公开(公告)号：US06468124B1

公开(公告)日：2002-10-22

申请号：US09354000

申请日：1999-07-15

申请人： Kenichi Muramatsu ,  Yoh Kuno

发明人： Kenichi Muramatsu ,  Yoh Kuno

IPC分类号： A63H3322

CPC分类号： A63F9/0291

摘要： An object display method and apparatus is disclosed which can easily display changeover of an entity, and an amusement apparatus is disclosed which can display a simulated burst having reality and punch. The method and apparatus first displays only one of the objects and hides other objects from the field of view. Then, the method and apparatus displays the previously hidden objects and at the same time hides the previously displayed object.

摘要翻译： 公开了一种可以容易地显示实体的切换的物体显示方法和装置，并且公开了一种娱乐装置，其可以显示具有现实和冲击的模拟突发。 该方法和装置首先仅显示一个对象并从视野中隐藏其他对象。 然后，该方法和装置显示先前隐藏的对象，同时隐藏先前显示的对象。

公开(公告)号：US06726522B2

公开(公告)日：2004-04-27

申请号：US09928170

申请日：2001-08-09

申请人： Kenichi Muramatsu ,  Yoh Kuno

发明人： Kenichi Muramatsu ,  Yoh Kuno

IPC分类号： A63H3322

CPC分类号： A63F9/0291

摘要： An object display method and apparatus is disclosed which can easily display changeover of an entity, and an amusement apparatus is disclosed which can display a simulated burst having reality and punch. The method and apparatus first displays only one of the objects and hides other objects from the field of view. Then, the method and apparatus displays the previously hidden objects and at the same time hides the previously displayed object.

摘要翻译： 公开了一种可以容易地显示实体的切换的物体显示方法和装置，并且公开了一种娱乐装置，其可以显示具有现实和冲击的模拟突发。 该方法和装置首先仅显示一个对象并从视野中隐藏其他对象。 然后，该方法和装置显示先前隐藏的对象，同时隐藏先前显示的对象。

公开(公告)号：US08685838B2

公开(公告)日：2014-04-01

申请号：US10548412

申请日：2003-03-12

申请人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

发明人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

IPC分类号： H01L21/00

CPC分类号： C03B33/091 ,  B23K26/0604 ,  B23K26/0624 ,  B23K26/40 ,  B23K26/53 ,  B23K26/60 ,  B23K2101/40 ,  B23K2103/50 ,  B28D1/221 ,  B28D5/0011 ,  C03B33/023 ,  Y02P40/57

摘要： A laser processing method which can accurately cut an object to be processed along a line to cut is provided. A modified region 7 formed by multiphoton absorption forms a cutting start region 8 within an object to be processed 1 along a line to cut 5. Thereafter, the object 1 is irradiated with laser light L2 absorbable by the object 1 along the line to cut 5, so as to generate fractures 24 from the cutting start region 8 acting as a start point, whereby the object 1 can accurately be cut along the line to cut 5. Expanding an expandable film 19 having the object 1 secured thereto separates individual chips 25 from each other, which can further improve the reliability in cutting the object 1 along the line to cut 5.

摘要翻译： 提供了一种能够沿着切割线精密切割待处理物体的激光加工方法。 通过多光子吸收形成的改质区域7沿着切割线5在待处理物体1内形成切割开始区域8.此后，对象物1照射被检体1沿着切断线5吸收的激光L2 ，以便从作为起始点的切割起始区域8产生裂缝24，由此物体1可以沿着切割线5精确地切割。扩大固定有物体1的可膨胀膜19将各个芯片25从 彼此进一步提高沿着切割线5切割物体1的可靠性。

公开(公告)号：US08422120B2

公开(公告)日：2013-04-16

申请号：US13571696

申请日：2012-08-10

申请人： Kenichi Muramatsu ,  Sunao Kurimura

发明人： Kenichi Muramatsu ,  Sunao Kurimura

IPC分类号： G02F1/37 ,  G02F1/35

CPC分类号： G02F1/3775 ,  G02F1/3558

摘要： A wavelength conversion element is provided as one including a monocrystalline nonlinear optical crystal. The nonlinear optical crystal has: a plurality of first regions having a polarity direction along a predetermined direction; a plurality of second regions having a polarity direction opposite to the predetermined direction; an entrance face into which a fundamental incident wave having a wavelength λ and a frequency ω is incident in a direction substantially perpendicular to the predetermined direction; and an exit face from which a second harmonic with a frequency 2ω generated in the crystal emerges. The plurality of first and second regions are formed as alternately arranged in a period substantially equal to d expressed by a predetermined expression, between the entrance face and the exit face.

