Method for manufacturing of organic light emitting display device
    2.
    发明授权
    Method for manufacturing of organic light emitting display device 有权
    有机发光显示装置的制造方法

    公开(公告)号:US09304397B2

    公开(公告)日:2016-04-05

    申请号:US13727005

    申请日:2012-12-26

    CPC classification number: G03F7/20 G03F7/0035

    Abstract: Disclosed is a method of manufacturing an organic light emitting display device. The method include forming a driving thin film transistor and passivation layer on a substrate, forming a bank layer at a boundary portion between adjacent sub-pixels, on the passivation layer, laminating a first photoresist film on the bank layer, forming a first photoresist pattern by irradiating IR light on the first photoresist film in an area except a first sub-pixel, depositing a first organic emission layer in the first sub-pixel area exposed by the first photoresist pattern, removing the first photoresist pattern, laminating a second photoresist film on the bank layer, forming a second photoresist pattern by irradiating IR light on the second photoresist film in an area except a second sub-pixel, depositing a second organic emission layer in the second sub-pixel area exposed by the second photoresist pattern, and removing the second photoresist pattern.

    Abstract translation: 公开了一种制造有机发光显示装置的方法。 该方法包括在衬底上形成驱动薄膜晶体管和钝化层,在钝化层上在相邻子像素之间的边界部分形成堤层,在堤层上层叠第一光致抗蚀剂膜,形成第一光致抗蚀剂图案 通过在除了第一子像素以外的区域的第一光致抗蚀剂膜上照射IR光,在由第一光致抗蚀剂图案曝光的第一子像素区域中沉积第一有机发光层,去除第一光致抗蚀剂图案,层叠第二光致抗蚀剂膜 在所述堤层上,通过在除了第二子像素之外的区域中的所述第二光致抗蚀剂膜上照射IR光而形成第二光致抗蚀剂图案,在由所述第二光致抗蚀剂图案曝光的所述第二子像素区域中沉积第二有机发射层,以及 去除第二光致抗蚀剂图案。

Patent Agency Ranking