NEUROMORPHIC SYNAPSE DEVICE WITH EXCELLENT LINEARITY CHARACTERISTICS AND OPERATING METHOD THEREOF

    公开(公告)号:US20220270676A1

    公开(公告)日:2022-08-25

    申请号:US17674272

    申请日:2022-02-17

    Abstract: Disclosed are a neuromorphic synapse device having an excellent linearity characteristic, and an operating method thereof. According to an embodiment, a neuromorphic synapse device includes a channel region formed on a substrate, a gate insulating film region formed on the channel region, a floating gate region formed on the gate insulating film region, a charge transfer layer region formed on the floating gate region, and a control gate region, which is formed on the charge transfer layer region and which generates a potential difference with the floating gate region in response to a fact that a potential that is not less than a reference potential is applied, and performs a weight update operation by releasing at least one charge stored in the floating gate region or storing the at least one charge into the floating gate region by using the potential difference.

    SEMICONDUCTOR CHANNEL BASED NEUROMORPHIC SYNAPSE DEVICE INCLUDING TRAP-RICH LAYER

    公开(公告)号:US20190122098A1

    公开(公告)日:2019-04-25

    申请号:US16169676

    申请日:2018-10-24

    Abstract: A semiconductor channel based neuromorphic synapse device 1 including a trap-rich layer may be provided that includes: a first to a third semiconductor regions which are formed on a substrate and are sequentially arranged; a word line which is electrically connected to the first semiconductor region; a trap-rich layer which surrounds the second semiconductor region; and a bit line which is electrically connected to the third semiconductor region. When a pulse with positive (+) voltage is applied to the word line, a concentration of electrons emitted from the trap-rich layer to the second semiconductor region increases and a resistance of the second semiconductor region decreases. When a pulse with negative (−) voltage is applied to the word line, a concentration of electrons trapped in the trap-rich layer from the second semiconductor region increases and the resistance of the second semiconductor region increases.

    DYNAMIC RANDOM ACCESS MEMORY DEVICE WITH LONG RETENTION AND OPERATING METHOD THEREOF

    公开(公告)号:US20220270660A1

    公开(公告)日:2022-08-25

    申请号:US17674301

    申请日:2022-02-17

    Abstract: Disclosed are a DRAM device capable of storing charges for a long time and an operating method thereof. According to an embodiment, a DRAM device includes a channel region formed on a substrate, a gate insulating film region formed on the channel region, a floating gate region formed on the gate insulating film region, a transition layer region formed on the floating gate region, and a control gate region formed on the transition layer region and generating a potential difference with the floating gate region in response to a fact that a potential that is not less than a reference potential is applied and releasing at least one charge stored in the floating gate region or storing the at least one charge into the floating gate region, by generating a transition current due to the potential difference.

    SINGLE TRANSISTOR CAPABLE OF USING BOTH NEURON AND SYNAPTIC DEVICES, AND A NEUROMORPHIC SYSTEM USING IT

    公开(公告)号:US20210097380A1

    公开(公告)日:2021-04-01

    申请号:US17037444

    申请日:2020-09-29

    Abstract: The present invention relates to a single transistor implementing a neuromorphic system capable of performing neuron and synaptic operations through the single transistor including a floating body layer and a charge storage layer and being implemented by a neuron device and a synaptic device which are co-integrated on the same plane, and the neuromorphic system using the same, and forms the single transistor including a hole barrier material layer formed on a substrate and including a hole barrier material or an electron barrier material, the floating body layer formed on the hole barrier material layer, a source and a drain formed on opposite sides of the floating body layer, a gate insulating layer formed on the floating body layer and including an oxide layer and the charge storage layer, and a gate formed on the gate insulating layer.

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