摘要翻译： 波长转换元件被提供为包括单晶非线性光学晶体的波长转换元件。 非线性光学晶体具有：沿预定方向具有极性方向的多个第一区域; 具有与所述预定方向相反的极性方向的多个第二区域; 入射面，其中具有波长λ和频率ω的基波入射波入射到基本上垂直于预定方向的方向; 并且出现在晶体中产生具有频率2ω的二次谐波的出射面。 多个第一和第二区域形成为在入射面和出射面之间以基本上等于由预定表达式表示的d的周期交替布置。

公开(公告)号：US08247734B2

公开(公告)日：2012-08-21

申请号：US10547976

申请日：2003-03-12

申请人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

发明人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

IPC分类号： H01L21/301 ,  H01L21/322 ,  H01L21/78

CPC分类号： B23K26/18 ,  A61M5/3272 ,  B23K26/53 ,  B23K26/60 ,  B23K2101/40 ,  B28D1/221 ,  B28D5/0011

摘要： A laser processing method which can accurately cut an object to be processed along a line to cut is provided. A modified region 7 formed by multiphoton absorption forms a cutting start region 8 within an object to be processed 1 along a line 5 along which the object is intended to be cut. Thereafter, the object 1 is irradiated with laser light L2 transmittable through an unmodified region of the object 1, so as to generate fractures 24 from the cutting start region 8 acting as a start point, whereby the object 1 can accurately be cut along the line 5 along which the object is intended to be cut. Expanding an expandable film 19 having the object 1 secured thereto separates individual chips 25 from each other, which can further improve the reliability in cutting the object 1 along the line 5 along which the object is intended to be cut.

摘要翻译： 提供了一种能够沿着切割线精密切割待处理物体的激光加工方法。 通过多光子吸收形成的改质区域7沿着要切割物体的线5在待处理物体1内形成切割开始区域8。 此后，对象物1照射通过物体1的未修改区域可透射的激光L2，以便从作为起始点的切割起始区域8产生裂缝24，从而物体1能够沿着线 5，对象意图被切割。 扩大具有固定物体1的可膨胀膜19将各个芯片25彼此分开，这可以进一步提高沿着目标1切割对象1的线5切割物体1的可靠性。

公开(公告)号：US20100225895A1

公开(公告)日：2010-09-09

申请号：US12801043

申请日：2010-05-18

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer which is selectively positioned between a first position in an optical path of the illumination optical system and a second position outside of the optical path, and has a crystal member whose thickness in a direction along an optical axis of the illumination optical system varies in a direction crossing the optical axis.

摘要翻译： 照明光学系统和方法基于从光源提供的线性偏振光照射照射的表面。 照明光学系统包括：偏光器，其被选择性地定位在照明光学系统的光路中的第一位置和光路外的第二位置之间，并且具有晶体构件，该晶体构件沿着沿着光学系统的光轴的方向的厚度 照明光学系统在与光轴交叉的方向上变化。

公开(公告)号：US07615721B2

公开(公告)日：2009-11-10

申请号：US11250404

申请日：2005-10-17

申请人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

发明人： Fumitsugu Fukuyo ,  Kenshi Fukumitsu ,  Naoki Uchiyama ,  Toshimitsu Wakuda ,  Kazuhiro Atsumi ,  Kenichi Muramatsu

IPC分类号： B23K26/00 ,  H01L21/78

CPC分类号： H01L21/78 ,  B23K20/023 ,  B23K20/16 ,  B23K20/233 ,  B23K20/26 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/046 ,  B23K26/0624 ,  B23K26/066 ,  B23K26/073 ,  B23K26/0853 ,  B23K26/16 ,  B23K26/364 ,  B23K26/40 ,  B23K26/53 ,  B23K2101/40 ,  B23K2103/50 ,  B28D5/0011 ,  B65G2249/04 ,  C03B33/023 ,  C03B33/082 ,  C03B33/102 ,  C03C23/0025 ,  G02F1/1368 ,  H01L21/6836 ,  H01L2221/68327 ,  Y02P40/57 ,  Y10T29/49144 ,  Y10T83/0341

