stage having a range of motion sufficient to scan at least two distinct reticles. In a photolithographic process, a reticle stage having an extended range of motion and containing at least two reticles, preferably a phase shift reticle and a trim reticle, is used. The reticle stage scans the two reticles across an illumination field. The image of each reticle is projected by projection optics onto a photosensitive substrate on a wafer stage. The field on the photosensitive substrate is exposed with the image of the first reticle and subsequently exposed with the image of the second reticle. The projection of an image of a first and second reticle onto the same field in a scanning operation greatly facilitates throughput of the photolithographic tool or device. Reticle changes are eliminated when at least two reticles are needed to expose a single field. The use of multiple reticles to expose a single field is necessary when a phase shift mask and related trim mask are used. In another embodiment, the reticle stage has a range of motion permitting scanning of an additional calibration reticle. This permits rapid real time system calibration.

    Tunable alignment geometry
    9.
    发明申请
    Tunable alignment geometry 失效
    可调整对齐几何

    公开(公告)号：US20050096779A1

    公开(公告)日：2005-05-05

    申请号：US10696355

    申请日：2003-10-30

    申请人： Louis Markoya

    发明人： Louis Markoya

    IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  H01L23/544 ,  G06F19/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： G03F9/708 ,  G03F9/7076 ,  G03F9/7084 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An alignment targets with geometry designs provides an desired alignment offset for processes (both symmetric and asymmetric) on a wafer substrate. The alignment target includes one or more sub-targets, where each sub-target is defined as having a left portion and a right portion having a different geometric pattern, and where the left portion has a geometry density and the right portion has a geometry density.

    摘要翻译： 具有几何设计的对准目标为晶片衬底上的工艺（对称和不对称）提供期望的对准偏移。 对准目标包括一个或多个子目标，其中每个子目标定义为具有不同几何图案的左部分和右部分，并且其中左部分具有几何密度，右部分具有几何密度 。

    Systems and methods for thermally-induced aberration correction in immersion lithography
    10.
    发明申请
    Systems and methods for thermally-induced aberration correction in immersion lithography 有权
    浸没光刻中热致像差校正的系统和方法

    公开(公告)号：US20080137044A1

    公开(公告)日：2008-06-12

    申请号：US11634924

    申请日：2006-12-07

    申请人： Harry Sewell ,  Louis Markoya ,  Diane McCafferty

    发明人： Harry Sewell ,  Louis Markoya ,  Diane McCafferty

    IPC分类号： G03B27/52

    CPC分类号： G03B27/72 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70858

    摘要： Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.

    摘要翻译： 提供了浸没光刻像差控制系统和补偿曝光区域中浸没流体中曝光能量的加热效应的方法。 像差控制系统包括调节浸没式光刻系统内的光学元件的致动器和耦合到致动器的流体加热补偿模块。 流体加热调节模块基于浸入液体的流速，曝光剂量和掩模版图案图像中的一个或多个的变化来确定致动器命令以对浸没式光刻系统内的光学元件进行像差调整。 在一个实施例中，像差控制系统包括干涉测量传感器，其基于与浸没流体相关的操作特性的变化来预校准像差。 提供校准像差的方法，确定致动器调节并且在操作特性的变化中实施致动器调节以控制像差效应。