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    COMPUTER-IMPLEMENTED METHODS FOR DETECTING AND/OR SORTING DEFECTS IN A DESIGN PATTERN OF A RETICLE
    1.
    发明申请
    COMPUTER-IMPLEMENTED METHODS FOR DETECTING AND/OR SORTING DEFECTS IN A DESIGN PATTERN OF A RETICLE 有权
    用于检测和/或分配错误设计图案中的缺陷的计算机实现方法

    公开(公告)号：US20100226562A1

    公开(公告)日：2010-09-09

    申请号：US12780864

    申请日：2010-05-15

    申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkami

    发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkami

    IPC分类号： G06K9/62

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

    摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

    摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指示符。

    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
    2.
    发明授权
    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle 有权
    用于检测和/或排列掩模版设计图案中的缺陷的计算机实现的方法

    公开(公告)号：US07729529B2

    公开(公告)日：2010-06-01

    申请号：US11005658

    申请日：2004-12-07

    申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    IPC分类号： G06K9/00 ,  H01L21/66 ,  G06F17/50

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

    摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

    摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
    3.
    发明授权
    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle 有权
    用于检测和/或排列掩模版设计图案中的缺陷的计算机实现的方法

    公开(公告)号：US08111900B2

    公开(公告)日：2012-02-07

    申请号：US12780864

    申请日：2010-05-15

    申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid B. Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    IPC分类号： G06K9/00 ,  G01R31/26 ,  G21K5/00 ,  G06F17/50

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

    摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

    摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指示符。

    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
    4.
    发明申请
    Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle 有权
    用于检测和/或排列掩模版设计图案中的缺陷的计算机实现的方法

    公开(公告)号：US20060291714A1

    公开(公告)日：2006-12-28

    申请号：US11005658

    申请日：2004-12-07

    申请人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    发明人： Kenong Wu ,  David Randall ,  Kourosh Nafisi ,  Ramon Ynzunza ,  Ingrid Peterson ,  Ariel Tribble ,  Michal Kowalski ,  Lisheng Gao ,  Ashok Kulkarni

    IPC分类号： G06K9/00

    CPC分类号： G03F1/84 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/7065 ,  G03F7/70666

    摘要： Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.

    摘要翻译： 提供了各种计算机实现的方法。 用于对掩模版的设计图案中的缺陷进行排序的一种方法包括使用与各个缺陷相关联的优先级信息，结合邻近各个缺陷的区域的一个或多个特征来搜索检查数据中的缺陷。 优先级信息对应于与各个缺陷相关联的调制级别。 通过比较为不同的光刻变量值生成的掩模版的图像来生成检查数据。 图像包括至少一个参考图像和至少一个调制图像。 可以从两个或更多个参考图像生成复合参考图像。 该方法还包括将一个或多个标识符分配给感兴趣的缺陷。 标识符可以包括例如缺陷分类和/或识别感兴趣的缺陷是否用于进一步处理的指标。

    REGION BASED VIRTUAL FOURIER FILTER
    8.
    发明申请
    REGION BASED VIRTUAL FOURIER FILTER 有权
    基于区域的虚拟FOURIER过滤器

    公开(公告)号：US20120141013A1

    公开(公告)日：2012-06-07

    申请号：US13381696

    申请日：2011-08-01

    申请人： Lisheng Gao ,  Kenong Wu ,  Allen Park ,  Ellis Chang ,  Khurram Zafar ,  Junqing Huang ,  Ping Gu ,  Christopher Maher ,  Grace H. Chen ,  Songnian Rong ,  Liu-Ming Wu

    发明人： Lisheng Gao ,  Kenong Wu ,  Allen Park ,  Ellis Chang ,  Khurram Zafar ,  Junqing Huang ,  Ping Gu ,  Christopher Maher ,  Grace H. Chen ,  Songnian Rong ,  Liu-Ming Wu

    IPC分类号： G06K9/62

    CPC分类号： G06T7/001 ,  G06T2207/10061 ,  G06T2207/20021 ,  G06T2207/20056 ,  G06T2207/30148

    摘要： The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima.

    摘要翻译： 本发明包括搜索图像数据以便识别半导体晶片上的一个或多个图案化区域，生成一个或多个虚拟傅立叶滤波器（VFF）工作区域，从VFF工作区域获取初始图像数据集，定义VFF训练 利用初始的图像数据集，在VFF工作区域的所识别的图案化区域内的块，其中每个VFF训练块被定义为包含所识别的图案化区域的一部分，显示所选择的重复模式，计算每个VFF训练块的初始频谱 利用来自VFF训练块的初始图像数据组，以及通过识别在频域中具有最大值的初始频谱的频率，为每个训练块生成VFF，其中VFF被配置为在 识别出显示频谱最大值的频率。

    Automatic supervised classifier setup tool for semiconductor defects
    9.
    发明授权
    Automatic supervised classifier setup tool for semiconductor defects 有权
    用于半导体缺陷的自动监控分类器设置工具

    公开(公告)号：US07359544B2

    公开(公告)日：2008-04-15

    申请号：US10713628

    申请日：2003-11-13

    申请人： Lisheng Gao ,  Bo Magluyan ,  Jianxin Zhang ,  Kevin Yeung ,  Kenong Wu ,  Tong Huang

    发明人： Lisheng Gao ,  Bo Magluyan ,  Jianxin Zhang ,  Kevin Yeung ,  Kenong Wu ,  Tong Huang

    IPC分类号： G06K9/00 ,  G06K9/62

    CPC分类号： G06K9/6253 ,  G06T7/0004

    摘要： Disclosed are methods and apparatus for efficiently setting up and maintaining a defect classification system. In general terms, the setup procedure optionally includes automatically grouping a set of provided defects and presenting a representative set from each defect group to the user for classification. After the initial manual classification of the representative defects, the setup procedure includes an automatic procedure for classifying the non-reviewed or unclassified defects based on the manual class codes from the user-reviewed defects. After the automatic classification operation, the user may also be presented with defects from each class which may require re-classification. In particular embodiments, the user is iteratively presented with defects which have classifications that are suspect, which are near classification boundaries, or have classifications that have a low confidence level until each class is pure or contains a same type of defect classes as assigned by the user.

    摘要翻译： 公开了用于有效地建立和维护缺陷分类系统的方法和装置。 一般来说，设置过程可选地包括自动地对一组提供的缺陷进行分组，并将来自每个缺陷组的代表集合给用户进行分类。 在对代表性缺陷进行初步手动分类后，安装步骤包括根据用户审查缺陷的手册类代码分类未经审查或未分类的缺陷的自动程序。 在自动分类操作之后，用户也可能会出现每个类别可能需要重新分类的缺陷。 在特定实施例中，用户被迭代地呈现具有可疑的分类的缺陷，其接近分类边界，或者具有低置信度水平的分类，直到每个类是纯的或包含由所分配的相同类型的缺陷类别 用户。