摘要： A laser beam machining method and a laser beam machining device capable of cutting a work without producing a fusing and a cracking out of a predetermined cutting line on the surface of the work, wherein a pulse laser beam is radiated on the predetermined cut line on the surface of the work under the conditions causing a multiple photon absorption and with a condensed point aligned to the inside of the work, and a modified area is formed inside the work along the predetermined determined cut line by moving the condensed point along the predetermined cut line, whereby the work can be cut with a rather small force by cracking the work along the predetermined cut line starting from the modified area and, because the pulse laser beam radiated is not almost absorbed onto the surface of the work, the surface is not fused even if the modified area is formed.

摘要翻译： 一种激光束加工方法和激光束加工装置，其能够切割工件而不产生在工件表面上的预定切割线的定影和裂纹，其中脉冲激光束照射在工件的预定切割线上 在导致多光子吸收的条件下并且具有与工件内部对准的凝聚点的工作表面，并且沿着预定的切割线沿着预定的切割线沿着预定的切割线移动凝聚点而在工件内部形成改质区域 由此，可以用相当小的力通过从修改区域开始沿着预定切割线的工作而切割工件，并且因为辐射的脉冲激光束几乎不被吸收到工件的表面上，所以表面不熔合 即使形成了修改区域。

公开(公告)号：US20090166342A1

公开(公告)日：2009-07-02

申请号：US12096940

申请日：2006-12-12

申请人： Koji Kuno ,  Kenichi Muramatsu ,  Kazuhiro Atsumi ,  Tetsuya Osajima

发明人： Koji Kuno ,  Kenichi Muramatsu ,  Kazuhiro Atsumi ,  Tetsuya Osajima

IPC分类号： B23K26/38

CPC分类号： B23K26/048 ,  B23K26/046 ,  B23K26/0617 ,  B23K26/40 ,  B23K26/53 ,  B23K2101/40 ,  B23K2103/50

摘要： A laser processing apparatus comprises a converging lens 31 for converging processing laser light and rangefinding laser light L2 toward a wafer 1, an actuator for actuating the lens 31, a shaping optical system 49 for adding astigmatism to reflected light L3 of the rangefinding laser light, a quadrant photodiode 42 for receiving the reflected light L3 and outputting voltage values corresponding to its light quantities, and a controller for regulating the actuator, and positions a converging point P2 of the rangefinding laser light L2 between a focal point P0 of the lens and the lens 31, so as to make it possible to form a modified region at a position deeper from the front face 3, thereby suppressing adverse effects due to the reflected light L3. The control is based on an arithmetic value subjected to a division by a sum of the voltage values, so as to prevent the arithmetic value from being changed by the quantity of reflected light.

摘要翻译： 激光加工装置包括用于会聚处理激光的聚光透镜31和朝向晶片1的测距激光L2，用于致动透镜31的致动器，用于对测距激光的反射光L3增加散光的整形光学系统49， 用于接收反射光L3并输出与其光量相对应的电压值的象限光电二极管42，以及用于调节致动器的控制器，并将测距激光L2的会聚点P2定位在透镜的焦点P0和 透镜31，从而能够在比正面3更深的位置形成改质区域，由此抑制由反射光L3引起的不利影响。 控制基于经过除以电压值之和的算术值，以防止算术值被反射光量改变。

公开(公告)号：US07515248B2

公开(公告)日：2009-04-07

申请号：US11979517

申请日：2007-11-05

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

公开(公告)号：US07423731B2

公开(公告)日：2008-09-09

申请号：US11140103

申请日：2005-05-31

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kenichi Muramatsu ,  Norio Komine ,  Hisashi Nishinaga ,  Tomoyuki Matsuyama ,  Takehito Kudo

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03B27/42 ,  G03F7/70091

摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

摘要翻译： 一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。